Substrate cleaning method

Patent metadata

Field	Value
Publication number	US-9716002-B2
Application number	US-201615204068-A
Country	US
Kind code	B2
Filing date	Jul 7, 2016
Priority date	Dec 20, 2006
Publication date	Jul 25, 2017
Grant date	Jul 25, 2017

Abstract

A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.

First claim

What is claimed is:

1. A substrate cleaning method for cleaning a back surface of a substrate, the substrate cleaning method comprising steps of:
a first substrate supporting step of supporting the substrate horizontally on a first substrate supporting portion, while the substrate is surrounded by a cup, by suctioning a first area of a back surface of the substrate, the back surface facing down;
a second substrate supporting step of switching a supporting area from the first area to a second area that does not overlap with the first area and horizontally supporting the substrate on a second substrate supporting portion, while the substrate is surrounded by the cup, by suctioning the back surface of the substrate;
a step of supplying a cleaning liquid to the back surface of the substrate supported in the first substrate supporting step or the second substrate supporting step;
a step of drying the second area before supporting the substrate in the first substrate supporting step or in the second substrate supporting step;
a first cleaning step of cleaning the back surface of the substrate including the second area during the first substrate supporting step; and
a second cleaning step of cleaning the back surface of the substrate excluding the second area during the second substrate supporting step,
wherein the first cleaning step further comprises, while supporting the substrate on the first supporting portion, vertically moving the first substrate supporting portion so as to place the back surface of the substrate in contact with a cleaning member, and horizontally moving the first substrate supporting portion so as to clean the back surface of the substrate with the cleaning member, the cleaning member being attached to a cleaning member supporting portion that extends in a horizontal direction, and the horizontal movement of the first substrate supporting portion being in a lateral direction parallel with the extending direction of the cleaning member supporting portion, and
wherein the first cleaning step further comprises moving the cup vertically and horizontally to correspond with vertical and horizontal movements of the substrate.

2. The substrate cleaning method according to claim 1 , further comprising:
a step of spinning the substrate to throw off cleaning liquid remaining on the back surface of the substrate.

3. The substrate cleaning method according to claim 2 ,
wherein the step of drying the second area is performed by blowing air onto the back surface of the substrate.

4. The substrate cleaning method according to claim 1 ,
wherein the step of drying the second area is performed by blowing air onto the back surface of the substrate.

5. The substrate cleaning method according to claim 1 , further comprising:
a step of illuminating the back surface of the substrate with ultraviolet light to shrink particles remaining on the back surface of the substrate.

6. The substrate cleaning method according to claim 1 ,
wherein the cup is moved vertically with vertical movement of the substrate such that the cup is made to surround the substrate during vertical movement of the substrate.

7. The substrate cleaning method according to claim 1 ,
wherein the cup is moved horizontally with horizontal movement of the substrate such that the cup is made to surround the substrate during horizontal movement of the substrate.

8. The substrate cleaning method according to claim 1 ,
wherein the cup is moved vertically and horizontally concurrently with vertical and horizontal movements of the first substrate supporting portion.

9. The substrate cleaning method according to claim 1 ,
wherein the vertical and horizontal movements of the first substrate supporting portion and the cup are controlled by a common driving mechanism.

10. A substrate cleaning method for cleaning a back surface of a substrate, comprising:
carrying a substrate into an opening provided in an upper surface of a cup body of a cleaning apparatus, the cleaning apparatus comprising:
a spin chuck configured to support the substrate at a center of the back surface of the substrate, and to rotate the substrate, while the substrate is surrounded by the cup body,
substrate supporting portions provided at opposite sides of the spin chuck and configured to support the substrate at vicinities of the periphery of the back surface of the substrate, while the substrate is surrounded by the cup body, and
a cleaning member for cleaning the back surface of the substrate by contacting the back surface of the substrate, the cleaning member being attached to a cleaning member supporting portion that extends in a horizontal direction,

wherein the cup body encloses the substrate in a manner to capture cleaning liquid that is spun off from the substrate;
supporting the substrate by the substrate supporting portions with surfaces of the substrate supporting portions that support the substrate at a first position higher than an upper surface of the cleaning member while the spin chuck is at a second position lower than the upper surface of the cleaning member;
while supporting the substrate on the substrate supporting portions, vertically lowering the substrate supporting portions to a second position where the cleaning member contacts the back surface of the substrate and supplying a cleaning liquid to the back surface of the substrate while horizontally moving the substrate supporting portions in a lateral direction parallel with the extending direction of the cleaning member supporting portion to thereby clean an area of the back surface of the substrate that is not supported by the substrate supporting portions;
transferring the substrate from the substrate supporting portions to the spin chuck; and
moving the cup body vertically and horizontally to correspond with vertical and horizontal movements of the substrate.

11. The substrate cleaning method of claim 10 ,
wherein transferring the substrate from the substrate supporting portions to the spin chuck is performed after a center of the back surface of the substrate is cleaned, and the performance of the transfer comprises:
raising the spin chuck to contact the center of the back surface of the substrate, and
lowering the substrate supporting portions to retract them from the vicinities of the periphery of the back surface of the substrate, such that the spin chuck supports the substrate at the center of the back surface of the substrate; and

the cleaning method further comprising, while supporting the substrate by the spin chuck, cleaning an area of the back surface of the substrate that is not supported by the spin chuck by rotating the substrate by the spin chuck.

12. The substrate cleaning method according to claim 10 ,
wherein the cup body is moved vertically with vertical movement of the substrate such that the cup body is made to surround the substrate during vertical movement of the substrate.

13. The substrate cleaning method according to claim 10 ,
wherein the cup body is moved horizontally with horizontal movement of the substrate such that the cup body is made to surround the substrate during horizontal movement of the substrate.

14. The substrate cleaning method according to claim 10 ,
wherein the cup body is moved vertically and horizontally concurrently with vertical and horizontal movements of the substrate supporting portions.

15. The substrate cleaning method according to claim 10 ,
wherein the vertical and horizontal movements of the substrate supporting portions and the cup body are controlled by a common driving mechanism.

Assignees

• Tokyo Electron Ltd

Inventors

• Takiguchi Yasushi
• Yamamoto Taro
• Fujimoto Akihiro
• Nishikido Shuuichi
• Kumagai Dai
• Yoshitaka Naoto
• Kitano Takahiro
• Tokunaga Yoichi

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0412

  using mainly scrubbing means, e.g. brushes · CPC title

• H10P70/56

  Cleaning of wafer backside · CPC title