Polishing pad with offset concentric grooving pattern and method for polishing a substrate therewith

Patent metadata

Field	Value
Publication number	US-9687956-B2
Application number	US-201314440209-A
Country	US
Kind code	B2
Filing date	Nov 5, 2013
Priority date	Nov 6, 2012
Publication date	Jun 27, 2017
Grant date	Jun 27, 2017

Abstract

The invention provides a polishing pad and a method of using the polishing pad for chemically-mechanically polishing a substrate. The polishing pad comprises a plurality of grooves composed of at least a first plurality of concentric grooves having a first center of concentricity, and a second plurality of concentric grooves having a second center of concentricity. The first center of concentricity is not coincident with the second center of concentricity, the axis of rotation of the polishing pad is not coincident with at least one of the first center of concentricity and the second center of concentricity, the plurality of grooves does not consist of a continuous spiral groove, and the polishing surface does not comprise a mosaic groove pattern.

First claim

The invention claimed is:

1. A polishing pad comprising an axis of rotation, a polishing surface, and a plurality of grooves set into the polishing surface, wherein the plurality grooves is composed of at least (a) a first plurality of concentric grooves having a first center of concentricity, and (b) a second plurality of concentric grooves having a second center of concentricity, wherein the polishing pad has either a first mirror plane located along a virtual y-axis, or a second mirror plane located along a virtual x-axis, and wherein
(1) the first center of concentricity is not coincident with the second center of concentricity,
(2) the axis of rotation of the polishing pad is not coincident with at least one of the first center of concentricity and the second center of concentricity,
(3) the plurality of grooves does not consist of a continuous spiral groove, and
(4) the plurality of grooves does not comprise a mosaic groove pattern, and
(5) wherein the polishing pad further comprises a single central channel extending along a diameter of the polishing pad.

2. The polishing pad of claim 1 , wherein, when the plurality of grooves is extended infinitely in the plane of the polishing surface, the first plurality of concentric grooves is symmetric with the second plurality of concentric grooves by way of a 180° rotation about an axis of symmetry perpendicular to the polishing surface.

3. The polishing pad of claim 1 , wherein, when the plurality of grooves is extended infinitely in the plane of the polishing surface, the first plurality of concentric grooves is symmetric with the second plurality of concentric grooves by way of the first mirror plane that (a) is perpendicular to the polishing surface and (b) does not intersect with either the first center of concentricity or the second center of concentricity.

4. The polishing pad of claim 1 , wherein, when the plurality of grooves is extended infinitely in the plane of the polishing surface, the first plurality of concentric grooves is symmetric with the second plurality of concentric grooves by way of the second mirror plane that (a) is perpendicular to the polishing surface and (b) intersects with both the first center of concentricity and the second center of concentricity.

5. The polishing pad of claim 1 , wherein at least a portion of the grooves in the plurality of grooves is an arc having a shape selected from the group consisting of substantially circular, substantially semi-circular, substantially parabolic, substantially oval, and combinations thereof.

6. The polishing pad of claim 5 , wherein the shape is substantially circular or substantially semi-circular, and each respective groove in the first plurality of concentric grooves has a substantially constant radius with respect to the first center of concentricity, and each respective groove in the second plurality of concentric grooves has a substantially constant radius with respect to the second center of concentricity.

7. The polishing pad of claim 1 , wherein (a) the first plurality of concentric grooves does not cross the second plurality of concentric grooves, and (b) the polishing pad has a first region containing the first plurality of concentric grooves and a second region containing the second plurality of concentric grooves, wherein the first region is adjacent to the second region.

8. The polishing pad of claim 7 , wherein one or more of the following conditions is satisfied:
(a) at least a portion of the first region abuts at least a portion of the second region at an interface,
(b) the first region abuts the second region at an interface,
(c) the first region is entirely separated from the second region by a third region, and
(d) the first region is entirely separated from the second region by a central channel.

9. The polishing pad of claim 8 , wherein one or more of the following conditions is satisfied:
(a) at least one of the grooves in the first plurality of concentric grooves is aligned with at least one of the grooves in the second plurality of concentric grooves at the interface,
(b) the grooves in the first plurality of concentric grooves are aligned with the grooves in the second plurality of concentric grooves at the interface,
(c) none of the grooves in the first plurality of concentric grooves is aligned with the grooves in the second plurality of concentric grooves at the interface,
(d) the first center of concentricity is located in the first region and the second center of concentricity is located in the second region,
(e) the first center of concentricity is located in the second region and the second center of concentricity is located in the first region,
(f) both the first and second centers of concentricity are located in the first region, and
(g) the first center of concentricity is located at the interface and the second center of concentricity is located in either the first or second region, and
(h) both the first and second centers of concentricity are located at the interface.

10. The polishing pad of claim 7 , wherein, when a virtual x-axis and a virtual y-axis are overlaid on the polishing surface in the plane of the polishing surface such that (i) the x-axis and the y-axis intersect at a right angle at the axis of symmetry, (ii) the first center of concentricity is located at the coordinates (x <0, y ≧0), and (iii) the first center of concentricity is located at the interface or in the first region, the following conditions are satisfied:
(a) the first plurality of concentric grooves emanates from the first center of concentricity in a +y direction,
(b) the second plurality of concentric grooves emanates from the second center of concentricity in a −y direction, and
(c) when the plurality of grooves is extended infinitely in the plane of the polishing surface, the first plurality of concentric grooves is not symmetric with the second plurality of concentric grooves by way of a mirror plane perpendicular to the polishing surface.

11. The polishing pad of claim 1 , wherein the polishing pad comprises a thermoplastic polyurethane.

12. The polishing pad of claim 1 , wherein one of the following conditions is satisfied:
(a) at least one groove in the first plurality of concentric grooves or second plurality of concentric grooves completes a closed arc around the first center of concentricity or the second center of concentricity, respectively, or
(b) none of the grooves in the first plurality of concentric grooves or second plurality of concentric grooves completes a closed arc around the first center of concentricity or the second center of concentricity, respectively.

13. The polishing pad of claim 1 , wherein the central channel has a rounding edge.

14. The polishing pad of claim 1 , wherein (i) the polishing pad has a thickness T, (ii) each groove in the first plurality of concentric grooves has a first depth, a first width, and is separated from an adjacent groove by a first pitch, and (iii) each groove in the second plurality of concentric grooves has a second depth, a second width, and is separated from an adjacent groove by a second pitch, and wherein one or more of the following conditions is satisfied:
(a) the first depth and the second depth measured as a fraction of the thickness T of the polishing pad independently are 0.01 T to 0.99 T and can be the same or different, and the first depth, the second depth, or both, either is constant or varies within the first plurality of concentric grooves, the second plurality of concentric grooves, or both,
(b) the first width and the second width independently are 0.005 cm to 0.5 cm and can be the same or differen

Assignees

• Cabot Microelectronics Corp

Inventors

• Tsai Ching-Ming
• Cheng shi-wei
• Yang Kun-Shu
• Hsu Jia-Cheng
• Liu Sheng-Huan
• Hsu Feng-Chih
• Kokjohn Craig

Classifications

• H10P72/0428

  Apparatus for mechanical treatment or grinding or cutting · CPC title

• H10P52/402

  of semiconductor materials · CPC title

• B24B37/16

  characterised by the shape of the lapping plate surface, e.g. grooved · CPC title

• B24B37/042 Primary

  operating processes therefor · CPC title

• B24B37/26 Primary

  characterised by the shape of the lapping pad surface, e.g. grooved · CPC title