Semiconductor device and method of manufacturing semiconductor device
US-8999818-B2 · Apr 7, 2015 · US
US9755189B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9755189-B2 |
| Application number | US-201615211444-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 15, 2016 |
| Priority date | Apr 19, 2013 |
| Publication date | Sep 5, 2017 |
| Grant date | Sep 5, 2017 |
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A novel method for forming projections and depressions is provided. A novel sealing structure is provided. A novel light-emitting device is provided. A first step of forming a film containing at least two kinds of metals having different etching rates over a surface; a second step of heating the film so that the metal having a lower etching rate segregates; a third step of selectively etching the metal having a higher etching rate; and a fourth step of selectively etching the surface using a residue containing the metal having a lower etching rate are included.
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What is claimed is: 1. A sealing structure comprising: a substrate; a sealing substrate opposite a surface of the substrate; a sealant between the substrate and the sealing substrate; and a sealed structure sealed in a region surrounded by the substrate, the sealing substrate, and the sealant, wherein the surface of the substrate is provided with: projections and depressions; a surface being adjacent to the projections and depressions and being flatter and smoother than the projections and depressions; and a metal film in contact with the flat and smooth surface, wherein the sealant is in contact with the projections and depressions, and wherein the metal film comprises metal elements non-uniformly distributed. 2. The sealing structure according to claim 1 , wherein a surface of the sealing substrate is provided with: projections and depressions; a surface being adjacent to the projections and depressions of the sealing substrate and being flatter and smoother than the projections and depressions of the sealing substrate; and a second film overlapping the flat and smooth surface. 3. The sealing structure according to claim 2 , wherein the sealant is in contact with the second film which the sealing substrate is provided with. 4. The sealing structure according to claim 2 , wherein the substrate comprises at least one of glass, ceramics, a metal, an inorganic material, and a resin. 5. The sealing structure according to claim 2 , wherein the sealing substrate comprises at least one of glass, ceramics, a metal, an inorganic material, and a resin. 6. The sealing structure according to claim 2 wherein the sealant contains glass whose melting point is higher than or equal to 300° C. and lower than or equal to 700° C. 7. An electronic device comprising the sealing structure according to claim 6 . 8. The sealing structure according to claim 1 , wherein the metal elements comprise nickel. 9. A light-emitting device comprising: a substrate; a sealing substrate opposite a surface of the substrate; a sealant between the substrate and the sealing substrate; and a light-emitting element sealed in a region surrounded by the substrate, the sealing substrate, and the sealant, wherein the surface of the substrate is provided with: projections and depressions; a surface being adjacent to the projections and depressions and being flatter and smoother than the projections and depressions a metal film in contact with the flat and smooth surface; and a conductive film overlapping with the surface, wherein the light-emitting element is electrically connected to the conductive film, wherein the sealant is adjacent to the projections and depressions, and wherein the metal film comprises metal elements non-uniformly distributed. 10. The light-emitting device according to claim 9 , wherein the substrate comprises at least one of glass, ceramics, a metal, an inorganic material, and a resin. 11. The light-emitting device according to claim 9 , wherein the sealing substrate comprises at least one of glass, ceramics, a metal, an inorganic material, and a resin. 12. An electronic device comprising the light-emitting device according to claim 9 . 13. The light-emitting device according to claim 9 , wherein the metal elements comprise nickel.
characterised by the processes involved to create the masks · CPC title
characterised by their composition, e.g. multilayer masks · CPC title
Gaseous compositions · CPC title
Local etching · CPC title
Compositions for etching metallic material from a metallic material substrate of different composition · CPC title
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