Multifunctional wafer pretreatment chamber and chemical vapor deposition device
US-2024337011-A1 · Oct 10, 2024 · US
Elements in the interior of the support, e.g. electrodes, heating or cooling devices
Elements in the interior of the support, e.g. electrodes, heating or cooling devices · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/4586 |
| Official title | {Elements in the interior of the support, e.g. electrodes, heating or cooling devices} |
| Display label | Elements in the interior of the support, e.g. electrodes, heating or cooling devices |
| Total patents | 1,841 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 62 |
| 2016 | 65 |
| 2017 | 88 |
| 2018 | 111 |
| 2019 | 135 |
| 2020 | 178 |
| 2021 | 184 |
| 2022 | 222 |
| 2023 | 247 |
| 2024 | 240 |
| 2025 | 247 |
| 2026 | 62 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Electrostatic chuck
US-2024297063-A1 · Sep 5, 2024 · US
Electrostatic chuck heater and film deposition apparatus
US-2024203779-A1 · Jun 20, 2024 · US
Substrate supporting device, a substrate processing apparatus including the same, and a substrate processing method using the same
US-2024162017-A1 · May 16, 2024 · US
Semiconductor processing tool and methods of operation
US-2024084455-A1 · Mar 14, 2024 · US
Apparatus for radical-based deposition of dielectric films
US-2015376788-A1 · Dec 31, 2015 · US
System and method for heating plasma exposed surfaces
US-9224583-B2 · Dec 29, 2015 · US
Substrate thermal control in an epi chamber
US-2015368829-A1 · Dec 24, 2015 · US
Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors
US-9218944-B2 · Dec 22, 2015 · US
Electrostatic chuck having reduced arcing
US-9218997-B2 · Dec 22, 2015 · US
Substrate mounting mechanism, and substrate processing apparatus
US-9202728-B2 · Dec 1, 2015 · US
Rotating vacuum chamber coupling assembly
US-9203200-B2 · Dec 1, 2015 · US
Plasma processing method and apparatus
US-2015340208-A1 · Nov 26, 2015 · US
Film forming apparatus
US-9163311-B2 · Oct 20, 2015 · US
Device for depositing a layer on a semiconductor wafer by means of vapour deposition
US-9153472-B2 · Oct 6, 2015 · US
Substrate Tray and Substrate Processing Apparatus Including Same
US-2015279619-A1 · Oct 1, 2015 · US
Method of manufacturing semiconductor device
US-2015275357-A1 · Oct 1, 2015 · US
Removable substrate tray and assembly and reactor including same
US-2015267295-A1 · Sep 24, 2015 · US
Epitaxial growth systems
US-2015259826-A1 · Sep 17, 2015 · US
Substrate processing apparatus
US-2015252476-A1 · Sep 10, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/4586?
- CPC C23C16/4586 is the Cooperative Patent Classification code for “Elements in the interior of the support, e.g. electrodes, heating or cooling devices.”
- How many patents are filed under CPC C23C16/4586 (Elements in the interior of the support, e.g. electrodes, heating or cooling devices)?
- Our database includes 1,841 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/4586 growing?
- Publication counts under this code: 240 in 2024 vs 247 in 2025 (latest complete years).