Gas processing apparatus

Patent metadata

Field	Value
Publication number	US-9468698-B2
Application number	US-201514633745-A
Country	US
Kind code	B2
Filing date	Feb 27, 2015
Priority date	Mar 24, 2014
Publication date	Oct 18, 2016
Grant date	Oct 18, 2016

Abstract

A gas processing apparatus of an embodiment includes: first and second dielectric substrates facing with each other; first and second discharge electrodes respectively disposed on a pair of facing principal surfaces of the dielectric substrates; first and second ground electrodes respectively disposed on a pair of principle surfaces at opposite sides of the principle surfaces of the dielectric substrates; a gas flow path to supply gas to be processed between the discharge electrodes; an AC power source to generate first and second plasma-induced flows by applying an AC voltage between the discharge electrodes and the ground electrodes; and a region disposed between the dielectric substrates at downstream of the plasma-induced flows from the discharge electrodes, and a gap between the dielectric substrates being 1.3 times or less of a sum of thicknesses of the plasma-induced flows.

First claim

What is claimed is:

1. A gas processing apparatus, comprising:
a first and a second dielectric substrate facing with each other;
a first and a second discharge electrode respectively disposed on a pair of facing principal surfaces of the dielectric substrates;
a first and a second ground electrode respectively disposed on a pair of principle surfaces at opposite sides of the principle surfaces of the dielectric substrates;
a gas port downstream of a gas inlet port configured to add an addition gas including a hydrogen element to atmosphere, an object gas including at least one of carbon element and nitrogen element, and oxygen gas, forming a gas mixture;
a gas flow path configured to supply the gas mixture between the first and second discharge electrodes;
an AC power source configured to generate a first plasma-induced flow at a first discharge electrode side and a second plasma-induced flow at a second discharge electrode side by, applying an AC voltage between the first discharge electrode and the second discharge electrodes and the ground electrodes to ionize the mixture the first and the second plasma-induced flows including OH radical formed from the oxygen gas and the addition gas; and
a region disposed between the dielectric substrates at downstream of the plasma-induced flows from the first and second discharge electrodes, and a gap between the dielectric substrates being 2 mm or more and 6 mm or less,
wherein the object gas in the gap is decomposed by the OH radical.

2. The gas processing apparatus of claim 1 ,
wherein the first and second ground electrodes are respectively disposed to be shifted in a direction relative to the first and second discharge electrodes, and the plasma-induced flows flow in the direction.

3. The gas processing apparatus of claim 1 ,
wherein the gap becomes narrow in a direction along the plasma-induced flows.

4. The gas processing apparatus of claim 1 ,
wherein a distance L from a downstream side end of the first ground electrode to a downstream side end of the first dielectric substrate is a product of 0.001 [sec] and a flow rate v [m/sec] of the gas mixture (0.001*v) or less.

5. The gas processing apparatus of claim 1 , further comprising:
photocatalyst layers respectively disposed on the facing principle surfaces of the dielectric substrates.

6. The gas processing apparatus of claim 1 ,
wherein the addition gas is water vapor.

7. The gas processing apparatus of claim 1 , further comprising:
a third dielectric substrate disposed on the second ground electrode;
a gas flow partition facing the third dielectric substrate;
a third discharge electrode disposed on the third dielectric substrate, the AC power source being configured to generate a third plasma-induced flow at the third discharge electrode side by applying the AC voltage between the third discharge electrode and the second ground electrode to ionize the gas mixture, the third plasma-induced flow including OH radical; and
a second region disposed between the third dielectric substrate and the gas flow partition at downstream of the third plasma-induced flow from the third discharge electrode, and a second gap between the third dielectric substrate and the gas flow partition being 1 mm or more and 3 mm or less,
wherein the object gas in the second gap is decomposed by the OH radical.

8. The gas processing apparatus of claim 7 ,
wherein the gas flow partition includes a projecting part heading for the third dielectric substrate.

9. The gas processing apparatus of claim 7 ,
wherein the second gap becomes narrow in a direction along the third plasma-induced flow.

10. The gas processing apparatus of claim 1 , further comprising:
a third dielectric substrate disposed on the first ground electrode;
a fourth dielectric substrate facing the third dielectric substrate;
a third and a fourth discharge electrode respectively disposed on a pair of facing principle surfaces of the third and fourth dielectric substrates; and
a third ground electrode disposed on a principle surface at an opposite side of the principle surface of the fourth dielectric substrate,
the AC power source being configured to generate a third plasma-induced flow at the third discharge electrode side and a fourth plasma-induced flow at the fourth discharge electrode side by applying the AC voltage between the third discharge electrode and the first ground electrode and between the fourth discharge electrode and the third ground electrode to ionize the gas mixture, the third and fourth plasma-induced flow including OH radical; and
a second gap between the third and fourth dielectric substrates being 2 mm or more and 6 mm or less,
wherein the object gas in the second gap is decomposed by the OH radical.

11. The gas processing apparatus of claim 10 , further comprising:
a switching mechanism configured to select one of or both of a group of the first and second discharge electrodes and a group of the third and fourth discharge electrodes, and to apply a high-voltage AC voltage.

Assignees

• Toshiba Kk

Inventors

• Ui Akio
• Sato Yosuke
• Akita Masato
• Sanada Yasushi

Classifications

• A61L9/22 Primary

  Ionisation · CPC title

• A61L9/16 Primary

  using physical phenomena · CPC title

• B01D2257/90

  Odorous compounds not provided for in groups B01D2257/00 - B01D2257/708 · CPC title

• B01D2257/406

  Ammonia · CPC title

• B01D53/323

  by electrostatic effects or by high-voltage electric fields · CPC title