Processing apparatus and processing method of stack

US9682544B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9682544-B2
Application numberUS-201615147020-A
CountryUS
Kind codeB2
Filing dateMay 5, 2016
Priority dateAug 30, 2013
Publication dateJun 20, 2017
Grant dateJun 20, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A processing apparatus of a stack is provided. The stack includes two substrates attached to each other with a gap provided between their end portions. The processing apparatus includes a fixing mechanism that fixes part of the stack, a plurality of adsorption jigs that fix an outer peripheral edge of one of the substrates of the stack, and a wedge-shaped jig that is inserted into a corner of the stack. The plurality of adsorption jigs include a mechanism that allows the adsorption jigs to move separately in a vertical direction and a horizontal direction. The processing apparatus further includes a sensor sensing a position of the gap between the end portion in the stack. A tip of the wedge-shaped jig moves along a chamfer formed on an end surface of the stack. The wedge-shaped jig is inserted into the gap between the end portions in the stack.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for manufacturing a semiconductor device comprising the steps of: fixing part of a stack to a fixing mechanism, the stack including a transistor; attaching a first adsorption jig, a second adsorption jig and a third adsorption jig to a first periphery of the stack, and attaching a fourth adsorption jig, a fifth adsorption jig and a sixth adsorption jig to a second periphery of the stack; moving the first adsorption jig, the second adsorption jig and the third adsorption jig so that a flexible substrate is partially separated from the stack; fixing a first clamp jig to the flexible substrate at a position between the first adsorption jig and the second adsorption jig, and fixing a second clamp jig to the flexible substrate at a position between the second adsorption jig and the third adsorption jig; and moving the first adsorption jig, the second adsorption jig, the third adsorption jig, the first clamp jig and the second clamp jig so that the flexible substrate is separated from the stack. 2. The method for manufacturing a semiconductor device according to claim 1 , further comprising a step of making a slit to the stack by laser processing before fixing the part of the stack to the fixing mechanism. 3. The method for manufacturing a semiconductor device according to claim 1 , wherein the first adsorption jig, the second adsorption jig and the third adsorption jig are moved in a different direction from the first clamp jig and the second clamp jig. 4. The method for manufacturing a semiconductor device according to claim 3 , wherein the first adsorption jig, the second adsorption jig and the third adsorption jig are moved upward, and the first clamp jig and the second clamp jig are moved in vertical to an end surface of the flexible substrate. 5. A method for manufacturing a semiconductor device comprising the steps of: fixing part of a stack to a fixing mechanism, the stack including a transistor; attaching a first adsorption jig, a second adsorption jig and a third adsorption jig to a first periphery of the stack, and attaching a fourth adsorption jig, a fifth adsorption jig and a sixth adsorption jig to a second periphery of the stack; moving the first adsorption jig, the second adsorption jig and the third adsorption jig while supplying liquid to the stack so that a flexible substrate is partially separated from the stack; fixing a first clamp jig to the flexible substrate at a position between the first adsorption jig and the second adsorption jig, and fixing a second clamp jig to the flexible substrate at a position between the second adsorption jig and the third adsorption jig; and moving the first adsorption jig, the second adsorption jig, the third adsorption jig, the first clamp jig and the second clamp jig so that the flexible substrate is separated from the stack. 6. The method for manufacturing a semiconductor device according to claim 5 , further comprising a step of making a slit to the stack by laser processing before fixing the part of the stack to the fixing mechanism. 7. The method for manufacturing a semiconductor device according to claim 5 , wherein the first adsorption jig, the second adsorption jig and the third adsorption jig are moved in a different direction from the first clamp jig and the second clamp jig. 8. The method for manufacturing a semiconductor device according to claim 7 , wherein the first adsorption jig, the second adsorption jig and the third adsorption jig are moved upward, and the first clamp jig and the second clamp jig are moved in vertical to an end surface of the flexible substrate.

Assignees

Inventors

Classifications

  • used during dicing or grinding · CPC title

  • Apparatus for mechanical treatment or grinding or cutting · CPC title

  • Gripping and pulling work apart during delaminating · CPC title

  • Severing delaminating means [e.g., chisel, etc.] · CPC title

  • the cutting blade having a special shape, e.g. a special outline, serrations · CPC title

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What does patent US9682544B2 cover?
A processing apparatus of a stack is provided. The stack includes two substrates attached to each other with a gap provided between their end portions. The processing apparatus includes a fixing mechanism that fixes part of the stack, a plurality of adsorption jigs that fix an outer peripheral edge of one of the substrates of the stack, and a wedge-shaped jig that is inserted into a corner of t…
Who is the assignee on this patent?
Semiconductor Energy Lab
What technology area does this patent fall under?
Primary CPC classification H10P72/0428. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 20 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).