Substrate processing device and substrate processing method for carrying out chemical treatment for substrate

Patent metadata

Field	Value
Publication number	US-9786527-B2
Application number	US-201715442833-A
Country	US
Kind code	B2
Filing date	Feb 27, 2017
Priority date	Aug 20, 2012
Publication date	Oct 10, 2017
Grant date	Oct 10, 2017

Abstract

It is an object to reduce a chemical treating width in a peripheral edge part of a substrate while suppressing deterioration in each of uniformity of the chemical treating width and processing efficiency. In order to achieve the object, a substrate processing device for carrying out a chemical treatment for a substrate using a processing liquid having a reaction rate increased with a rise in temperature includes a substrate holding portion, a rotating portion for rotating the substrate held in the substrate holding portion in a substantially horizontal plane, a heating portion for injecting heating steam to a central part of a lower surface of the substrate to entirely heat the substrate, and a peripheral edge processing portion for supplying the processing liquid from above to a peripheral edge part of the substrate heated by the heating portion, thereby carrying out a chemical treatment for the peripheral edge part.

First claim

What is claimed is:

1. A substrate processing method for carrying out a chemical treatment for a substrate by using a processing liquid having a reaction rate increased with a rise in temperature, the method comprising:
a rotating step of holding a substrate in a substantially horizontal posture and rotating said substrate in a substantially horizontal plane;
a heating step of injecting heating steam into a central part of a lower surface of said substrate to heat said substrate entirely, in parallel with said rotating step; and
a peripheral edge processing step of supplying a processing liquid to a peripheral edge part of said substrate from above said peripheral edge part, thereby carrying out a chemical treatment for said peripheral edge part, in parallel with said heating step.

2. The substrate processing method according to claim 1 , wherein said heating step injects said steam to said lower surface of said substrate via a supply tube inserted into a rotating support shaft of a substrate holding portion that holds said substrate in said substantially horizontal posture.

3. The substrate processing method according to claim 1 , wherein said steam is superheated steam.

4. The substrate processing method according to claim 1 , wherein said peripheral edge processing step regulates a width in a radial direction of said substrate in a portion in which said processing liquid collides with said peripheral edge part.

5. A substrate processing method for carrying out a chemical treatment for a substrate by using a processing liquid having a reaction rate increased with a rise in temperature, the method comprising:
a rotating step of holding a substrate in a substantially horizontal posture and rotating said substrate in a substantially horizontal plane;
a heating step of heating said substrate entirely by injecting heated steam into a central part of a lower surface of said substrate, in parallel with said rotating step; and
a peripheral edge processing step of supplying a processing liquid to a peripheral edge part of said substrate from above said peripheral edge part, thereby carrying out a chemical treatment for said peripheral edge part, in parallel with said heating step.

6. The substrate processing method according to claim 5 , wherein said steam injected into said central part of said lower surface of said substrate spreads from said central part toward said peripheral edge part along said lower surface of said substrate, thereby heating said substrate entirely.

7. A substrate processing method for carrying out a chemical treatment for a substrate by using a processing liquid having a reaction rate increased with a rise in temperature, the method comprising the steps of:
a rotating step of holding a substrate in a substantially horizontal posture and rotating said substrate in a substantially horizontal plane; and
a peripheral edge processing step of injecting heated steam into a central part of a lower surface of said substrate and supplying a processing liquid to above said peripheral edge part, thereby carrying out a chemical treatment for said peripheral edge part, in parallel with said rotating step.

Assignees

• Screen Holdings Co Ltd

Inventors

• Shibayama Nobuyuki

Classifications

• H10P50/667

  by liquid etching only · CPC title

• H10P90/18

  by shaping · CPC title

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P72/0406

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title