Radiation-sensitive composition, method for forming pattern and onium salt compound
US-2026063994-A1 · Mar 5, 2026 · US
having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton
having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C309/25 |
| Official title | having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton |
| Display label | having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton |
| Total patents | 38 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 4 |
| 2016 | 8 |
| 2017 | 4 |
| 2018 | 3 |
| 2019 | 3 |
| 2020 | 1 |
| 2021 | 3 |
| 2022 | 3 |
| 2023 | 3 |
| 2024 | 1 |
| 2025 | 4 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Processes of making and crystalline forms of a mdm2 inhibitor
US-2025295647-A1 · Sep 25, 2025 · US
Salt crystals
US-2025129087-A1 · Apr 24, 2025 · US
Photoacid generator
US-12216402-B2 · Feb 4, 2025 · US
Resist underlayer film-forming composition
US-2025004367-A1 · Jan 2, 2025 · US
Photoacid generator
US-2024069442-A1 · Feb 29, 2024 · US
Photoacid generator
US-11846886-B2 · Dec 19, 2023 · US
Processes of making and crystalline forms of a mdm2 inhibitor
US-2023301974-A1 · Sep 28, 2023 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-11609495-B2 · Mar 21, 2023 · US
Processes of making and crystalline forms of a mdm2 inhibitor
US-2022280496-A1 · Sep 8, 2022 · US
Photoacid generator
US-2022163886-A1 · May 26, 2022 · US
Mono-(acid) salts of 6-aminoisoquinolines and uses thereof
US-2022144778-A1 · May 12, 2022 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-2021389667-A9 · Dec 16, 2021 · US
Resist composition and resist patterning process
US-11131926-B2 · Sep 28, 2021 · US
Radiation-sensitive resin composition and resist pattern-forming method
US-2021124263-A1 · Apr 29, 2021 · US
Processes of making and crystalline forms of a mdm2 inhibitor
US-2020281912-A1 · Sep 10, 2020 · US
Mono-(acid) salts of 6-aminoisoquinolines and uses thereof
US-2019322625-A1 · Oct 24, 2019 · US
Polymorphic compounds and uses thereof
US-10414732-B2 · Sep 17, 2019 · US
Resist composition and resist patterning process
US-2019010119-A1 · Jan 10, 2019 · US
Polymorphic compounds and uses thereof
US-2018265474-A1 · Sep 20, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07C309/25?
- CPC C07C309/25 is the Cooperative Patent Classification code for “having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton.”
- How many patents are filed under CPC C07C309/25 (having sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings of a carbon skeleton)?
- Our database includes 38 publications tagged with this CPC code.
- Is patent activity under CPC C07C309/25 growing?
- Publication counts under this code: 1 in 2024 vs 4 in 2025 (latest complete years).