Lithography using high selectivity spacers for pitch reduction

Patent metadata

Field	Value
Publication number	US-9773676-B2
Application number	US-201514877416-A
Country	US
Kind code	B2
Filing date	Oct 7, 2015
Priority date	Dec 4, 2013
Publication date	Sep 26, 2017
Grant date	Sep 26, 2017

Abstract

A method embodiment for patterning a semiconductor device includes patterning a dummy layer over a hard mask to form one or more dummy lines. A sidewall aligned spacer is conformably formed over the one or more dummy lines and the hard mask. A first reverse material layer is formed over the sidewall aligned spacer. A first photoresist is formed and patterned over the first reverse material layer. The first reverse material layer using the first photoresist as a mask, wherein the sidewall aligned spacer is not etched. The one or more dummy lines are removed, and the hard mask is patterned using the sidewall aligned spacer and the first reverse material layer as a mask. A material used for forming the sidewall aligned spacer has a higher selectivity than a material used for forming the first reverse material layer.

First claim

What is claimed is:

1. A method comprising:
patterning a dummy layer over a mask layer to form one or more dummy lines;
forming a spacer layer over top surfaces and sidewalls of the one or more dummy lines, wherein the spacer layer comprises a metal oxide or a metal nitride, and wherein the forming of the spacer layer comprises forming the spacer layer of titanium nitride or titanium oxide;
forming a first reverse material layer over the spacer layer, wherein the spacer layer and the first reverse material layer comprise different materials, and wherein the forming of the first reverse material layer comprises forming the first reverse material layer of spin on glass (SOG);
patterning the first reverse material layer, wherein the patterning of the first reverse material layer comprises etching the first reverse material layer at a faster rate than the spacer layer;
removing the one or more dummy lines; and
patterning the mask layer using the spacer layer and the first reverse material layer as a mask.

2. The method of claim 1 , further comprising:
forming a first photoresist over the first reverse material layer; and
patterning the first photoresist, wherein patterning the first reverse material layer further comprises etching the first reverse material layer using the first photoresist as a mask.

3. The method of claim 1 , wherein the forming of the spacer layer comprises forming a first portion of the spacer layer over a top surface of the one or more dummy lines to have substantially a same thickness as a second portion of the spacer layer on a sidewall of the one or more dummy lines.

4. The method of claim 1 , wherein the removing of the one or more dummy lines comprises:
removing lateral portions of the spacer layer to expose the one or more dummy lines and portions of the mask layer; and
using an ashing process to remove the one or more dummy lines.

5. The method of claim 4 , wherein the removing of the lateral portions of the spacer layer comprises using chlorine as an etchant.

6. The method of claim 1 further comprising prior to the patterning of the first reverse material layer, etching the first reverse material layer so that a top surface of the first reverse material layer is lower than a top surface of the spacer layer.

7. The method of claim 1 , wherein the patterning of the first reverse material layer comprises using tetrafluoromethane, trifluoromethane, difluoromethane, or octafluorocyclobutane as a chemical etchant.

8. The method of claim 1 further comprising, after the patterning of the first reverse material layer:
forming a second photoresist over the spacer layer;
forming one or more openings in the second photoresist, exposing the spacer layer;
forming a second reverse material layer in the one or more openings;
removing the second photoresist; and
etching back a top portion of the second reverse material layer to a level below a top surface of the spacer layer.

9. The method of claim 1 , wherein the patterning of the dummy layer comprises patterning the dummy layer at a minimum pitch achievable by a photolithography system.

10. A method comprising:
forming mandrels over a device layer;
forming a spacer layer over a top surface and sidewalls of the mandrels;
forming a first reverse material layer over the spacer layer;
selectively patterning the first reverse material layer by etching the first reverse material layer at a faster rate than the spacer layer, wherein after the selectively patterning of the first reverse material layer, remaining portions of the first reverse material layer are disposed over a first portion of the spacer layer;
forming a patterned second reverse material layer on a second portion of the spacer layer; and
patterning the device layer using the spacer layer, the remaining portions of the first reverse material layer, and the patterned second reverse material layer as a mask.

11. The method of claim 10 , wherein the spacer layer comprises titanium nitride or titanium oxide, and wherein the first reverse material layer and the patterned second reverse material layer comprise spin on glass.

12. The method of claim 10 further comprising prior to the selectively patterning of the first reverse material layer, etching back the first reverse material layer to expose a top surface of the spacer layer.

13. The method of claim 10 , wherein the patterning of the device layer comprises using the first reverse material layer to form features of a different width than the remaining portions of the spacer layer.

14. The method of claim 10 , wherein the patterning of the device layer comprises using the patterned second reverse material layer to form features in a perpendicular direction to the remaining portions of the spacer layer.

15. The method of claim 10 , wherein the forming of the patterned second reverse material layer comprises:
forming a mask layer over spacer layer;
patterning one or more openings in the mask layer to expose the second portion of the spacer layer;
depositing a material of the patterned second reverse material layer in the one or more openings; and
removing the mask layer.

16. The method of claim 10 further comprising after the forming of the patterned second reverse material layer, removing the mandrels.

17. A method comprising:
patterning a dummy layer over a hard mask in a semiconductor device to form one or more dummy lines;
depositing a spacer layer over the one or more dummy lines;
forming one or more reverse material layers over the spacer layer, wherein the forming of the one or more reverse material layers comprises:
blanket depositing a first one of the one or more reverse material layers;
recessing a top surface of the first one of the one or more reverse material layers below a top surface of the spacer layer; and
selectively etching the first one of the one or more reverse material layers using a patterned photoresist as a mask, wherein the selectively etching of the first one of the one or more reverse material layers comprises etching the spacer layer at a lower rate than the first one of the one or more reverse material layers;

removing lateral portions of the spacer layer to expose the one or more dummy lines;
removing the dummy lines; and
patterning the hard mask using remaining portions of the spacer layer and the one or more reverse material layers as a mask.

18. The method of claim 17 further comprising: after the selectively etching of the first one of the one or more reverse material layers, forming a patterned second one of the one or more reverse material layers adjacent the first one of the one or more reverse material layers.

19. The method of claim 17 , wherein the spacer layer comprises titanium nitride or titanium oxide, and wherein the one or more reverse material layers comprise spin on glass.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Chang Yu-Sheng
• Tsai Cheng-Hsiung
• Lee Chung-Ju
• Chen Hai-Ching
• Lee Hsiang-Huan
• Shieh Ming-Feng
• Liu Ru-Gun
• Shue Shau-Lin
• Bao Tien-I
• Gau Tsai-Sheng
• Wu Yung-Hsu

Classifications

• H10P76/4085

  characterised by the processes involved to create the masks · CPC title

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P50/642

  Chemical etching · CPC title

• H10P50/71

  using masks for conductive or resistive materials · CPC title

• H10P14/69394

  the material containing titanium, e.g. TiO2 · CPC title