Anodized showerhead

Patent metadata

Field	Value
Publication number	US-9758869-B2
Application number	US-77916710-A
Country	US
Kind code	B2
Filing date	May 13, 2010
Priority date	May 13, 2009
Publication date	Sep 12, 2017
Grant date	Sep 12, 2017

Abstract

Embodiments disclosed herein generally relate to an apparatus having an anodized gas distribution showerhead. In large area, parallel plate RF processing chambers, mastering the RF return path can be challenging. Arcing is a frequent problem encountered in RF processing chambers. To reduce arcing in RF processing chambers, straps may be coupled to the susceptor to shorten the RF return path, a ceramic or insulating or anodized shadow frame may be coupled to the susceptor during processing, and an anodized coating may be deposited onto the edge of the showerhead that is nearest the chamber walls. The anodized coating may reduce arcing between the showerhead and the chamber walls and therefore enhance film properties and increase deposition rate.

First claim

The invention claimed is:

1. A gas distribution showerhead, comprising:
a showerhead body having a plurality of gas passages extending therethrough, wherein the plurality of gas passages extend from a first surface of the showerhead body to a second surface of the showerhead body, and wherein the second surface of the showerhead body comprises:
a central portion, wherein no anodized coating is disposed on the central portion; and
an outer portion, wherein an anodized coating is disposed on at least part of the outer portion.

2. The gas distribution showerhead of claim 1 ,
wherein the outer portion of the second surface of the showerhead body further comprises a first flange portion, wherein the first flange portion comprises:
a first surface;
a second surface opposite the first surface and coextensive with the second surface of the showerhead body;
an edge surface connecting the first and second surfaces of the first flange portion;
wherein the anodized coating covers at least part of the edge surface;
wherein the anodized coating covers the first surface of the first flange portion from the edge surface to a first distance from the edge surface; and
wherein the anodized coating covers the second surface of the first flange portion from the edge surface to a second distance from the edge surface, wherein the second distance is greater than the first distance.

3. The gas distribution showerhead of claim 1 , wherein the showerhead body comprises aluminum.

4. The gas distribution showerhead of claim 3 , wherein the anodized coating comprises a material selected from the group consisting of Al 2 O 3 , SiO 2 , polytetrafluoroethylene and combinations thereof.

5. The gas distribution showerhead of claim 4 , wherein the anodized coating has a thickness between about 50 microns and about 63 microns.

6. The gas distribution showerhead of claim 1 , wherein the anodized coating comprises a material selected from the group consisting of Al 2 O 3 , SiO 2 , polytetrafluoroethylene and combinations thereof.

7. The gas distribution showerhead of claim 6 , wherein the anodized coating has a thickness between about 50 microns and about 63 microns.

8. A plasma processing apparatus, comprising:
a processing chamber body having one or more walls and a floor;
a susceptor disposed in the processing chamber body and movable between a first position and a second position;
one or more straps, wherein at least one strap is coupled on one end to the susceptor and on another end to the floor or at least one of the one or more walls;
a showerhead body disposed in the processing chamber body opposite to the susceptor and having one or more gas passages extending therethrough, the showerhead body comprising:
a first surface facing away from the susceptor;
a second surface facing the susceptor, the second surface comprising portions adjacent to the walls and a central portion; and
an anodized coating disposed over portions of the second surface that are adjacent to the walls and wherein no anodized coating is disposed on the central portion; and

a bracket coupled to the flange, wherein the bracket is separate and distinct from the anodized coating; and
a shadow frame disposed in the processing chamber body between the susceptor and the showerhead, the shadow frame movable between a third position spaced from the susceptor and a fourth position in contact with the susceptor.

9. The apparatus of claim 8 , wherein the shadow frame comprises a ceramic material.

10. The apparatus of claim 9 , wherein the shadow frame comprises Al 2 O 3 .

11. The apparatus of claim 8 , wherein the anodized coating comprises a material selected from the group consisting of Al 2 O 3 , SiO 2 , polytetrafluoroethylene and combinations thereof.

12. The apparatus of claim 11 , wherein the showerhead body comprises aluminum.

13. The apparatus of claim 8 , wherein the anodized coating has a thickness between about 50 microns and about 63 microns.

14. The apparatus of claim 8 , wherein the straps are symmetrically disposed along a first axis and asymmetrically disposed along a second axis perpendicular to the first axis.

15. A plasma enhanced chemical vapor deposition apparatus, comprising:
a chamber body having a plurality of walls and a chamber floor;
a susceptor disposed in the chamber body and movable between a first position spaced a first distance from the chamber floor and a second position spaced a second distance greater than the first distance from the chamber floor;
a plurality of straps, wherein at least one strap is coupled on one end to the susceptor and on another end to the chamber floor or at least one of the plurality of walls, and wherein the plurality of straps are unevenly distributed along the susceptor;
a gas distribution showerhead body disposed in the chamber body opposite the susceptor, the gas distribution showerhead body having:
a plurality of gas passages extending therethrough;
a first surface facing away from the susceptor;
a second surface facing the susceptor and having a central portion and an edge portion;
a flange extending from the showerhead body, wherein the flange has a surface coextensive with the first surface of the showerhead body, and wherein the flange has a third surface opposite the first surface and distinct from the second surface; and
wherein the second surface of the gas distribution showerhead body has an anodized coating disposed over less than the entire second surface of the gas distribution showerhead body, the anodized coating extending above the second surface of the gas distribution showerhead body, the anodized coating having a thickness over the edge portion that is greater than a thickness over the central portion; and

a bracket coupled to the flange of the gas distribution showerhead body, wherein the bracket is separate and distinct from the anodized coating.

16. The apparatus of claim 15 , further comprising a shadow frame disposed between the gas distribution showerhead body and the susceptor.

17. The apparatus of claim 16 , wherein the shadow frame comprises a ceramic material.

18. The apparatus of claim 17 , wherein the shadow frame comprises Al 2 O 3 .

19. The apparatus of claim 15 , wherein the anodized coating comprises a material selected from the group consisting of Al 2 O 3 , SiO 2 , polytetrafluoroethylene and combinations thereof.

20. The apparatus of claim 19 , wherein the showerhead body comprises aluminum.

21. The apparatus of claim 15 , wherein the anodized coating has a thickness between about 50 microns and about 63 microns.

22. The apparatus of claim 15 , wherein the straps are symmetrically disposed along a first axis and asymmetrically disposed along a second axis perpendicular to the first axis.

23. The gas distribution showerhead of claim 2 , wherein the outer portion of the showerhead body further comprises a second flange portion, wherein the second flange portion comprises:
a first surface coextensive with the first surface of the showerhead body;
a second surface opposite the first surface of the second flange portion; and

an edge surface connecting the first surface of the second flange portion and the second surface of the second flange portion.

Assignees

• Choi Soo Young
• Anwar Suhail
• Furuta Gaku
• Park Beom Soo
• Tiner Robin L
• White John M
• Kurita Shinichi
• Applied Materials Inc

Inventors

• Choi Soo Young
• Anwar Suhail
• Furuta Gaku
• Park Beom Soo
• Tiner Robin L
• White John M
• Kurita Shinichi

Classifications

• H01J37/32577

  Electrical connecting means · CPC title

• H01J37/32559

  Protection means, e.g. coatings · CPC title

• H01J37/32541

  Shape · CPC title

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title

• H01J37/32091

  the radio frequency energy being capacitively coupled to the plasma · CPC title