Surfactants and methods of making and using same

Patent metadata

Field	Value
Publication number	US-9562212-B2
Application number	US-201615262678-A
Country	US
Kind code	B2
Filing date	Sep 12, 2016
Priority date	Jan 29, 2013
Publication date	Feb 7, 2017
Grant date	Feb 7, 2017

Abstract

Anionic surfactants have a formula:
R f SO 2 N(H)—CH 2 CH(CH 3 )OH; or R f SO 2 N(H)—(CH 2 CH 2 O) x H, where x is an integer from 2-6. R f is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a) R f SO 2 N[CH 2 CH(CH 3 )OH] 2 ; (b) R f SO 2 N[CH 2 CH(CH 3 )OH][(CH 2 CH 2 O) n H], where n is an integer from 1-6; (c) R f SO 2 N(R)[(CH 2 CH 2 O) p H], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) R f SO 2 N[(CH 2 CH 2 O) q H][(CH 2 CH 2 O) m H], where q is an integer from 1-6 and m is an integer from 3-6. R f is a fluoroalkyl group having 3 to 8 carbon atoms.

First claim

The invention claimed is:

1. A fluorinated sulfonamide surfactant composition comprising:
a neutral surfactant according to the formula:
R f SO 2 N[CH 2 CH(CH 3 )OH] 2 ;
R f SO 2 N[CH 2 CH(CH 3 )OH][(CH 2 CH 2 O) n H], where n is an integer from 1-6; or

R f SO 2 N[(CH 2 CH 2 O) q H][(CH 2 CH 2 O) m H], where q is an integer from 1-6, m is an integer from 1-6, and (q+m)≧3; and
a solvent comprising water;
wherein R f is a fluoroalkyl group having 3 to 8 carbon atoms.

2. A composition according to claim 1 , wherein m is an integer≦3.

3. A composition according to claim 1 , wherein m is 3.

4. A composition according to claim 1 , wherein the fluoroalkyl group is saturated.

5. A composition according to claim 1 , wherein the fluoroalkyl group is straight chain.

6. A composition according to claim 1 , wherein the fluoroalkyl group is a perfluoroalkyl group.

7. A composition according to claim 1 , wherein the fluoroalkyl group has 4 to 6 carbon atoms.

8. A composition according to claim 1 , wherein the fluoroalkyl group is a saturated perfluoroalkyl group having 4 to 6 carbon atoms.

9. A composition according to claim 1 , wherein the fluoroalkyl group is a saturated perfluoroalkyl group having 4 carbon atoms.

10. A composition according to claim 1 , wherein the neutral surfactant includes at least one oligomeric ethylene oxide group bonded to the sulfonamide nitrogen atom, wherein the oligomeric ethylene oxide group has 2-6 ethylene oxide repeat units.

11. A method of treating a surface of a photoresist material, the method comprising:
exposing the photoresist material to a composition according to claim 1 .

Assignees

• 3M Innovative Properties Co

Inventors

• Lamanna William M
• Savu Patricia M
• Kehren Jason M

Classifications

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• C07C303/36

  of amides of sulfonic acids · CPC title

• C08F290/062

  Polyethers · CPC title

• C11D11/0047 Primary

  Chemistry & Metallurgy · mapped topic

• C07C311/00

  Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups · CPC title