Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound
US-2016376233-A1 · Dec 29, 2016 · US
containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C309/06 |
| Official title | containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton |
| Display label | containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton |
| Total patents | 274 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 37 |
| 2016 | 29 |
| 2017 | 38 |
| 2018 | 42 |
| 2019 | 23 |
| 2020 | 17 |
| 2021 | 19 |
| 2022 | 15 |
| 2023 | 25 |
| 2024 | 19 |
| 2025 | 8 |
| 2026 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Cyclic azine compound having adamantyl group, production method, and organic electroluminescent device containing it as constituent component
US-2016372678-A1 · Dec 22, 2016 · US
Process for fluorination of sulphonyl halide compounds
US-2016368866-A1 · Dec 22, 2016 · US
Sulfonium salt, chemically amplified resist composition, and patterning process
US-2016349612-A1 · Dec 1, 2016 · US
Method of manufacturing sulfonium salt
US-9469604-B2 · Oct 18, 2016 · US
Hydrogen oxidation catalyst
US-2016289254-A1 · Oct 6, 2016 · US
Resist composition, method of forming resist pattern, acid generator, photoreactive quencher, and compound
US-2016280679-A1 · Sep 29, 2016 · US
Salt, acid generator, photoresist composition, and method for producing photoresist pattern
US-2016200702-A1 · Jul 14, 2016 · US
Photoresist composition and method for producing photoresist pattern
US-2016195809-A1 · Jul 7, 2016 · US
Diaryliodonium salt
US-9376384-B2 · Jun 28, 2016 · US
Salt, acid generator, resist composition and method for producing resist pattern
US-2016168115-A1 · Jun 16, 2016 · US
Aryl acetate onium materials
US-2016168117-A1 · Jun 16, 2016 · US
Salt, resin, resist composition and method for producing resist pattern
US-2016145205-A1 · May 26, 2016 · US
Photoacid generators and photoresists comprising same
US-9348220-B2 · May 24, 2016 · US
Direct trifluoromethylations using trifluoromethane
US-9334253-B2 · May 10, 2016 · US
Photoacid generators and photoresists comprising same
US-2016124304-A1 · May 5, 2016 · US
Aryl acetate onium materials
US-9304394-B2 · Apr 5, 2016 · US
Salt, acid generator, resist composition and method for producing resist pattern
US-2016062233-A1 · Mar 3, 2016 · US
Diaryliodonium salt
US-2016046566-A1 · Feb 18, 2016 · US
Salt and photoresist composition comprising the same
US-9260407-B2 · Feb 16, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07C309/06?
- CPC C07C309/06 is the Cooperative Patent Classification code for “containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton.”
- How many patents are filed under CPC C07C309/06 (containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton)?
- Our database includes 274 publications tagged with this CPC code.
- Is patent activity under CPC C07C309/06 growing?
- Publication counts under this code: 19 in 2024 vs 8 in 2025 (latest complete years).