Substrate liquid processing apparatus

Patent metadata

Field	Value
Publication number	US-9536761-B2
Application number	US-201514840237-A
Country	US
Kind code	B2
Filing date	Aug 31, 2015
Priority date	Sep 2, 2014
Publication date	Jan 3, 2017
Grant date	Jan 3, 2017

Abstract

A substrate liquid processing apparatus includes a cup 50 configured to receive a processing liquid supplied onto a substrate. The cup includes a ring-shaped first exhaust space 530 in contact with a top opening 50 A, and a ring-shaped second exhaust space 540 which is in contact with an exhaust port 52 and is disposed adjacent to the first exhaust space, and the first exhaust space and the second exhaust space communicate with each other intermittently or continuously along an entire circumference thereof. Further, the cup has an inner wall that confines an inner periphery of the second exhaust space, and the inner wall includes a first wall portion 581 serving as an upper part of the inner wall, and a second wall portion which serves as a lower part of the inner wall and is located at an inner position than the first wall portion in a radial direction.

First claim

We claim:

1. A substrate liquid processing apparatus, comprising:
a holding unit configured to hold a substrate horizontally;
a driving unit configured to rotate the holding unit around a vertical axis;
a nozzle configured to supply a processing liquid onto the substrate which is rotated while being held by the holding unit; and
a cup configured to receive the processing liquid supplied onto the substrate,
wherein the cup comprises a top opening at a central top end portion thereof and an exhaust port through which an inside of the cup is exhausted,
the cup further comprises a ring-shaped first exhaust space in contact with the top opening, and a ring-shaped second exhaust space which is in contact with the exhaust port and is disposed adjacent to the first exhaust space,
the ring-shaped first exhaust space and the ring-shaped second exhaust space communicate with each other intermittently or continuously along an entire circumference thereof,
the ring-shaped first exhaust space has a ring-shaped liquid reservoir configured to receive the processing liquid supplied onto the substrate,
a ring-shaped guide wall, which is configured to separate the ring-shaped first exhaust space from the ring-shaped second exhaust space and guide the processing liquid supplied onto the substrate toward the liquid reservoir, is provided,
a ring-shaped isolation wall, which is configured to separate the ring-shaped first exhaust space from the ring-shaped second exhaust space and suppress the processing liquid received in the liquid reservoir from being introduced into the ring-shaped second exhaust space, is provided,
the cup further comprises an inner wall configured to confine an inner periphery portion of the ring-shaped second exhaust space, and the inner wall comprises a first wall portion serving as an upper part of the inner wall, and a second wall portion which serves as a lower part of the inner wall and is located at an inner position than the first wall portion in a radial direction, and
the inner wall is located at an inner position than the ring-shaped isolation wall in the radial direction.

2. The substrate liquid processing apparatus of claim 1 ,
wherein the inner wall further comprises a middle wall portion which is provided between the first wall portion and the second wall portion such that a position of a front surface of the middle wall portion becomes closer to the second wall portion from the first wall portion as it goes downwards.

3. The substrate liquid processing apparatus of claim 2 ,
wherein the middle wall portion is an inclined portion having an inclined surface.

4. The substrate liquid processing apparatus of claim 1 ,
wherein an outer periphery of the ring-shaped second exhaust space at a region where the exhaust port is provided is located at an outer position than the outer periphery of the ring-shaped second exhaust space at a region where the exhaust port is not provided.

5. The substrate liquid processing apparatus of claim 1 ,
wherein an inner-side end of the exhaust port is located at an inner position than the first wall portion in the radial direction.

6. The substrate liquid processing apparatus of claim 1 , further comprising:
a rear surface processing unit, surrounding the holding unit, configured to process a rear surface of the substrate and placed under the substrate held by the holding unit, wherein the first wall portion is located at an outer position of the rear surface processing unit in the radial direction, and the second wall portion is positioned under the rear surface processing unit.

7. The substrate liquid processing apparatus of claim 6 ,
wherein the rear surface processing unit is a heating unit configured to heat the rear surface of the substrate.

8. The substrate liquid processing apparatus of claim 1 ,
wherein a member constituting the holding unit is provided up to a height position of the inner wall, and
the first wall portion is located at an outer position of the member constituting the holding unit in the radial direction, and the second wall portion is positioned under the member constituting the holding unit.

9. The substrate liquid processing apparatus of claim 1 ,
wherein the first wall portion and the second wall portion of the inner wall are extended in a vertical direction.

10. The substrate liquid processing apparatus of claim 1 ,
wherein a lower end of the ring-shaped guide wall and an upper end of the ring-shaped isolation wall are connected, and
the ring-shaped isolation wall or the ring-shaped guide wall is provided with a plurality of communication paths, through which the ring-shaped first exhaust space and the ring-shaped second exhaust space communicate with each other, intermittently along the entire circumference thereof.

11. The substrate liquid processing apparatus of claim 1 ,
wherein an upper end portion of the ring-shaped second exhaust space is confined by the ring-shaped guide wall,
an outer periphery portion of the ring-shaped second exhaust space is confined by the ring-shaped isolation wall,
a lower end portion of the ring-shaped second exhaust space is confined by a bottom wall of the cup, and
the inner periphery portion of the ring-shaped second exhaust space is confined by the inner wall.

Assignees

• Tokyo Electron Ltd

Inventors

• Amano Yoshifumi
• Ito Yuki
• Okamoto Eiichiro

Classifications

• H10P72/0448 Primary

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H01L21/6715 Primary

  Electricity · mapped topic