Phototunable metal-organic framework compositions, and methods of synthesis thereof

US9716239B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9716239-B2
Application numberUS-201615276377-A
CountryUS
Kind codeB2
Filing dateSep 26, 2016
Priority dateSep 25, 2015
Publication dateJul 25, 2017
Grant dateJul 25, 2017

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Abstract

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Some embodiments include a method of preparing a phototuned metal-organic framework by forming a first solution by dissolving ZrOCl 2 .8H 2 O in dimethylformamide (DMF) and formic acid, mixing and dissolving 1,4-phenylenediacrylic acid in a second solution of dimethylformamide (DMF) and trimethylamine, and at least partially mixing the first and second solutions to form a mixture. The method further includes sealing the mixture in an autoclave and heating the mixture to above ambient temperature for a specified period of time to prepare ZrPDA metal-organic framework, and extracting the ZrPDA metal-organic framework and at least partially reacting to a specified degree at least some of ZrPDA metal-organic framework through [2+2] cycloaddition reactions. The specified degree can be tunable based at least in part on at least one of the intensity of UV radiation, the exposure time, and the UV wavelength.

First claim

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The invention claimed is: 1. A metal-organic framework material preparation method comprising: 1) in a first step, forming a first solution by dissolving ZrOCl 2 .8H 2 O in dimethylformamide (DMF) and formic acid; 2) in a second step, mixing and dissolving 1,4-phenylenediacrylic acid in a second solution of dimethylformamide (DMF) and trimethylamine; 3) in a third step, at least partially mixing the first and second solutions to form a mixture; and 4) in a fourth step, sealing the mixture in an autoclave and heating the mixture above ambient for a specified period of time to prepare ZrPDA metal-organic framework, the ZrPDA metal-organic framework being characterized by main peaks observed using X-ray powder diffraction (Cu Kα radiation) comprising the following 2θ angles: 5.3, 9.2, and 10.6. 2. The method of claim 1 , wherein the second step occurs after completion of the first step. 3. The method of claim 1 , wherein the second step is performed at least partially concurrently with the first step. 4. The method of claim 1 , wherein during the fourth step, the mixture is heated to a temperature between ambient temperature and 200° C. 5. The method of claim 1 , wherein during the fourth step, the mixture is heated to about 120° C. 6. The method of claim 1 , wherein the specified period of time is between about 24 hours and 1 week. 7. The method of claim 1 , wherein the specified period of time is about 24 hours. 8. The method of claim 1 , further comprising a fifth step, wherein the ZrPDA metal-organic framework is washed with dimethylformamide (DMF). 9. The method of claim 8 , wherein the ZrPDA metal-organic framework is washed with dimethylformamide (DMF) at least twice. 10. The method of claim 8 , wherein the ZrPDA metal-organic framework is washed with dimethylformamide (DMF) three times per day for three days. 11. The method of claim 1 , further comprising a sixth step, wherein the ZrPDA metal-organic framework is soaked in acetone and solvent exchanged for a specified exchange period. 12. The method of claim 11 , wherein the solvent exchange occurs at least twice. 13. The method of claim 11 , wherein the exchange period is three days, and the acetone is changed three times per day. 14. The method of claim 1 , wherein the ZrPDA metal-organic framework is heated to about 100° C. in vacuum oven. 15. A method of preparing a phototuned metal-organic framework comprising: 1) in a first step, forming a first solution by dissolving ZrOCl 2 .8H 2 O in dimethylformamide (DMF) and formic acid; 2) in a second step, mixing and dissolving 1,4-phenylenediacrylic acid in a second solution of dimethylformamide (DMF) and trimethylamine; 3) in a third step, at least partially mixing the first and second solutions to form a mixture; 4) in a fourth step, sealing the mixture in an autoclave and heating the mixture to above ambient temperature for a specified period of time to prepare ZrPDA metal-organic framework, the ZrPDA metal-organic framework being characterized by main peaks observed using X-ray powder diffraction (Cu Kα radiation) comprising the following 2θ angles: 5.3, 9.2, and 10.6; and 5). in a fifth step, extracting the ZrPDA metal-organic framework and at least partially reacting to a specified degree at least some of ZrPDA metal-organic framework through [2+2] cycloaddition reactions, wherein the specified degree is tunable based at least in part on at least one of the intensity of UV radiation, the exposure time, and the UV wavelength. 16. The method of claim 15 , wherein the specified time is between 24 hours and 1 week. 17. The method of claim 15 , wherein in the fourth step, the mixture is heated to between 50° C. and 200° C. 18. The method of claim 15 , wherein the UV wavelength is about 302 nm. 19. The method of claim 15 , wherein the exposure time is greater than zero and less than 60 minutes. 20. The method of claim 15 , wherein the exposure time is between about 60 minutes and 2 hours.

Assignees

Inventors

Classifications

  • Chemistry & Metallurgy · mapped topic

  • Electricity · mapped topic

  • H10K85/341Primary

    Transition metal complexes, e.g. Ru(II)polypyridine complexes (H10K85/331 takes precedence) · CPC title

  • C07F7/003Primary

    without C-Metal linkages · CPC title

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What does patent US9716239B2 cover?
Some embodiments include a method of preparing a phototuned metal-organic framework by forming a first solution by dissolving ZrOCl 2 .8H 2 O in dimethylformamide (DMF) and formic acid, mixing and dissolving 1,4-phenylenediacrylic acid in a second solution of dimethylformamide (DMF) and trimethylamine, and at least partially mixing the first and second solutions to form a mixture. The method fu…
Who is the assignee on this patent?
Univ Arizona State, Arizona Board Of Regents On Behalf Of Ari
What technology area does this patent fall under?
Primary CPC classification H01L51/0084. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 25 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).