Additive manufacturing of an ion optical device
US-2025112014-A1 · Apr 3, 2025 · US
US9659735B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9659735-B2 |
| Application number | US-201514706485-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 7, 2015 |
| Priority date | Sep 12, 2012 |
| Publication date | May 23, 2017 |
| Grant date | May 23, 2017 |
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Graphene grids are configured for applications in vacuum electronic devices. A multilayer graphene grid is configured as a filter for electrons in a specific energy range, in a field emission device or other vacuum electronic device. A graphene grid can be deformable responsive to an input to vary electric fields proximate to the grid. A mesh can be configured to support a graphene grid.
Opening claim text (preview).
What is claimed is: 1. An apparatus comprising: a first grid configured to receive a flow of electrons in a vacuum device, wherein the first grid includes at least two substantially parallel layers of graphene, and wherein the vacuum device is configured with a set of device parameters; wherein the first grid is receptive to a voltage source to produce a voltage in the first grid; wherein the first grid is configured to transmit electrons in an energy pass band that is at least partially determined by the voltage and the set of device parameters; and wherein the voltage is dynamically tunable, and wherein tuning the voltage changes the energy pass band. 2. The apparatus of claim 1 wherein the set of device parameters and the voltage are selected to maximize the transmission of electrons through the first grid for the energy pass band. 3. The apparatus of claim 1 wherein the set of device parameters are at least partially selected according to a relative amount of inelastic scattering. 4. The apparatus of claim 3 wherein the set of device parameters are further selected to minimize the relative amount of inelastic scattering for a set of electron energies. 5. The apparatus of claim 1 wherein the set of device parameters includes a spacing between the at least two graphene layers that is at least partially determined by a spacer layer. 6. The apparatus of claim 5 wherein the spacer layer includes atoms. 7. The apparatus of claim 5 wherein the spacer layer includes molecules. 8. The apparatus of claim 1 wherein the set of device parameters includes a number of layers of graphene corresponding to the first grid, where the number of layers of graphene is greater than two. 9. The apparatus of claim 8 wherein the number of layers of graphene is further selected according to a mechanical strength of the first grid. 10. The apparatus of claim 1 wherein the set of device parameters includes a position of the first grid relative to a cathode and an anode. 11. The apparatus of claim 1 wherein the set of device parameters includes a voltage bias applied to at least one of a cathode, an anode, and the first grid. 12. The apparatus of claim 1 further comprising a second grid, and wherein the set of device parameters includes a position of the second grid relative to the first grid, a cathode, and an anode. 13. The apparatus of claim 12 wherein the set of device parameters includes a voltage bias applied to the second grid. 14. The apparatus of claim 1 wherein at least one of the at least two layers of graphene is doped. 15. The apparatus of claim 1 wherein the set of device parameters includes an incident angle defined by a direction of the flow of electrons and the first grid. 16. The apparatus of claim 1 wherein the first grid is arranged sufficiently close to a cathode to induce electron emission from the cathode when an electric potential is applied to the first grid in device operation. 17. The apparatus of claim 1 wherein the grid is characterized by an energy-dependent transmission probability spectrum, and wherein the set of device parameters is selected according to the energy dependent transmission probability spectrum. 18. An apparatus comprising: a cathode and a graphene grid that are configured in a vacuum electronic device, wherein the graphene grid is configured to modulate a flow of electrons from the cathode in device operation; wherein the cathode and the graphene grid are receptive to a voltage to produce an electric field between the cathode and the graphene grid; and wherein the graphene grid is deformable responsive to an input, and wherein the deformation responsive to the input is selected to change the electric field between the cathode and the graphene grid. 19. The apparatus of claim 18 wherein the input is at least one of an electrical force, a magnetic force, a mechanical force, and an acoustic force. 20. The apparatus of claim 18 wherein the deformation of the graphene grid is selected to change the electric field in a region proximate to the cathode to increase electron emission from the cathode. 21. The apparatus of claim 18 further comprising one or more additional grids arranged relative to the cathode and the graphene grid that are configured to modulate the flow of electrons, and wherein the graphene grid is deformable responsive to one or more forces from the one or more additional grids. 22. The apparatus of claim 18 wherein the graphene grid is pretensioned to adjust the amount of the deformation responsive to the input. 23. The apparatus of claim 18 wherein the graphene grid is fabricated such that it is non-homogenous to facilitate bending of the grid in one or more regions. 24. The apparatus of claim 18 wherein the cathode further includes insulating supports configured to prohibit contact between the cathode and the graphene grid. 25. An apparatus comprising: a cathode and a grid that are configured in a vacuum electronic device, wherein the grid is configured to modulate a flow of electrons from the cathode in device operation; wherein the grid includes a layer of graphene on a support structure; and wherein the support structure is in contact with the cathode and the graphene grid, and wherein the support structure has a thickness that determines the separation between the cathode and the graphene grid. 26. The apparatus of claim 25 wherein the support structure includes a layer of material patterned with holes. 27. The apparatus of claim 25 wherein the support structure includes at least one of a polymer, a silicon oxide, and silicon nitride. 28. The apparatus of claim 25 wherein the support structure includes a metal. 29. The apparatus of claim 28 wherein the metal includes at least one of Ni, Cu, Au, Al, Mo, and Ti. 30. The apparatus of claim 25 wherein the support structure includes an array of carbon nanotubes. 31. The apparatus of claim 25 wherein the support structure includes lacey carbon. 32. An apparatus comprising: a first grid configured to receive a flow of electrons in a vacuum device, wherein the first grid includes at least two substantially parallel layers of graphene, and wherein the vacuum device is configured with a set of device parameters; wherein the first grid is receptive to a voltage source to produce a voltage in the first grid; wherein the first grid is configured to transmit electrons in an energy pass band that is at least partially determined by the voltage and the set of device parameters; and wherein the set of device parameters and the voltage are selected to maximize the transmission of electrons through the first grid for the energy pass band. 33. The apparatus of claim 32 wherein the set of device parameters includes a spacing between the at least two graphene layers that is at least partially determined by a spacer layer. 34. The apparatus of claim 32 wherein the set of device parameters includes a position of the first grid relative to a cathode and an anode. 35. The apparatus of claim 32 wherein the set of device parameters includes a voltage bias applied to at least one of a cathode, an anode, and the first grid. 36. The apparatus of claim 32 wherein the set of device parameters include
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