Apparatus for variable substrate temperature control

Patent metadata

Field	Value
Publication number	US-9783889-B2
Application number	US-201213430278-A
Country	US
Kind code	B2
Filing date	Mar 26, 2012
Priority date	Mar 26, 2012
Publication date	Oct 10, 2017
Grant date	Oct 10, 2017

Abstract

In some embodiments, an apparatus for variable substrate temperature control may include a heater moveable along a central axis of a substrate support; a seal ring disposed about the heater, the seal ring configured to interface with a shadow ring disposed above the heater to form a seal; a plurality of spacer pins configured to support a substrate and disposed within a plurality of through holes formed in the heater, the plurality of spacer pins moveable parallel to the central axis, wherein the plurality of spacer pins control a first distance between the substrate and the heater and a second distance between the substrate and the shadow ring; and a resilient element disposed beneath the seal ring to bias the seal ring toward a backside surface of the heater.

First claim

The invention claimed is:

1. An apparatus for variable substrate temperature control, comprising:
a heater moveable along a central axis of the apparatus;
a shadow ring disposed above the heater;
a seal ring disposed about the heater, the seal ring configured to interface with the shadow ring to form a seal between the seal ring and the shadow ring;
a plurality of spacer pins configured to support a substrate and disposed within a first set of a plurality of through holes formed in the heater, the plurality of spacer pins moveable parallel to the central axis of the apparatus, wherein the plurality of spacer pins control a first distance between the substrate and the heater and a second distance between the substrate and the shadow ring; and
a resilient element disposed beneath the seal ring to bias the seal ring toward a backside surface of the heater.

2. The apparatus of claim 1 , further comprising:
a ring disposed on a peripheral edge of the heater, the ring having a top surface configured to interface with a portion of the shadow ring, wherein a top surface of the ring is disposed above a top surface of the heater.

3. The apparatus of claim 2 , wherein the ring is configured to form a gap between the ring and the heater, the gap configured to direct a flow of gas to an area proximate the substrate.

4. The apparatus of claim 2 , wherein the shadow ring comprises one or more protrusions configured to interface with a corresponding feature formed in the top surface of the ring.

5. The apparatus of claim 1 , further comprising:
an outer ring disposed about the shadow ring and configured to support the shadow ring.

6. The apparatus of claim 5 , wherein the shadow ring comprises one or more outwardly extending tabs configured to rest atop the outer ring.

7. The apparatus of claim 1 , further comprising:
a plurality of alignment pins disposed within a second set of a plurality of through holes formed in the heater and moveable parallel to the central axis, wherein each of the alignment pins comprise an end configured to interface with a corresponding feature of the shadow ring.

8. The apparatus of claim 1 , wherein the resilient element is further configured to cause the seal ring to interface with a shadow ring to form the seal.

9. The apparatus of claim 1 , wherein each of the plurality of spacer pins comprise an outwardly extending flange to support the substrate and a tip protruding from a first end of the spacer pin, the tip extending above a top surface of the substrate when supported by the flange, wherein the tip is configured to interface with the shadow ring to provide a predetermined gap between the substrate and the shadow ring.

10. The apparatus of claim 1 , wherein the first set of plurality of through holes comprise a first end configured to allow the plurality of spacer pins to be recessed beneath a top surface of the heater.

11. A processing system, comprising:
a processing chamber having an inner volume;
an inlet to provide a process gas to the inner volume;
an exhaust disposed in the inner volume to facilitate removal of one or more gases from the process chamber;
a substrate support disposed in the inner volume and below the inlet, wherein the substrate support further comprises:
a heater moveable along a central axis of the substrate support;
a shadow ring disposed above the heater;
a seal ring disposed about the heater, the seal ring configured to interface with the shadow ring to form a seal between the seal ring and the shadow ring;
a plurality of spacer pins configured to support a substrate and disposed within a first set of a plurality of through holes formed in the heater, the plurality of spacer pins moveable parallel to the central axis of the substrate support, wherein the plurality of spacer pins control a first distance between the substrate and the heater and a second distance between the substrate and the shadow ring; and
a resilient element disposed beneath the seal ring to bias the seal ring toward a backside surface of the heater.

12. The processing system of claim 11 , further comprising:
a ring disposed on a peripheral edge of the heater, the ring having a top surface configured to interface with a portion of the shadow ring, wherein a top surface of the ring is disposed above a top surface of the heater.

13. The processing system of claim 12 , wherein the ring is configured to form a gap between the ring and the heater, the gap configured to direct a flow of gas to an area proximate the substrate.

14. The processing system of claim 12 , wherein the shadow ring comprises one or more protrusions configured to interface with a corresponding feature formed in the top surface of the ring.

15. The processing system of claim 11 , further comprising:
an outer ring disposed about the shadow ring and supported by an inwardly extending flange of the exhaust.

16. The processing system of claim 15 , wherein the shadow ring comprises one or more outwardly extending tabs configured to rest atop the outer ring.

17. The processing system of claim 11 , further comprising:
a plurality of alignment pins disposed within a second set of a plurality of through holes formed in the heater and moveable parallel to the central axis of the substrate support, wherein each of the alignment pins comprise an end configured to interface with a corresponding feature of the shadow ring.

18. The processing system of claim 11 , wherein the resilient element is further configured to cause the seal ring to interface with a shadow ring to form the seal.

19. The processing system of claim 11 , wherein each of the plurality of spacer pins comprise an outwardly extending flange to support the substrate and a tip protruding from a first end of the spacer pin, the tip extending above a top surface of the substrate when supported by the flange, wherein the tip is configured to interface with the shadow ring to provide a predetermined gap between the substrate and the shadow ring.

20. The processing system of claim 11 , wherein the first set of plurality of through holes comprise a first end configured to allow the plurality of spacer pins to be recessed beneath a top surface of the heater.

Assignees

• Tzu Gwo-Chuan
• Yuan Xiaoxiong
• Khandelwal Amit
• Gelatos Avgerinos V
• Cuvalci Olkan
• Wu Kai
• Karazim Michael P
• Applied Materials Inc

Inventors

• Tzu Gwo-Chuan
• Yuan Xiaoxiong
• Khandelwal Amit
• Gelatos Avgerinos V
• Cuvalci Olkan
• Wu Kai
• Karazim Michael P

Classifications

• C23C16/46 Primary

  characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) · CPC title

• C23C16/481

  by radiant heating of the substrate · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

• C23C16/4586

  Elements in the interior of the support, e.g. electrodes, heating or cooling devices · CPC title

• C23C16/45565

  Shower nozzles · CPC title