SiC single crystal and method for producing same

US9732437B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9732437-B2
Application numberUS-201514824811-A
CountryUS
Kind codeB2
Filing dateAug 12, 2015
Priority dateSep 9, 2014
Publication dateAug 15, 2017
Grant dateAug 15, 2017

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A low-resistance p-type SiC single crystal containing no inclusions is provided. This is achieved by a method for producing a SiC single crystal wherein a SiC seed crystal substrate 14 is contacted with a Si—C solution 24 having a temperature gradient in which the temperature falls from the interior toward the surface, to grow a SiC single crystal, and wherein the method comprises: using, as the Si—C solution, a Si—C solution containing Si, Cr and Al, wherein the Al content is 3 at % or greater based on the total of Si, Cr and Al, and making the temperature gradient y (° C./cm) in the surface region of the Si—C solution 24 satisfy the following formula (1): y≧0.15789x+21.52632 (1) wherein x represents the Al content (at %) of the Si—C solution.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for producing a SiC single crystal wherein a SiC seed crystal substrate is contacted with a Si—C solution having a temperature gradient in which temperature falls from an interior toward a surface, to grow the SiC single crystal, the method comprising: using, as the Si—C solution, a solution containing Si, Cr and Al, wherein an Al content is 3 at % or greater based on a total of Si, Cr and Al; and making a temperature gradient y (° C./cm) in a surface region of the Si—C solution satisfy the following formula (1): y≧ 0.15789 x+ 21.52632  (1) wherein x represents the Al content (at %) of the Si—C solution. 2. The method for producing a SiC single crystal according to claim 1 , comprising limiting the temperature gradient in the surface region of the Si—C solution to a range of 28 to 55° C./cm with the Al content in a range of 3 to 41 (at %) in the Si—C solution.

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Classifications

  • adding crystallising material or reactants forming it in situ to the liquid · CPC title

  • Boots or containers · CPC title

  • using as solvent a component of the crystal composition · CPC title

  • C30B19/10Primary

    Controlling or regulating (controlling or regulating in general G05) · CPC title

  • Heating of the reaction chamber or the substrate · CPC title

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What does patent US9732437B2 cover?
A low-resistance p-type SiC single crystal containing no inclusions is provided. This is achieved by a method for producing a SiC single crystal wherein a SiC seed crystal substrate 14 is contacted with a Si—C solution 24 having a temperature gradient in which the temperature falls from the interior toward the surface, to grow a SiC single crystal, and wherein the method comprises: using, a…
Who is the assignee on this patent?
Toyota Motor Co Ltd
What technology area does this patent fall under?
Primary CPC classification C30B19/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 15 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).