Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma
US-9288890-B1 · Mar 15, 2016 · US
Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma
US9668332B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9668332-B2 |
| Application number | US-201615069385-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 14, 2016 |
| Priority date | Oct 31, 2014 |
| Publication date | May 30, 2017 |
| Grant date | May 30, 2017 |
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Abstract
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Embodiments include a chemical processing apparatus and method of using the chemical processing apparatus to treat a substrate with a mono-energetic space-charge neutralized neutral beam-activated chemical process which is comprised of a substantially anisotropic beam of neutral particles. The chemical processing apparatus comprises a first plasma chamber for forming a first plasma at a first plasma potential, and a second plasma chamber for forming a second plasma at a second plasma potential greater than the first plasma potential, wherein the second plasma is formed using electron flux from the first plasma. Further, the chemical processing apparatus comprises an ungrounded dielectric (insulator) neutralizer grid configured to expose a substrate in the second plasma chamber to the substantially anisotropic beam of neutral particles traveling from the neutralizer grid.
First claim
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The invention claimed is: 1. An apparatus for treating a substrate, the apparatus comprising: a first plasma chamber for forming a first plasma at a first plasma potential; a second plasma chamber for forming a second plasma at a second potential greater than the first plasma potential; a separation member disposed between the first plasma chamber and the second plasma chamber, wherein the separation member enables electron transfer between the first plasma chamber and the second plasma chamber; and a holder disposed adjacent to the second plasma chamber and apart from the separation member, wherein the holder comprises a neutralizer grid comprising one or more of the following materials SiO 2 , quartz, HfO 2 , Y 2 O 3 , or aluminum oxide. 2. The apparatus of claim 1 , wherein the neutralizer grid comprises channels that have a length to width ratio greater than 5. 3. The apparatus of claim 1 , wherein the neutralizer grid comprises channels that have a length to width ratio greater than 15.
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- H05H3/02Primary
Molecular or atomic-beam generation, e.g. resonant beam generation · CPC title
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- What does patent US9668332B2 cover?
- Embodiments include a chemical processing apparatus and method of using the chemical processing apparatus to treat a substrate with a mono-energetic space-charge neutralized neutral beam-activated chemical process which is comprised of a substantially anisotropic beam of neutral particles. The chemical processing apparatus comprises a first plasma chamber for forming a first plasma at a first p…
- Who is the assignee on this patent?
- Tokyo Electron Ltd
- What technology area does this patent fall under?
- Primary CPC classification H05H3/02. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue May 30 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).