Device for forming a reduced chamber space, and method for positioning multilayer bodies
US-9352431-B2 · May 31, 2016 · US
US9799543B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9799543-B2 |
| Application number | US-201314350801-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 8, 2013 |
| Priority date | Feb 16, 2012 |
| Publication date | Oct 24, 2017 |
| Grant date | Oct 24, 2017 |
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A transportable process box for processing substrates coated on one side is described. The box has a base for the placement of a first substrate in a manner such that the latter is supported over the full area, a frame, a cover which is placed onto the frame, and an intermediate element which is arranged between the base and the cover and is intended for the placement of a second substrate in a manner such that the latter is supported over the full area. Arrangements and methods for processing substrates are also described.
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The invention claimed is: 1. A transportable process box for processing substrates coated on one side, comprising: a base, configured such that a first substrate is placeable with an uncoated substrate side with full-area support and coatings of the substrates are thermally treatable by radiation supplied on an underside of the base; a frame for connecting the base to a cover; an intermediate element, configured such that a second substrate is placeable with an uncoated substrate side with full-area contact between the second substrate and the intermediate element; and a cover, which is mounted on the frame and is configured such that coatings of the substrates are thermally treatable by radiation supplied on a top side of the cover, wherein a processing space for processing the substrates is formed by the base, cover, and frame. 2. The process box according to claim 1 , wherein: the intermediate element is loosely mounted on a step formed by the frame, and the intermediate element divides the processing space into a first processing subspace for processing the first substrate and a second processing subspace for processing the second substrate. 3. The process box according to claim 1 , wherein: the intermediate element is loosely mounted on a first spacer supported on the base and/or on a second spacer supported on the first substrate, and the intermediate element is configured such that the intermediate element, together with the first spacer or second spacer, divides the processing space into a first processing subspace for processing the first substrate and a second processing subspace for processing the second substrate. 4. The process box according to claim 3 , wherein the second spacer is supported in a coating-free edge zone of the first substrate. 5. The process box according to claim 1 , wherein the frame is loosely mounted on the base. 6. A method for processing substrates coated on one side in the transportable process box according to claim 1 , comprising: installing and loading the process box, including preparing the base, by means of which the first substrate can be supported on the uncoated substrate side over a full area of the first substrate and which is configured such that coatings of substrates are thermally treatable by radiation supplied on an underside of the base, loose mounting of the frame on the base for connecting the base to the cover, optionally, placing the first substrate on the base, arranging the intermediate element, by means of which the second substrate can be supported on the uncoated substrate side over a full area of the second substrate, optionally, placing the second substrate on the intermediate element, and mounting the cover on the frame to form the process box, wherein the cover is configured such that coatings of the substrates are thermally treatable by radiation supplied on the top side of the cover; transporting the process box into a thermal treatment chamber with radiant heaters; and supplying radiation on the underside of the base and/or supplying radiation on the top side of the cover for the thermal treatment of the coatings of the substrates. 7. The method according to claim 6 , wherein the intermediate element, in a first alternative, is loosely mounted on a step formed by the frame or, in a second alternative, is loosely mounted on a first spacer supported on the base and/or on a second spacer supported on the first substrate. 8. An arrangement for processing substrates coated on one side in a process box, comprising: a transportable process carrier, including a base, which is configured such that a first substrate is placeable with an uncoated substrate side with full-area support and coatings of the substrates are thermally treatable by radiation supplied on the underside of the base, a frame, which is configured such that the frame connects the base to a cover, the cover, being loosely mountable on the frame, and an intermediate element, which is configured such that a second substrate is placeable with an uncoated substrate side with full-area contact between the second substrate and the intermediate element, wherein the intermediate element is loosely mounted on a step of the frame, wherein a cover is arranged stationarily in a process chamber for loose mounting on the frame to form the process box, and wherein the cover is configured such that coatings of the substrates are thermally treatable by radiation supplied on the top side of the cover; and a movement mechanism for moving the cover and/or the transportable process carrier, wherein the movement mechanism is configured such that the cover is mountable on the frame. 9. A method for processing substrates coated on one side in the arrangement according to claim 8 , comprising: installing and loading a transportable process carrier, including in a first alternative, preparing the base, by means of which the first substrate can be supported on the uncoated substrate side over a full area of the first substrate and which is configured such that coatings of the substrates are thermally treatable by radiation supplied on the underside of the base, and loose mounting of a frame on the base for connecting the base to a cover or, in a second alternative, preparing the base, by means of which the first substrate can be supported over the full area of the first substrate and which is configured such that coatings of the substrates are thermally treatable by radiation supplied on the underside of the base, wherein the base is fixedly connected to the frame, which serves for connecting the base to the cover, optionally, placing the first substrate on the base, loose mounting of the intermediate element, by means of which the second substrate can be supported on the uncoated substrate side over a full area of the second substrate, in the first alternative, on a step formed by the frame, or, in the second alternative, on a first spacer supported on the base and/or on a second spacer supported on the first substrate, and optionally, placing the second substrate on the intermediate element; transporting the process carrier into a thermal treatment chamber with radiant heaters; loose mounting of a cover arranged stationarily in the thermal treatment chamber on the frame to form the process box, wherein the cover is configured such that coatings of the substrates are thermally treatable by radiation supplied on the top side of the cover; and supplying radiation on the underside of the base and/or supplying radiation on the top side of the cover for the thermal treatment of the coatings of the substrates. 10. An arrangement for processing substrates coated on one side in a process box, comprising: a transportable process carrier, including a base, which is configured such that a first substrate is placeable with an uncoated substrate side with full-area support and coatings of the substrates are thermally treatable by radiation supplied on an underside of the base, an intermediate element, which is configured such that a second substrate is placeable with an uncoated substrate side with full-area contact between the second substrate and the intermediate element, wherein the intermediate element is loosely mounted on a first spacer supported on the base and/or is loosely mounted on a second spacer supported on the first substrate, a cover arranged stationarily in a process chamber with a frame fastened thereon for connecting the base and the cover to form the process box, wherein the cover is configured such that coatings of the substrates are thermally treatable by radiation energy supplied on the top side of the cover; and a movement mechanism for moving the cover
characterised by substrate supports · CPC title
specially adapted for a single substrate · CPC title
mainly by radiation · CPC title
characterised by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports · CPC title
Electricity · mapped topic
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