Lithographic system, lithographic method and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9632430-B2
Application number	US-200913120495-A
Country	US
Kind code	B2
Filing date	Sep 17, 2009
Priority date	Sep 23, 2008
Publication date	Apr 25, 2017
Grant date	Apr 25, 2017

Abstract

A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.

First claim

What is claimed is:

1. A method of using a lithography system, the method comprising:
projecting, using a projection system, a beam of radiation onto a target on a substrate;
obtaining pupil plane images from the target on the substrate for a plurality of parameters of a lithographic apparatus, each of the pupil plane images corresponding to a respective parameter of the plurality of parameters of the lithographic apparatus, each parameter of the plurality of parameters of the lithographic apparatus being different from other parameters of the plurality of parameters of the lithographic apparatus;
determining a magnitude of vibration in the lithographic apparatus based on at least two of the pupil plane images obtained at different times;
calculating moment functions based on intensities of the pupil plane images, each of the moment functions being a representative of a corresponding one of the pupil plane images;
determining a lithographic system identification based on correlations between the moment functions and the plurality of parameters of the lithographic apparatus or features of the target; and
adjusting, using a lithography controller, one or more parameters from among the plurality of parameters of the lithographic apparatus based on the lithographic system identification to control a lithographic process.

2. The method according to claim 1 , wherein the obtaining of the pupil plane images comprises:
producing, using a scatterometer, the pupil plane images from radiation scattered from the target on the substrate.

3. The method according to claim 1 , wherein the obtaining of the pupil plane images comprises:
simulating the pupil plane images based on radiation scattered from the target on the substrate.

4. The method according to claim 1 , wherein:
each of the pupil plane images is a two-dimensional image; and
the two-dimensional image corresponds to two orthogonal basis functions, each orthogonal basis function of the two orthogonal basis functions corresponding to a different respective direction in the two-dimensional image.

5. The method according to claim 1 , further comprising:
obtaining the pupil plane images based on radiation scattered from the target at different times;
calculating coefficients of the moment functions based on orthogonal basis functions, each of the moment functions being a representative of the corresponding one of the pupil plane images;
determining correlations between each of the moment functions and a corresponding parameter from among the plurality of parameters of the lithographic apparatus or a corresponding feature of the features of the target; and
determining the lithographic system identification based on the correlations.

6. A lithographic system comprising:
a lithographic apparatus comprising:
an illumination optical system configured to illuminate a pattern, and
a projection optical system configured to project an image of the pattern on to a substrate;

a measurement system configured to obtain pupil plane images from the pattern for a plurality of parameters of the lithographic apparatus, each of the pupil plane images corresponding to a respective parameter of the plurality of parameters of the lithographic apparatus, each parameter of the plurality of parameters of the lithographic apparatus being different from other parameters of the plurality of parameters of the lithographic apparatus;
a computational arrangement configured to:
determine a magnitude of vibration in the lithographic apparatus based on at least two of the pupil plane images obtained at different times:
calculate moment functions based on intensities of the pupil plane images, each of the moment functions being a representative of a corresponding one of the pupil plane images, and
determine a lithographic system identification based on correlations between the moment functions and the plurality of parameters of the lithographic apparatus or features of the pattern; and

a controller configured to adjust one or more parameters from among the plurality of parameters of the lithographic apparatus based on the lithographic system identification to control a lithographic process.

7. The lithographic system according to claim 6 wherein the measurement system comprises a scatterometer.

8. The lithographic system according to claim 6 , wherein each of the pupil plane images is a simulated pupil plane image that corresponds to a simulation of the pattern based on radiation scattered from the pattern.

9. The lithographic system according to claim 6 , wherein:
each of the pupil plane images is a two-dimensional image; and
the two-dimensional image corresponds to two orthogonal basis functions, each orthogonal basis function of the two orthogonal basis functions corresponding to a different respective direction in the two-dimensional image.

10. A system comprising:
a measurement system configured to:
direct a beam of radiation onto a target pattern on a substrate, and
obtain pupil plane images based on radiation scattered from the target pattern for a plurality of input parameters of a lithographic apparatus, each of the pupil plane images corresponding to a respective input parameter of the plurality of input parameters of the lithographic apparatus, each input parameter of the plurality of input parameters of the lithographic apparatus being different from other input parameters of the plurality of input parameters of the lithographic apparatus; and

a computational arrangement configured to:
determine a magnitude of vibration in the lithographic apparatus based on at least two of the pupil plane images obtained at different times.
calculate moment functions based on orthogonal basis functions, each of the moment functions being a representative of a corresponding one of the pupil plane images, and
determine a lithographic system identification based on correlations between the moment functions and the plurality of input parameters of the lithographic apparatus or features of the target pattern; and

a controller configured to adjust one or more input parameters from among, the plurality of input parameters of the lithographic apparatus based on the lithographic system identification to control a lithographic process.

11. A lithographic cell comprising:
a coater configured to coat substrates with a radiation sensitive layer;
a lithographic apparatus configured to expose images onto the radiation sensitive layer of substrates;
a developer configured to develop images exposed by the lithographic apparatus;
a measurement system configured to:
obtain pupil plane images based on radiation scattered from a target pattern on a substrate for a plurality of parameters of the lithographic apparatus, each of the pupil plane images corresponding to a respective parameter of the plurality of parameters of the lithographic apparatus, each parameter of the plurality of parameters of the lithographic apparatus being different from other parameters of the plurality of parameters of the lithographic apparatus;

a computational arrangement configured to:
determine a magnitude of vibration in the lithographic apparatus based on at least two of the pupil plane images obtained at different times;
calculate moment functions based on orthogonal basis functions, each of the moment functions being a representative of a corresponding one of the pupil plane images, and
determine a lithographic system identification based on correlations between the moment functions and the plurality of parameters of the lithographic apparatus or features of the target pattern; and

a controller configured to adjust one or more parameters from among the plurality of para

Assignees

• Mos Everhardus Cornelis
• Van Der Schaar Maurits
• Middlebrooks Scott Anderson
• Asml Netherlands Bv

Inventors

• Mos Everhardus Cornelis
• Van Der Schaar Maurits
• Middlebrooks Scott Anderson

Classifications

• G03F7/70625 Primary

  Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness · CPC title

• G03F7/70525

  Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure · CPC title