Apparatus for liquid treatment of disc-shaped articles and heating system for use in such apparatus

Patent metadata

Field	Value
Publication number	US-9748120-B2
Application number	US-201313932926-A
Country	US
Kind code	B2
Filing date	Jul 1, 2013
Priority date	Jul 1, 2013
Publication date	Aug 29, 2017
Grant date	Aug 29, 2017

Abstract

An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. The infrared heating elements are arranged in a nested configuration so as to define individually controllable inner, middle and outer heating zones adjacent a disc-shaped article when positioned on the spin chuck.

First claim

What is claimed is:

1. Apparatus for treating a disc-shaped article, comprising:
a spin chuck for holding the disc-shaped article in a predetermined orientation relative to an upper surface of the spin chuck; and
at least three individually-controllable heating elements mounted above the upper surface of the spin chuck and below the disc-shaped article when mounted on the spin chuck, wherein the at least three individually-controllable heating elements are mounted in a stationary manner with respect to rotation of the spin chuck,
wherein the at least three individually-controllable heating elements are arranged in a nested configuration so as to define individually-controllable inner, middle and outer heating zones adjacent to the disc-shaped article when positioned on the spin chuck.

2. The apparatus according to claim 1 , wherein each of the at least three individually-controllable heating elements has at least one of a shape and a position such that each of the at least three individually-controllable heating elements heats regions of differing distance from an axis of rotation of the spin chuck.

3. The apparatus according to claim 2 , wherein each of the at least three individually-controllable heating elements comprises a curved portion that extends generally along an arc of a circle that is eccentric to the axis of rotation of the spin chuck.

4. The apparatus according to claim 1 , wherein each the at least three individually-controllable heating element comprises two straight portions interconnected by a curved portion.

5. The apparatus according to claim 4 , wherein the two straight portions are parallel to one another.

6. The apparatus according to claim 1 , wherein each of the at least three individually-controllable heating element comprises a curved portion extending along an arc of a circle, and wherein the circle for each heating element is concentric with the circle for at least two others of the at least three individually-controllable heating elements.

7. The apparatus according to claim 1 , wherein a circle circumscribing emitting portions of any one of the at least three individually-controllable heating elements does not intersect a circle circumscribing emitting portions of any others of the at least three individually-controllable heating elements.

8. The apparatus according to claim 1 , further comprising a plate that is transparent to radiation emitted by the at least three individually-controllable heating elements, the plate being positioned between the at least three individually-controllable heating elements and the disc-shaped article when positioned on the spin chuck.

9. The apparatus according to claim 8 , wherein the plate is part of a housing that surrounds the at least three individually-controllable heating elements.

10. The apparatus according to claim 9 , wherein the housing is mounted in a stationary manner with respect to rotation of the spin chuck.

11. The apparatus of claim 1 , wherein the at least three individually-controllable heaters comprise infrared heaters.

Assignees

• Lam Res Ag

Inventors

• Crabb Kevin Matthew
• Engesser Philipp
• Badam Vijay Kumar

Classifications

• H10P72/0436 Primary

  mainly by radiation · CPC title

• F27B5/14

  Arrangements of heating devices · CPC title

• F27D2099/0008

  Resistor heating · CPC title

• F27B17/0025

  specially adapted for treating semiconductor wafers · CPC title

• F27D5/0037

  Supports specially adapted for semi-conductors · CPC title