Plasma electrode device and method for manufacturing the same

US9646806B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9646806-B2
Application numberUS-201514660126-A
CountryUS
Kind codeB2
Filing dateMar 17, 2015
Priority dateMar 25, 2014
Publication dateMay 9, 2017
Grant dateMay 9, 2017

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided are a plasma electrode device and a manufacturing method thereof. The plasma electrode device includes a first substrate including a first substrate main body having a first flow hole through which air flows and a first discharge electrode disposed on one surface of the first substrate main body and a second substrate disposed on one side of the first substrate, the second substrate including a second flow hole through which air flows and a second discharge electrode acting with the first substrate. The first substrate main body includes a ground electrode acting with the first or second discharge electrode to perform plasma discharge and a first insulator coupled to the ground electrode.

First claim

Opening claim text (preview).

What is claimed is: 1. A plasma electrode device comprising: a first substrate including a first substrate body and a first discharge electrode, the first substrate body having at least one first flow hole for air to flow, and the first discharge electrode is on a surface of the first substrate body; and a second substrate disposed on a side of the first substrate, the second substrate including at least one second flow hole for air to flow, and a second discharge electrode, wherein the first substrate body includes: a ground electrode to act with the first discharge electrode or the second discharge electrode to perform plasma discharge; and a first insulator to couple to the ground electrode, wherein the plasma electrode device further comprises a photocatalyst between the first insulator and the first discharge electrode, and the photocatalyst to activate by visible light to decompose a pollutant or reduce ozone. 2. The plasma electrode device according to claim 1 , wherein the first insulator to surround the ground electrode. 3. The plasma electrode device according to claim 2 , wherein the first insulator includes: a first base on which the ground electrode is provided; a first side surface part to extend from a first side and a second side of the first base, the first side surface part to cover side surfaces of the ground electrode; and a first top surface part to cover a top surface of the ground electrode. 4. The plasma electrode device according to claim 1 , wherein the second substrate includes a second insulator to surround the second discharge electrode. 5. The plasma electrode device according to claim 4 , wherein the second insulator includes: a second base on which the second discharge electrode is provided; a second side surface part to extend from a first side and a second side of the second base, the second side surface part to cover side surfaces of the second discharge electrode; and a second top surface part to cover a top surface of the second discharge electrode. 6. he plasma electrode device according to claim 1 , further comprising a distance formation part between the first substrate and the second substrate to space the second substrate a predetermined distance from the first substrate. 7. The plasma electrode device according to claim 4 , wherein the first insulator is formed of an epoxy resin. 8. The plasma electrode device according to claim 4 , wherein the second insulator is formed of an epoxy resin. 9. The plasma electrode device according to claim 1 , wherein the photocatalyst includes silver phosphate (Ag 3 PO 4 ), titanium dioxide (TiO 2 ), and inorganic binder. 10. The plasma electrode device according to claim 1 , wherein the at least one first flow hole is provided in plurality, and the at least one second flow hole has a same number as the plurality of the first flow holes to communicate with the plurality of first flow holes. 11. A plasma electrode device comprising: a first substrate including a first substrate body and a first discharge electrode, the first substrate body having at least one first flow hole for air to flow, and the first discharge electrode is on a surface of the first substrate body; and a second substrate disposed on a side of the first substrate, the second substrate including at least one second flow hole for air to flow, and a second discharge electrode, wherein the first substrate body includes: a ground electrode to act with the first discharge electrode or the second discharge electrode to perform plasma discharge; and a first insulator to couple to the ground electrode, wherein the first discharge electrode includes: a discharge electrode to receive electric power; a pattern frame to surround a portion of the at least one first flow hole, and the pattern frame to have a preset shape around the portion of the at least one first flow hole; and at least one discharge needle provided at the pattern frame. 12. A plasma electrode device comprising: a first substrate including a first substrate body and a first discharge electrode, the first substrate body having at least one first flow hole for air to flow, and the first discharge electrode is on a surface of the first substrate body; and a second substrate disposed on a side of the first substrate, the second substrate including at least one second flow hole for air to flow, and a second discharge electrode, wherein the first substrate body includes: a ground electrode to act with the first discharge electrode or the second discharge electrode to perform plasma discharge; and a first insulator to couple to the ground electrode, wherein the at least one first flow hole is provided in plurality, and a pattern frame is disposed to surround a portion of the plurality of first flow holes. 13. A method for providing a plasma electrode device, comprising: providing a first substrate by: providing a ground electrode on a surface part of a first insulator; covering the ground electrode using a side part and a top part of the first insulator; providing a photocatalyst on the first insulator; and providing a first discharge electrode on the photocatalyst. 14. The method according to claim 13 , further comprising: providing a second substrate; and providing a distance formation part between the second substrate and the first substrate, wherein the providing of the second substrate includes: providing a second discharge electrode on a surface part of a second insulator; and covering a side surface and a top surface of the second discharge electrode with a side surface part and a top surface part of the second insulator. 15. A plasma electrode device comprising: a first substrate provided with a first substrate body including a ground electrode and a photocatalyst, the first substrate including a first discharge electrode on a surface of the first substrate body; a first insulator on the first substrate body, the first insulator to surround the ground electrode; a second substrate disposed on a side of the first substrate, the second substrate including a second substrate body, the second substrate including a second discharge electrode; a second insulator on the second substrate body, the second insulator to surround the second discharge electrode; and a distance formation part between the first substrate and the second substrate. 16. The plasma electrode device according to claim 15 , wherein the first substrate body includes a plurality of first flow holes for air to flow, and the first discharge electrode is on a surface of the first substrate body. 17. The plasma electrode device according to claim 16 , wherein the first discharge electrode includes: a discharge electrode to receive electric power; a plurality of pattern frames to surround portions of the plurality of first flow holes, and each of the pattern frames to have a closed shape; and at least one discharge needle to protrude from an outer circumferential surface of one of the pattern frames. 18. The plasma electrode device according to claim 17 , wherein the pattern frame has one of a circular shape, an oval shape, and a polygonal shape. 19. The plasma electrode device according to claim 16 , wherein a plurality of second flow holes are provided in the second substrate body, and locations of the plurality of second flow holes corresponding to locations of the plurality of first flow holes.

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What does patent US9646806B2 cover?
Provided are a plasma electrode device and a manufacturing method thereof. The plasma electrode device includes a first substrate including a first substrate main body having a first flow hole through which air flows and a first discharge electrode disposed on one surface of the first substrate main body and a second substrate disposed on one side of the first substrate, the second substrate in…
Who is the assignee on this patent?
Lg Electronics Inc
What technology area does this patent fall under?
Primary CPC classification B01D53/323. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 09 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).