Multi-layer encapsulated structures

US9752247B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9752247-B2
Application numberUS-201314017510-A
CountryUS
Kind codeB2
Filing dateSep 4, 2013
Priority dateApr 4, 1997
Publication dateSep 5, 2017
Grant dateSep 5, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An electroplating method that includes: a) contacting a first substrate with a first article, which includes a substrate and a conformable mask disposed in a pattern on the substrate; b) electroplating a first metal from a source of metal ions onto the first substrate in a first pattern, the first pattern corresponding to the complement of the conformable mask pattern; and c) removing the first article from the first substrate, is disclosed. Electroplating articles and electroplating apparatus are also disclosed.

First claim

Opening claim text (preview).

What is claimed: 1. A multi-layer device, comprising: a. at least one part comprising: i. at least one first layer comprising at least one first planarized material; ii. at least one second layer comprising at least one core material and at least one second material, whereby the at least one second material completely surrounds the sides of the at least one core material and wherein the at least one core material is completely bounded from below by the first planarized material; and iii. at least one third layer comprising at least one third planarized material wherein the third planarized material completely bounds the at least one core material of the at least one second layer from above; wherein the at least one core material is completely encapsulated by a combination of the at least one first planarized material, the at least one second material, and the at least one third planarized material; and wherein the device is selected from the group of devices consisting of: (1) a device with hollow internal features, (2) a device with cantilever features, (3) a device having a chandelier geometry, (4) a device including a plurality of parts that are connected to one another to form a functional assembly with each of the plurality of parts remaining stationary relative to the other parts, and (5) a device including a plurality of parts that are connected to one another to form a functional assembly with at least two of the parts being movable relative to one another wherein the at least one first planarized material, the at least one second material, and the at least one third planarized material comprise the same material. 2. The device of claim 1 wherein the same material comprises nickel and the at least one core material comprises copper. 3. The device of claim 1 wherein the at least one second layer is a single layer. 4. The device of claim 1 wherein the at least one first planarized material, the at least one second material, the at least one planarized third material, and the at least one core material comprise metals. 5. The device of claim 1 wherein at least one material of the at least one first planarized material, the at least one second material, the at least one third planarized material, and the at least one core material comprise a material selected from the group consisting of: (1) a polymer material, (2) a ceramic material, (3) a semiconductor material. 6. The device of claim 1 wherein the device is a microscopic device with features in range of a few microns. 7. The device of claim 1 wherein the device is a mesoscopic device.

Assignees

Inventors

Classifications

  • Electrolytic deposition, i.e. electroplating; Electroless plating · CPC title

  • Electroplating combined with mechanical treatment during the deposition · CPC title

  • Processes for making multi-layered devices not provided for in groups B81C2201/0176 - B81C2201/0192 · CPC title

  • 3D structures, e.g. superposed patterned layers · CPC title

  • C25D5/10Primary

    Electroplating with more than one layer of the same or of different metals (for bearings C25D7/10) · CPC title

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What does patent US9752247B2 cover?
An electroplating method that includes: a) contacting a first substrate with a first article, which includes a substrate and a conformable mask disposed in a pattern on the substrate; b) electroplating a first metal from a source of metal ions onto the first substrate in a first pattern, the first pattern corresponding to the complement of the conformable mask pattern; and c) removing the first…
Who is the assignee on this patent?
Univ Southern California
What technology area does this patent fall under?
Primary CPC classification C25D5/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 05 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).