Substrate processing apparatus, substrate processing method and storage medium

Patent metadata

Field	Value
Publication number	US-9790597-B2
Application number	US-201715423065-A
Country	US
Kind code	B2
Filing date	Feb 2, 2017
Priority date	Feb 5, 2016
Publication date	Oct 17, 2017
Grant date	Oct 17, 2017

Abstract

A substrate processing apparatus that performs a film formation process on a substrate placed on one side of a rotary table includes: a main heating mechanism configured to heat the substrate; an auxiliary heating mechanism configured to adjust an intensity of light irradiated from the auxiliary heating mechanism in an inward/outward direction of the rotary table; a temperature measurement part configured to detect a temperature distribution of the substrate in the inward/outward direction of the rotary table; a position detection part configured to detect a position of the rotary table in a rotational direction of the rotary table; and a control part configured to control the intensity of the light irradiated from the auxiliary heating mechanism based on a temperature measurement data obtained by the temperature measurement part, a data corresponding to a target temperature distribution of the substrate, and a position detection value detected by the position detection part.

First claim

What is claimed is:

1. A substrate processing apparatus that performs a film formation process on a substrate placed on one side of a rotary table in a vacuum container by revolving the substrate by means of the rotary table and supplying a process gas to a region on the rotary table where the substrate passes through, the substrate processing apparatus comprising:
a main heating mechanism configured to heat the substrate;
an auxiliary heating mechanism installed to face the region on the rotary table where the substrate passes through, and configured to adjust an intensity of a light irradiated from the auxiliary heating mechanism in an inward/outward direction of the rotary table so as to adjust a temperature distribution of the substrate by heating the substrate by irradiating the light in an absorption wavelength range of the substrate;
a temperature measurement part configured to detect the temperature distribution of the substrate in the inward/outward direction of the rotary table;
a position detection part configured to detect a position of the rotary table in a rotational direction of the rotary table; and
a control part configured to control the intensity of the light irradiated from the auxiliary heating mechanism based on a temperature measurement data obtained by the temperature measurement part, a data corresponding to a target temperature distribution of the substrate, and a position detection value detected by the position detection part, when the substrate corresponding to the temperature measurement data passes through a region heated by the auxiliary heating mechanism.

2. The substrate processing apparatus of claim 1 , wherein the temperature measurement part is installed at a position spaced apart from the auxiliary heating mechanism in a circumferential direction of the rotary table.

3. The substrate processing apparatus of claim 1 , wherein the auxiliary heating mechanism comprises a plurality of light-irradiating parts disposed along the inward/outward direction of the rotary table and configured to independently control light intensities of the light-irradiating parts.

4. The substrate processing apparatus of claim 1 , wherein the auxiliary heating mechanism comprises a light-irradiating part configured to allow light irradiated from the light-irradiating part to be moved in the inward/outward direction of the rotary table.

5. The substrate processing apparatus of claim 4 , wherein the light-irradiating part is movable in the inward/outward direction of the rotary table.

6. The substrate processing apparatus of claim 1 , wherein the temperature measurement data is data obtained by associating each of a plurality of divided regions of the substrate divided in the inward/outward direction of the rotary table with an evaluation value corresponding to a temperature of each of the plurality of divided regions, and the data corresponding to the target temperature distribution of the substrate is data obtained by associating each of the plurality of divided regions with a target value corresponding to a target temperature.

7. The substrate processing apparatus of claim 1 , wherein the target temperature distribution of the substrate is a distribution in which a temperature of a region near a center of the substrate differs from that of a region near an outer periphery of the substrate.

8. A substrate processing method using a substrate processing apparatus that performs a film formation process on a substrate placed on one side of a rotary table in a vacuum container by revolving the substrate by means of the rotary table and supplying a process gas to a region on the rotary table where the substrate passes through, wherein the substrate processing apparatus includes an auxiliary heating mechanism installed to face the region on the rotary table where the substrate passes through and configured to adjust an intensity of a light irradiated from the auxiliary heating mechanism in an inward/outward direction of the rotary table so as to adjust a temperature distribution of the substrate by heating the substrate by irradiating the light in an absorption wavelength range of the substrate, the method comprising:
heating the substrate by a main heating mechanism;
detecting, by a temperature measurement part, the temperature distribution of the substrate in the inward/outward direction of the rotary table;
detecting, by a position detection part, a position of the rotary table in a rotational direction of the rotary table; and
controlling the intensity of the light irradiated from the auxiliary heating mechanism based on a temperature measurement data obtained by the temperature measurement part, a data corresponding to a target temperature distribution of the substrate, and a position detection value detected by the position detection part, when the substrate corresponding to the temperature measurement data passes through a region heated by the auxiliary heating mechanism.

9. The substrate processing method of claim 8 , wherein the temperature measurement data is data obtained by associating each of a plurality of divided regions of the substrate divided in the inward/outward direction of the rotary table with an evaluation value corresponding to a temperature of each of the plurality of divided regions, and the data corresponding to the target temperature distribution of the substrate is data obtained by associating each of the plurality of divided regions with a target value corresponding to a target temperature.

10. A non-transitory computer-readable storage medium storing a computer program for use in a substrate processing apparatus that performs a film formation process on a substrate placed on one side of a rotary table in a vacuum container by revolving the substrate by means of the rotary table and supplying a process gas to a region on the rotary table where the substrate passes through, wherein the computer program includes a group of steps of executing the substrate processing method of claim 8 .

Assignees

• Tokyo Electron Ltd

Inventors

• Yamaga Kenichi

Classifications

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0606

  Position monitoring, e.g. misposition detection or presence detection · CPC title

• H10P72/0602

  Temperature monitoring · CPC title