Multi charged particle beam writing method, and multi charged particle beam writing apparatus

Patent metadata

Field	Value
Publication number	US-9691585-B2
Application number	US-201514699216-A
Country	US
Kind code	B2
Filing date	Apr 29, 2015
Priority date	May 23, 2014
Publication date	Jun 27, 2017
Grant date	Jun 27, 2017

Abstract

A multi charged particle beam writing method includes, shifting a writing position of each corresponding beam to a next writing position by performing another beam deflection of multi charged particle beams, in addition to the beam deflection for a tracking control, while continuing the beam deflection for the tracking control after the maximum writing time has passed; emitting the each corresponding beam in the “on” state to the next writing position having been shifted of the each corresponding beam, during a corresponding writing time while continuing the tracking control; and returning a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control after emitting the each corresponding beam to the next writing position having been shifted at least once of the each corresponding beam while continuing the tracking control.

First claim

What is claimed is:

1. A multi charged particle beam writing apparatus comprising:
a stage configured to mount a target object thereon and to be continuously movable;
an emission unit configured to emit a charged particle beam;
an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings;
a blanking plate in which there are arranged a plurality of blankers configured to respectively perform blanking deflection for a corresponding beam of the multiple beams having passed through the plurality of openings of the aperture member;
a blanking aperture member configured to block each beam having been deflected to be in an “off” state by at least one of the plurality of blankers;
a first deflector configured to collectively deflect each beam in an “on” state having passed through the blanking aperture member to a writing position of the each beam;
a second deflector configured to collectively deflect the each beam in the “on” state having passed through the blanking aperture member in such a way as to follow a movement of the stage; and
a deflection control unit configured to control the first deflector to deflect the each beam to a corresponding writing position, and after a writing time has passed, to deflect the each beam to be shifted to a next corresponding writing position, and to control the second deflector to continue tracking of the each beam without shifting a beam deflection for tracking control while the each beam irradiates the writing position and while the each beam irradiates the writing position which has been shifted at least once, and after the each beam irradiates the writing position which has been shifted at least once, to return a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control, wherein the writing position is an irradiation region which can be irradiated by one-shot of the each beam,
wherein a tracking distance in a direction of tracking from starting tracking control to resetting beam deflection of the tracking control is smaller than a size of the irradiation region which can be irradiated by one-shot.

2. A multi charged particle beam writing apparatus comprising:
a stage configured to mount a target object thereon and to be continuously movable;
an emission unit configured to emit a charged particle beam;
an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings;
a blanking plate in which there are arranged a plurality of blankers configured to respectively perform blanking deflection for a corresponding beam of the multiple beams having passed through the plurality of openings of the aperture member;
a blanking aperture member configured to block each beam having been deflected to be in an “off” state by at least one of the plurality of blankers;
a deflector configured to collectively deflect the each beam in an “on” state having passed through the blanking aperture member to a writing position of the each beam, and collectively deflect the each beam in such a way as to follow a movement of the stage; and
a deflection control unit configured to control the deflector to deflect the each beam to a corresponding writing position, and after a writing time has passed, to deflect the each beam to be shifted to a next corresponding writing position, and to control the deflector to continue tracking of the each beam without shifting the beam deflection for the tracking control while the each beam irradiates the writing position and while the each beam irradiates the writing position which has been shifted at least once, and after the each beam irradiates the writing position which has been shifted at least once, to return a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control, wherein the writing position is an irradiation region which can be irradiated by one-shot of the each beam,
wherein a tracking distance in a direction of tracking from starting tracking control to resetting beam deflection of the tracking control is smaller than a size of the irradiation region which can be irradiated by one-shot.

3. A multi charged particle beam writing method comprising:
emitting each of respective charged particle beams in an “on” state of multi charged particle beams to a writing position of an irradiation region which can be irradiated by one-shot of each respective beam during a corresponding writing time within a maximum writing time which was pre-set, while performing a beam deflection for tracking control such that the writing position of the each respective beam of the multi charged particle beams collectively follow a movement of a stage;
shifting the writing position of the each respective beam to a next writing position of the each respective beam by performing another beam deflection of the multi charged particle beams, in addition to the beam deflection for the tracking control, while continuing the beam deflection for the tracking control without shifting the beam deflection for the tracking control after the maximum writing time has passed;
emitting the each respective beam in the “on” state of the multi charged particle beams to the next writing position having been shifted of the each respective beam, during a corresponding writing time within the maximum writing time while continuing the tracking control; and
returning a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control after emitting the each corresponding beam to the next writing position having been shifted at least once of the each respective beam while continuing the tracking control,
wherein a tracking distance in a direction of tracking from starting tracking control to resetting beam deflection of the tracking control is smaller than a size of the irradiation region which can be irradiated by one-shot.

4. The method according to claim 3 , wherein
the beam deflection for the tracking control is performed using a first deflection amplifier having a long settling time, and
the another beam deflection for shifting the writing position of the each respective beam is performed using a second deflection amplifier having a short settling time.

5. The method according to claim 3 , wherein
the tracking control is performed repeatedly after resetting the beam deflection, and
the tracking distance in a direction of tracking of the tracking control is substantially a same in each respective tracking control.

6. The method according to claim 3 , wherein
in a case of resetting the beam deflection for the tracking control, the tracking position is returned to a position being away by a predetermined distance from the former tracking start position where the tracking control was started.

7. The method according to claim 6 , wherein
the predetermined distance is larger than a distance obtained by using a stage speed and a settling time of an amplifier for the tracking control.

8. The method accordin

Assignees

• Nuflare Technology Inc

Inventors

• Matsumoto Hiroshi
• Ogasawara Munehiro
• Yoshikawa Ryoichi

Classifications

• H01J37/3174

  Particle-beam lithography, e.g. electron beam lithography · CPC title

• H01J37/1471 Primary

  for centering, aligning or positioning of ray or beam · CPC title

• H01J37/045

  Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge · CPC title

• H01J2237/304

  Controlling tubes · CPC title

• H01J37/147

  Arrangements for directing or deflecting the discharge along a desired path ({H01J37/045 take precedence;} lenses H01J37/10) · CPC title