Detecting arcing using processing chamber data

Patent metadata

Field	Value
Publication number	US-9653269-B2
Application number	US-201414459152-A
Country	US
Kind code	B2
Filing date	Aug 13, 2014
Priority date	Aug 14, 2013
Publication date	May 16, 2017
Grant date	May 16, 2017

Abstract

A method and apparatus for detecting substrate arcing and breakage within a processing chamber is provided. A controller monitors chamber data, e.g., parameters such as RF signals, voltages, and other electrical parameters, during operation of the processing chamber, and analyzes the chamber data for abnormal spikes and trends. Using such data mining and analysis, the controller can detect broken substrates without relying on glass presence sensors on robots, but rather based on the chamber data.

First claim

What is claimed is:

1. A method for operating a deposition chamber, the method comprising:
generating a threshold value associated with a first chamber parameter according to historical chamber data obtained during processing of prior substrates in the deposition chamber;
monitoring a RF match network for the first chamber parameter;
receiving the first chamber parameter from the match network during processing of a first substrate according to a stage of a recipe; and
determining at least one of a breakage exists in the first substrate or arcing has occurred in the deposition chamber while processing the first substrate in response to determining the first chamber parameter exceeds the threshold value.

2. The method of claim 1 , further comprising:
generating a time-weighted average of the historical chamber data for the first chamber parameter, wherein the threshold value associated with the first chamber parameter comprises an amount of deviation from the time-weighted average.

3. The method of claim 1 , further comprising:
responsive to determining the first chamber parameter exceeds the threshold value, halting operations of the deposition chamber and one or more tools operatively connected to the deposition chamber.

4. The method of claim 1 , further comprising:
responsive to determining the first chamber parameter exceeds the threshold value, halting operations of the deposition chamber only.

5. The method of claim 1 , further comprising:
responsive to determining the first chamber parameter exceeds the threshold value, transmitting an alert to a user.

6. The method of claim 1 , wherein the stage of the recipe comprises at least one of a deposition stage and a power lift stage of the recipe.

7. The method of claim 1 , wherein the first chamber parameter comprises radio frequency (RF) signal data.

8. The method of claim 1 , wherein the first chamber parameter further comprises:
one or more of a RF frequency, RF load, reflected power, forward power.

9. A computer-readable storage medium storing a program, which, when executed by a processor performs an operation for operating a deposition chamber, the operation comprising:
generating a threshold value associated with a first chamber parameter according to historical chamber data obtained during processing of prior substrates in the deposition chamber;
monitoring a RF match network for the first chamber parameter;
receiving the first chamber parameter from the RF match network during processing of a first substrate according to a stage of a recipe; and
determining at least one of a breakage exists in the first substrate or arcing has occurred in the deposition chamber while processing the first substrate in response to determining the first chamber parameter exceeds the threshold value.

10. The computer-readable storage medium of claim 9 , wherein the operation further comprises:
generating a time-weighted average of the historical chamber data for the first chamber parameter, wherein the threshold value associated with the first chamber parameter comprises an amount of deviation from the time-weighted average.

11. The computer-readable storage medium of claim 9 , wherein the operation further comprises:
responsive to determining the arcing has occurred between the deposition chamber and the first substrate, transmitting an alert to a user notifying the user of the arcing.

12. The computer-readable storage medium of claim 9 , wherein the operation further comprises:
responsive to determining the arcing has occurred between the deposition chamber and the first substrate, halting operations of the deposition chamber and one or more tools operatively connected to the deposition chamber.

13. The computer-readable storage medium of claim 9 , wherein the operation further comprises:
responsive to determining the arcing has occurred between the deposition chamber and the first substrate, halting operations of the deposition chamber only.

14. The computer-readable storage medium of claim 9 , wherein the stage of the recipe comprises at least one of a deposition stage and a power lift stage of the recipe.

15. The computer-readable storage medium of claim 9 , wherein the first chamber parameter comprises at least one of self bias voltage and radio frequency (RF) signal data.

16. The computer-readable storage medium of claim 9 , wherein the first chamber parameter further comprises:
one or more of a RF frequency, RF load, reflected power, forward power.

17. A controller for a deposition chamber, the controller comprising a system memory and a processor programmed to carry out the stages of:
receiving historical chamber data obtained during processing of prior substrates in the deposition chamber;
generating a threshold value associated with a first chamber parameter according to the historical chamber data;
monitoring a RF match network for the first chamber parameter;
receiving the first chamber parameter from the match network during processing of a first substrate according to a stage of a recipe; and
determining arcing has occurred between the deposition chamber and the first substrate in response to determining the first chamber parameter exceeds the threshold value.

18. The controller of claim 17 , wherein the processor is further programmed the carry out the stages of:
generating a time-weighted average of the historical chamber data for the first chamber parameter, wherein the threshold value associated with the first chamber parameter comprises an amount of deviation from the time-weighted average.

19. The controller of claim 17 , wherein the processor is further programmed the carry out the stages of:
responsive to determining the arcing has occurred between the deposition chamber and the first substrate, transmitting an alert to a user notifying the user of the arcing.

20. The controller of claim 17 , wherein the processor is further programmed the carry out the stages of:
responsive to determining the arcing has occurred between the deposition chamber and the first substrate, halting operations of the deposition chamber and one or more tools operatively connected to the deposition chamber.

21. The controller of claim 17 , wherein the stage of the recipe comprises at least one of a deposition stage and a power lift stage of the recipe.

22. The controller of claim 17 , wherein the first chamber parameter comprises at least one of self bias voltage and radio frequency (RF) signal data.

23. The controller of claim 17 , wherein the first chamber parameter further comprises:
one or more of a RF, RF load, reflected power, forward power.

Assignees

• Applied Materials Inc

Inventors

• Na Shuo
• Yancy Kelby
• Chen Chunsheng
• Iliopoulos Ilias

Classifications

• H01J2237/24592

  Inspection and quality control of devices · CPC title

• H01J37/32944 Primary

  Arc detection · CPC title

• G01R31/245

  Testing of gas discharge tubes · CPC title

• G01R31/12

  Testing dielectric strength or breakdown voltage {; Testing or monitoring effectiveness or level of insulation, e.g. of a cable or of an apparatus, for example using partial discharge measurements; Electrostatic testing (G01R31/08, G01R31/327 and G01R31/72 take precedence; measuring in plasmas G01R19/0061; measuring dielectric constants G01R27/2617; ESD, EMC or EMP testing of circuits G01R31/002)} · CPC title

• H01J2237/0225

  Detecting or monitoring foreign particles · CPC title