Partially dielectric isolated fin-shaped field effect transistor (FinFET)

Patent metadata

Field	Value
Publication number	US-9735277-B2
Application number	US-201615336654-A
Country	US
Kind code	B2
Filing date	Oct 27, 2016
Priority date	Dec 14, 2015
Publication date	Aug 15, 2017
Grant date	Aug 15, 2017

Abstract

One embodiment provides a method comprising etching a fin of a fin-shaped field effect transistor (FinFET) to form a reduced fin, and laterally etching the reduced fin to form a fin channel including a first fin channel sidewall and a second fin channel sidewall opposing the first fin channel sidewall. The method further comprises forming a first thin dielectric tunnel and a second thin dielectric tunnel on the first fin channel sidewall and the second fin channel sidewall, respectively. Each thin dielectric tunnel prevents lateral epitaxial crystal growth on the fin channel. The method further comprises etching an insulator layer disposed between the fin channel and a substrate of the FinFET to expose portions of a substrate surface of the substrate. A source epitaxy and a drain epitaxy are formed from vertical epitaxial crystal growth on the exposed portions of the substrate surface after epitaxial deposition.

First claim

What is claimed is:

1. A semiconductor structure comprising:
a substrate including a substrate surface;
a fin channel including a first fin channel sidewall and a second fin channel sidewall opposing the first fin channel sidewall;
a first thin dielectric tunnel and a second thin dielectric tunnel disposed on the first fin channel sidewall and the second fin channel sidewall, respectively, wherein each thin dielectric tunnel prevents lateral epitaxial crystal growth on the fin channel;
an insulator layer including a first insulator layer sidewall and a second insulator layer sidewall opposing the first insulator layer sidewall, wherein the insulator layer is disposed between the substrate and the fin channel to insulate the substrate from the fin channel, and the insulator layer is narrower than the substrate, thereby exposing portions of the substrate surface for vertical epitaxial crystal growth;
a gate perpendicular to the fin channel, wherein the fin channel is narrower than the gate;
a spacer including a first spacer sidewall and a second spacer sidewall opposing the first spacer sidewall, wherein the first spacer sidewall and the second spacer sidewall are substantially aligned with the first insulator layer sidewall and the second insulator layer sidewall, respectively;
a dielectric layer disposed between the fin channel and the gate to separate the fin channel from the gate;
a source epitaxy resulting from vertical epitaxial crystal growth on at least one exposed portion of the substrate surface; and
a drain epitaxy resulting from vertical epitaxial crystal growth on at least one other exposed portion of the substrate surface.

2. The semiconductor structure of claim 1 , wherein the fin, the substrate, the source epitaxy and the drain epitaxy comprise at least one semiconductor material.

3. The semiconductor structure of claim 1 , wherein the insulator layer and each thin dielectric tunnel comprise at least one dielectric material.

4. The semiconductor structure of claim 1 , wherein each thin dielectric tunnel has a corresponding thickness that allows current to pass through it, thereby enabling the current to flow through the fin channel from the source epitaxy to the drain epitaxy.

5. The semiconductor structure of claim 4 , wherein each thin dielectric tunnel has a corresponding thickness that is less than one nanometer.

6. The semiconductor structure of claim 1 , wherein each thin dielectric tunnel is formed by one of thermal nitridation or plasma nitridation.

Assignees

• IBM

Inventors

• Cheng Kangguo
• Divakaruni Ramachandra
• Faltermeier Johnathan E
• Nowak Edward J
• Rim Kern

Classifications

• H10P50/642

  Chemical etching · CPC title

• H10P50/282

  of inorganic materials · CPC title

• H10P14/6322

  Formation by thermal treatments (formation by plasma treatment H10P14/6319) · CPC title

• H10P14/6319

  Formation by plasma treatments, e.g. plasma oxidation of the substrate · CPC title

• H10P14/6316

  Formation by nitridation, e.g. nitridation of the substrate · CPC title