Grid, method of manufacturing the same, and ion beam processing apparatus

Patent metadata

Field	Value
Publication number	US-9721747-B2
Application number	US-201615366660-A
Country	US
Kind code	B2
Filing date	Dec 1, 2016
Priority date	Mar 16, 2015
Publication date	Aug 1, 2017
Grant date	Aug 1, 2017

Abstract

A grid of the present invention is a plate-shaped grid provided with a hole. The grid is formed of a carbon-carbon composite including carbon fibers arranged in random directions along a planar direction of the grid, and the hole is formed in the grid so as to cut off the carbon fibers.

First claim

The invention claimed is:

1. A plate-shaped grid provided with a hole, wherein
the grid is formed of a carbon-carbon composite including carbon fibers arranged in random directions along a planar direction of the grid, and
the hole is formed in the grid so as to cut off the carbon fibers.

2. The grid according to claim 1 , wherein the carbon fibers included in the carbon-carbon composite are chopped carbon fibers.

3. The grid according to claim 1 , wherein at least part of the carbon-carbon composite is coated with a different material from the carbon-carbon composite.

4. An ion beam processing apparatus comprising:
a plasma generating unit;
a processing chamber; and
a grid assembly including the grid according to claim 1 and configured to extract ions from plasma generated by the plasma generating unit to the processing chamber.

5. A method of manufacturing a grid comprising:
preparing a plate-shaped carbon-carbon composite including carbon fibers arranged in random directions along a planar direction of the carbon-carbon composite; and
forming a hole in the carbon-carbon composite so as to cut off the carbon fibers by using a processing tool configured to perform cutting by rotary motion.

Assignees

• Canon Anelva Corp

Inventors

• Tsujiyama Masashi
• Nakagawa Yukito
• Yasumatsu Yasushi

Classifications

• H01J37/04 Primary

  Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement {(H01J37/32009, H01J37/32623, H01J37/3266, H01J37/32697 take precedence; electron or ion-optical systems for localised treatment of objects H01J37/3007)} · CPC title

• H01J9/14 Primary

  of non-emitting electrodes · CPC title

• H01J37/08

  Ion sources; Ion guns · CPC title

• H01J37/32422

  Arrangement for selecting ions or species in the plasma · CPC title

• H01J2237/31701

  Ion implantation · CPC title