Finfet devices including high mobility channel materials with materials of graded composition in recessed source/drain regions

Patent metadata

Field	Value
Publication number	US-9685509-B2
Application number	US-201414226518-A
Country	US
Kind code	B2
Filing date	Mar 26, 2014
Priority date	Jul 30, 2013
Publication date	Jun 20, 2017
Grant date	Jun 20, 2017

Abstract

A finFET device can include a high mobility semiconductor material in a fin structure that can provide a channel region for the finFET device. A source/drain recess can be adjacent to the fin structure and a graded composition epi-grown semiconductor alloy material, that includes a component of the high mobility semiconductor material, can be located in the source/drain recess.

First claim

What is claimed:

1. A finFET device comprising:
a high mobility semiconductor material in a fin structure, providing a channel region for the finFET device, wherein the high mobility semiconductor material includes any element from Group II through Group VI;
a source/drain recess, adjacent to the fin structure; and
a graded composition epi-grown semiconductor alloy material, including a component of the high mobility semiconductor material, in the source/drain recess, wherein the graded composition epi-grown semiconductor alloy material is graded as a function of a distance from a horizontal interface of the graded composition epi-grown semiconductor alloy material and the fin structure and as the function of a distance from a vertical interface of the graded composition epi-grown semiconductor alloy material and the fin structure, wherein the graded composition epi-grown semiconductor alloy material is graded in a first direction that is orthogonal to the horizontal interface and in a second direction that is orthogonal to the vertical interface.

2. The finFET device of claim 1 wherein an uppermost surface of the graded composition epi-grown semiconductor alloy material is recessed below an uppermost surface of the fin structure.

3. The finFET device of claim 2 further comprising:
a source/drain contact recess in the graded composition epi-grown semiconductor alloy material, the source/drain contact recess having a depth that is limited to a point where beyond which an incremental decrease in a spreading resistance value associated with the horizontal interface is less than an incremental increase in the total resistance.

4. The finFET device of claim 2 further comprising:
a metal-semiconductor alloy on the uppermost surface of the graded composition epi-grown semiconductor alloy material; and
a metal on the metal-semiconductor alloy.

5. The finFET device of claim 1 wherein the graded composition epi-grown semiconductor alloy material comprises a high mobility semiconductor material rich composition contacting the high mobility semiconductor material of the fin structure at a channel interface and comprises a high mobility semiconductor material lean composition in the alloy farthest from the channel interface; and
wherein an amount of the high mobility semiconductor material in the high mobility semiconductor material rich composition is greater than an amount of the high mobility semiconductor material in the high mobility semiconductor material lean composition.

6. The finFET device of claim 5 wherein the high mobility semiconductor material rich composition has a component equal to that of a component of the high mobility semiconductor material in the fin structure and the high mobility semiconductor material lean composition has a component about zero.

7. The finFET device of claim 5 wherein the high mobility semiconductor material rich composition has a component within +/−30% of being equal to that of a component in the high mobility semiconductor material in the fin structure and the high mobility semiconductor material lean composition has a component within 0-25% of that of a component of the high mobility semiconductor material.

8. The finFET device of claim 5 wherein the graded composition epi-grown semiconductor alloy material includes a decreasing composition of a component of the high mobility semiconductor material as a distance from the channel interface increases.

9. The finFET device of claim 1 wherein the graded composition epi-grown semiconductor alloy material comprises a maximum reduction in an amount of the high mobility semiconductor material in the alloy of about 2% per Angstrom.

10. The finFET device of claim 1 wherein a component of the high mobility semiconductor material in the fin structure comprises Ge or Ga and the graded composition epi-grown semiconductor alloy material comprises SiGe or InGaAs, respectively.

11. The finFET device of claim 1 wherein the finFET device comprises an N type finFET device having a first composition epi-grown semiconductor alloy material in the source/drain recess, finFET device further comprising:
a P type finFET device including a second composition epi-grown semiconductor alloy material in a second source/drain recess.

12. The finFET device of claim 11 wherein the first and second composition epi-grown semiconductor alloy materials are graded differently.

13. The finFET device of claim 11 wherein the second composition epi-grown semiconductor alloy material is substantially constant throughout the second source/drain recess.

14. A finFET device comprising:
a high mobility semiconductor material in a fin structure, providing a channel region for the finFET device, wherein the high mobility semiconductor material includes any element from Group II through Group VI;
a source/drain recess, adjacent to the fin structure;
a graded composition epi-grown semiconductor alloy material including a component of the high mobility semiconductor material in the source/drain recess, the alloy having an uppermost surface that is recessed below an uppermost surface of the fin structure, and including a high mobility semiconductor material rich composition contacting vertical and horizontal channel interfaces to the fin structure and including a high mobility semiconductor material lean composition farthest from the horizontal and vertical channel interfaces in the alloy material, wherein an amount of the high mobility semiconductor material in the high mobility semiconductor material rich composition is greater than an amount of the high mobility semiconductor material in the high mobility semiconductor material lean composition;
a source/drain contact recess in the graded composition epi-grown semiconductor alloy material; and
a metal in the source/drain contact recess, wherein the graded composition epi-grown semiconductor alloy material is graded in a first direction that is orthogonal to the horizontal interface and in a second direction that is orthogonal to the vertical interface.

15. The finFET device of claim 14 wherein the graded composition epi-grown semiconductor alloy material comprises a maximum reduction in an amount of the high mobility semiconductor material of about 2% per Angstrom.

16. The finFET device of claim 14 wherein the source/drain contact recess comprises a depth that is limited to a point where beyond which an incremental decrease in a spreading resistance value associated with the horizontal interface is less than an incremental increase in the total resistance.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Kittl Jorge A
• Rodder Mark S
• Bowen Robert C

Classifications

• H10D30/024 Primary

  of fin field-effect transistors [FinFET] · CPC title

• H10D30/62 Primary

  Fin field-effect transistors [FinFET] · CPC title

• H10D30/611

  having multiple independently-addressable gate electrodes influencing the same channel (FinFETs having multiple distinct gate electrodes H10D30/6215; multi-gate TFT H10D30/6733) · CPC title

• H01L29/785

  Electricity · mapped topic

• H01L29/0878

  Electricity · mapped topic