Apparatus for liquid treatment of wafer shaped articles and heating system for use in such apparatus

Patent metadata

Field	Value
Publication number	US-9685358-B2
Application number	US-201614988498-A
Country	US
Kind code	B2
Filing date	Jan 5, 2016
Priority date	May 15, 2013
Publication date	Jun 20, 2017
Grant date	Jun 20, 2017

Abstract

An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. At least the transparent plate positioned between the infrared heating elements and the underside of a wafer is mounted for rotation with the spin chuck. Alternatively, the transparent plate is part of a housing that encloses the infrared heating elements and that rotates with the spin chuck as the heating elements are stationary relative thereto.

First claim

What is claimed is:

1. Apparatus for treating a wafer-shaped article, comprising:
a spin chuck for holding a wafer-shaped article in a predetermined orientation wherein a lower surface of the wafer-shaped article is spaced a predetermined distance from an upper surface of the spin chuck;
at least one heater mounted above said upper surface of said spin chuck and underlying a wafer-shaped article when mounted on the spin chuck, said at least one heater being stationary in relation to rotation of said spin chuck; and
a plate that is transparent to radiation emitted by said at least one heater, said plate being mounted for rotation with said spin chuck and being positioned between said at least one heater and a wafer-shaped article when positioned on said spin chuck.

2. The apparatus according to claim 1 , wherein said plate is part of a housing that surrounds said at least one heater, said housing being mounted for rotation with said spin chuck.

3. The apparatus according to claim 2 , wherein said housing comprises a lower shell surrounding said at least one heater and positioned between said at least one heater and said upper surface of said spin chuck, said lower shell having a reflective interior surface.

4. The apparatus according to claim 1 , wherein said spin chuck comprises a rotatable chuck body surrounding a central stationary post, and wherein said at least one heater is mounted to an upper end of said central stationary post.

5. The apparatus according to claim 1 , wherein said at least one heater is part of a heating assembly comprising at least two independently controllable heating elements.

6. The apparatus according to claim 2 , wherein said housing is centered on an axis of rotation of said spin chuck, and wherein said spin chuck comprises a circular series of pins configured to contact an edge of a wafer-shaped article in a closed position, said pins passing through a corresponding series of openings formed in a periphery of said housing.

7. The apparatus according to claim 5 , wherein each of said independently controllable heating elements comprises at least one curved portion.

8. The apparatus according to claim 1 , further comprising a lower shell surrounding said at least one heater and positioned between said at least one heater and said upper surface of said spin chuck, said lower shell having a reflective interior surface and being stationary in relation to rotation of said spin chuck.

9. The apparatus according to claim 1 , wherein said at least one heater is part of a heating assembly comprising at least three independently controllable heating elements.

10. A heating assembly for use in an apparatus for treating a wafer-shaped article, said heating assembly comprising:
a housing comprising an upper plate that is transparent to radiation emitted by said heating assembly, and a lower shell having a reflective interior surface;
a plurality of heating elements mounted on a common frame positioned within said housing, said common frame comprising a connector portion projecting downwardly through a central opening in said lower shell; and
a rotary bearing positioned outside of said connector portion and inside of said central opening, thereby to permit rotation of said housing relative to said common frame and said plurality of heating elements;
wherein said housing is rotatable relative to said common frame and said plurality of heating elements about an axis that is perpendicular to said upper plate.

11. The heating assembly according to claim 10 , wherein each of said heating elements is independently controllable and comprises at least one curved portion.

12. The heating assembly according to claim 11 , wherein the curved portions of adjacent heating elements extend along concentric circles.

13. The heating assembly according to claim 10 , wherein said connector portion comprises a plurality of electrical connectors equal in number to said plurality of heating elements, thereby to permit individual connection of each of said plurality of heating elements to a controller for individually energizing each of said plurality of heating elements.

14. The heating assembly according to claim 10 , wherein each of said heating elements comprises at least one curved portion, and wherein said at least one curved portion of each of said heating elements extends along an arc of a circle whose center is offset from said axis.

15. The heating assembly according to claim 10 , wherein said housing comprises a circular series of peripheral openings to permit passage of gripping pins when said heating assembly is mounted to a spin chuck.

16. A heating assembly for use in an apparatus for treating a wafer-shaped article, said heating assembly comprising:
a housing comprising an upper plate that is transparent to radiation emitted by said heating assembly, and a lower shell having a reflective interior surface, said housing comprising a circular series of peripheral openings to permit passage of gripping pins when said heating assembly is mounted to a spin chuck;
a plurality of heating elements mounted on a common frame positioned within said housing, said common frame comprising a connector portion projecting downwardly through a central opening in said lower shell; and
a rotary bearing positioned outside of said connector portion and inside of said central opening, thereby to permit rotation of said housing relative to said common frame and said plurality of heating elements.

17. The heating assembly according to claim 16 , wherein each of said heating elements is independently controllable and comprises at least one curved portion.

18. The heating assembly according to claim 16 , wherein said connector portion comprises a plurality of electrical connectors equal in number to said plurality of heating elements, thereby to permit individual connection of each of said plurality of heating elements to a controller for individually energizing each of said plurality of heating elements.

19. The heating assembly according to claim 16 , wherein said housing is rotatable relative to said common frame and said plurality of heating elements about an axis that is perpendicular to said upper plate.

20. The heating assembly according to claim 18 , wherein each of said heating elements comprises at least one curved portion, and wherein said at least one curved portion of each of said heating elements extends along an arc of a circle whose center is offset from said axis.

Assignees

• Lam Res Ag

Inventors

• Plazonic Ante
• Badam Vijay Kumar
• Brugger Michael

Classifications

• H10P72/0404

  for general liquid treatment, e.g. etching followed by cleaning · CPC title

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title