Vaporizer, ion source, ion beam irradiation apparatus, and an operating method for a vaporizer
US-2024186101-A1 · Jun 6, 2024 · US
US9230772B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9230772-B2 |
| Application number | US-201113338702-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 28, 2011 |
| Priority date | Dec 28, 2011 |
| Publication date | Jan 5, 2016 |
| Grant date | Jan 5, 2016 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Illustrative embodiments of the present invention are directed to devices and methods for ion generation. One such device includes a substrate. The substrate is disposed within a housing that is configured to contain a gas. The substrate includes an interior surface that at least partially defines an interior volume. The substrate also includes a number of channels with walls. Nano-tips are disposed on the walls of the channels.
Opening claim text (preview).
What is claimed is: 1. An ion source comprising: at least one substrate comprising a substrate surface that at least partially defines an interior volume; at least one channel comprising at least one channel wall, the at least one channel extending from the substrate surface into the at least one substrate; a plurality of nano-tips disposed on the at least one channel wall; a housing containing a gas, wherein the at least one substrate is disposed within the housing; a grid disposed in the internal volume; and at least one electrical control circuit configured to apply an electrical potential between the grid and the at least one substrate such that the applied electrical potential causes the plurality of nano-tips to ionize the gas, wherein the grid is spaced apart from the at least one substrate to allow for generated ions that back-stream toward the substrate to collide with the substrate surface and avoid the nano-tips. 2. The ion source of claim 1 , wherein the substrate forms a tube with a first opening and a second opening and the grid is disposed within the interior volume of the tube. 3. The ion source of claim 2 , wherein the tube is cylindrical and the grid is concentric within the tube. 4. The ion source of claim 2 , wherein the tube includes at least three sides. 5. The ion source of claim 1 , wherein the at least one substrate includes two substrates spaced apart from each other, the interior volume is defined between the two substrates, and the grid is disposed within the interior volume between the first substrate and the second substrate. 6. The ion source of claim 1 , wherein the at least one electrical control circuit is configured to apply positive potential to the grid so that the plurality of emitters emit electrons for ionizing the gas. 7. The ion source of claim 1 , wherein the at least one electrical control circuit is configured to apply a negative potential to the grid so that the plurality of emitters attract electrons and ionize the gas. 8. The ion source of claim 1 , wherein the substrate includes a plurality of channels, each channel having at least one side wall, and each side wall including a plurality of nano-tips extending therefrom. 9. The ion source of claim 1 , wherein the channels form through-holes through the substrate. 10. The ion source of claim 1 , further comprising: an extractor disposed adjacent to the interior volume, the extractor configured to extract ions from the interior volume. 11. The ion source of claim 10 , further comprising: a pusher disposed adjacent to the interior volume and opposite from the extractor, the pusher configured to push ions out of the interior volume. 12. A neutron generator comprising: an ion source including: at least one substrate comprising a substrate surface that at least partially defines an interior volume; at least one channel comprising at least one channel wall, the at least one channel extending from the substrate surface into the at least one substrate; a plurality of nano-tips disposed on the at least one channel wall; and a grid disposed in the internal volume; a target; an accelerator section configured to accelerate ions from the ion source towards the target and to strike the ions against the target to generate neutrons; a housing for containing a gas, the ion source, the target, and the accelerator section being disposed within the housing; and at least one electrical control circuit configured to apply an electrical potential between the grid and the at least one substrate such that the applied electrical potential causes the plurality of nano-tips to ionize the gas to generate ions, wherein the grid is spaced apart from the at least one substrate to allow for generated ions that back-stream toward the substrate to collide with the substrate surface and avoid the nano-tips. 13. The neutron generator of claim 12 , wherein the substrate forms a tube with a first opening and a second opening and the grid is disposed within the interior volume of the tube. 14. The neutron generator of claim 13 , wherein the tube is cylindrical and the grid is concentric within the tube. 15. The neutron generator of claim 13 , wherein the tube includes at least three sides. 16. The neutron generator of claim 12 , wherein the at least one substrate includes two substrates spaced apart from each other, the interior volume is defined between the two substrates, and the grid is disposed within the interior volume between the first substrate and the second substrate. 17. The neutron generator of claim 12 , wherein the channels form through-holes through the substrate.
Neutron sources · CPC title
Generating neutron beams (targets for producing nuclear reactions H05H6/00; neutron sources G21G4/02) · CPC title
Ion sources; Ion guns · CPC title
Ion sources; Ion guns {(for examination or processing discharge tubes H01J37/08; ion sources, ion guns for particle spectrometer or separator tubes H01J49/10; ion propulsion F03H1/00)} · CPC title
Point emitters · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.