Resist composition, method for forming resist pattern, photo-reactive quencher and compound

Patent metadata

Field	Value
Publication number	US-9671690-B2
Application number	US-201615072036-A
Country	US
Kind code	B2
Filing date	Mar 16, 2016
Priority date	Mar 24, 2015
Publication date	Jun 6, 2017
Grant date	Jun 6, 2017

Abstract

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below:

in which Ra 1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra 2 and Ra 3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X − represents a counter anion.

First claim

What is claimed is:

1. A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, the composition comprising:
a base material component (A) whose solubility in a developing solution changes under the action of an acid;
an acid generator component (B) which generates an acid upon exposure; and
a photo-reactive quencher (D0) which contains a compound (D0-1) represented by general formula (d0) shown below:

wherein Ra 1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent, Ra 2 and Ra 3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent, and X − represents a counter anion represented by any one of general formulae (d1-1) to (d1-3) shown below:

wherein Rd 1 to Rd 4 each independently represents a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, provided that two or more of fluorine atoms are not bonded to a carbon atom adjacent to an S atom in Rd 2 in formula (d1-2); and Yd 1 represents a single bond or a divalent linking group.

2. A method for forming a resist pattern, comprising:
forming a resist film using the resist composition according to claim 1 on a support;
exposing the resist film to light; and
developing the resist film to form a resist pattern.

3. A photo-reactive quencher comprising a compound (D0-1) represented by general formula (d0) shown below:

wherein Ra 1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent, Ra 2 and Ra 3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent, and X − represents a counter anion represented by any one of formulae (d1-1) to (d1-3) shown below;

wherein Rd 1 to Rd 4 represent a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, provided that two or more of fluorine atoms are not bonded to a carbon atom adjacent to an S atom in Rd 2 in formula (d1-2); and Yd 1 represents a single bond or a divalent linking group.

4. A compound represented by general formula (d0) below:

wherein Ra 1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent, Ra 2 and Ra 3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent, and X − represents a counter anion represented by any one of formulae (d1-1) to (d1-3) shown below:

wherein Rd 1 to Rd 4 represent a cyclic group which may have a substituent, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent, provided that two or more of fluorine atoms are not bonded to a carbon atom adjacent to an S atom in Rd 2 in formula (d1-2); and Yd 1 represents a single bond or a divalent linking group.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Nagamine Takashi
• Takaki Daichi
• Shinomiya Miki

Classifications

• C07C309/06

  containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton · CPC title

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• C07C309/25

  having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton · CPC title

• C07C65/05

  o-Hydroxy carboxylic acids · CPC title