Plasma processing apparatus, plasma processing method, and recording medium

Patent metadata

Field	Value
Publication number	US-2016293390-A1
Application number	US-201615080822-A
Country	US
Kind code	A1
Filing date	Mar 25, 2016
Priority date	Mar 30, 2015
Publication date	Oct 6, 2016
Grant date	—

Abstract

There is provided an apparatus of performing a plasma process on substrates mounted on an upper surface of a rotary table. The apparatus includes: a heater for heating the substrates; a process gas supply part for supplying a process gas toward the upper surface of the rotary table; an antenna for generating an inductively coupled plasma by converting the process gas to plasma; a light detection part for detecting respective light intensities of R, G and B component as light color components; a calculation part for obtaining an evaluation value corresponding to a change amount before and after supplying a high-frequency power to the antenna, with respect to at least one of the respective light intensities; and an ignition determination part for comparing the evaluation value with a threshold value and to determine that ignition of plasma is not generated if the evaluation value does not exceed the threshold value.

First claim

What is claimed is:

1 . A plasma processing apparatus of performing a plasma process with respect to substrates which are mounted on an upper surface of a rotary table installed within a vacuum container, while rotating the rotary table and consequently revolving the substrates, the apparatus comprising:
a heater installed under the rotary table and configured to heat the substrates; a process gas supply part configured to supply a process gas toward the upper surface of the rotary table; an antenna configured to generate an inductively coupled plasma by converting the process gas to plasma; a light detection part configured to detect respective light intensities of an R component, a G component and a B component as light color components in a plasma generation region; a calculation part configured to obtain an evaluation value corresponding to a change amount before and after supplying a high-frequency power to the antenna, with respect to at least one of the respective light intensities of the R component, the G component and the B component detected by the light detection part; and an ignition determination part configured to compare the evaluation value obtained at the calculation part with a threshold value and to determine that ignition of plasma is not generated if the evaluation value does not exceed the threshold value, wherein the rotary table is made of a material which transmits light generated by the heater.

2 . The apparatus of claim 1 , wherein the evaluation value is a value corresponding to a change amount of a percentage of at least one of the respective light intensities of the R component, the G component and the B component.

3 . The apparatus of claim 2 , wherein the value corresponding to the change amount of the percentage of at least one of the respective light intensities is a value corresponding to a change rate of the percentage of at least one of the respective light intensities.

4 . The apparatus of claim 1 , wherein a Faraday shield is installed between the antenna and the plasma generation region, and the light detection part is installed to detect light in the plasma generation region through an opening portion of the Faraday shield.

5 . The apparatus of claim 1 , further comprising:
a control part configured to output a control signal so that when it is determined by the ignition determination part that the ignition of plasma is not generated, the supply of the high-frequency power to the antenna is first stopped and then the supply of the high-frequency power to the antenna is resumed.

6 . A plasma processing method, comprising:
mounting substrates on an upper surface of a rotary table installed within a vacuum container and revolving the substrates by rotating the rotary table; heating the substrates by a heater installed under the rotary table; supplying a process gas toward one surface of the rotary table; supplying a high-frequency power to an antenna in order to generate an inductively coupled plasma by converting the process gas to plasma; detecting respective light intensities of an R component, a G component and a B component as light color components in a plasma generation region; obtaining an evaluation value corresponding to a change amount before and after the supply of the high-frequency power to the antenna, with respect to at least one of the detected respective light intensities of the R component, the G component and the B component; and comparing the obtained evaluation value with a threshold value and determining that ignition of plasma is not generated if the evaluation value does not exceed the threshold value, wherein the rotary table is made of a material which transmits light generated by the heater.

7 . A non-transitory computer-readable recording medium storing a computer program used in a plasma processing apparatus of performing a plasma process with respect to substrates which are mounted on an upper surface of a rotary table installed within a vacuum container while rotating the rotary table and consequently revolving the substrates, the computer program including instructions organized to perform the plasma processing method of claim 6 .

Assignees

• Tokyo Electron Ltd

Inventors

• Miura Shigehiro
• Kobayashi Takeshi
• Sugawara Katsuaki
• Ito Naohide

Classifications

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H01J37/3211

  Antennas, e.g. particular shapes of coils · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title