SiC single crystal manufacturing method using alternating states of supersaturation

US9624599B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9624599-B2
Application numberUS-201114350448-A
CountryUS
Kind codeB2
Filing dateDec 9, 2011
Priority dateOct 31, 2011
Publication dateApr 18, 2017
Grant dateApr 18, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A SiC single crystal manufacturing method whereby growing speed improvement required to have high productivity can be achieved, while maintaining flat growth in which uniform single crystal growth can be continued at the time of growing a SiC single crystal using a solution method. In the method, a SiC single crystal is grown in a crucible from a Si solution containing C. The method includes alternately repeating: a high supersaturation degree growing period, in which the growth is promoted by maintaining the supersaturation degree of C in the Si solution higher than an upper limit critical value at which flat growth can be maintained, the supersaturation degree being at a growing interface between the Si solution and a SiC single crystal being grown; and a low supersaturation degree growing period, in which the growth is promoted by maintaining the supersaturation degree lower than the critical value.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing a SiC single crystal in which a SiC single crystal is grown from a Si solution of C in a crucible, employing alternate repetition between a high supersaturation growth period in which growth is progressed while keeping a degree of supersaturation of C in the Si solution at a growth boundary between the growing SiC single crystal and the Si solution higher than a maximum critical value at which flat growth can be maintained, and a low supersaturation growth period in which growth is progressed while keeping the degree of supersaturation lower than the critical value, wherein the ratio between a value Sa which is the difference between the high degree of supersaturation and the critical value integrated over a continuous time during the high supersaturation growth period, and a value Sb which is the difference between the low degree of supersaturation and the critical value integrated over a continuous time during the low supersaturation growth period, Sb/Sa, is greater than or equal to 1.25. 2. A method for manufacturing a SiC single crystal in which a SiC single crystal is grown from a Si solution of C in a crucible, employing alternate repetition between a high supersaturation growth period in which growth is progressed while keeping a degree of supersaturation of C in the Si solution at a growth boundary between the growing SiC single crystal and the Si solution higher than a maximum critical value at which flat growth can be maintained, and a low supersaturation growth period in which growth is progressed while keeping the degree of supersaturation lower than the critical value, wherein the degree of supersaturation is varied by varying a height of a meniscus formed from the growth boundary up to a surface of the Si solution in the crucible. 3. The method for manufacturing a SiC single crystal according to claim 1 , wherein the degree of supersaturation is varied by varying a temperature gradient in the Si solution in the crucible. 4. The method for manufacturing a SiC single crystal according to claim 1 , wherein the degree of supersaturation is varied by varying a height of a meniscus formed from the growth boundary up to a surface of the Si solution in the crucible.

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Classifications

  • adding crystallising materials or reactants forming it in situ to the melt · CPC title

  • Carbides · CPC title

  • C30B19/04Primary

    the solvent being a component of the crystal composition · CPC title

  • C30B15/22Primary

    Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal · CPC title

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What does patent US9624599B2 cover?
A SiC single crystal manufacturing method whereby growing speed improvement required to have high productivity can be achieved, while maintaining flat growth in which uniform single crystal growth can be continued at the time of growing a SiC single crystal using a solution method. In the method, a SiC single crystal is grown in a crucible from a Si solution containing C. The method includes al…
Who is the assignee on this patent?
Kado Motohisa, Daikoku Hironori, Kusunoki Kazuhiko, and 2 more
What technology area does this patent fall under?
Primary CPC classification C30B19/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 18 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).