Package architecture utilizing wafer to wafer bonding
US-2024379487-A1 · Nov 14, 2024 · US
US9601406B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9601406-B2 |
| Application number | US-201313782893-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 1, 2013 |
| Priority date | Mar 1, 2013 |
| Publication date | Mar 21, 2017 |
| Grant date | Mar 21, 2017 |
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A copper nanorod thermal interface material (TIM) is described. The copper nanorod TIM includes a plurality of copper nanorods having a first end thermally coupled with a first surface, and a second end extending toward a second surface. A plurality of copper nanorod branches are formed on the second end. The copper nanorod branches are metallurgically bonded to a second surface. The first surface may be the back side of a die. The second surface may be a heat spread or a second die. The TIM may include a matrix material surrounding the copper nanorods. In an embodiment, the copper nanorods are formed in clusters.
Opening claim text (preview).
What is claimed is: 1. A thermal interface material, comprising: a plurality of copper nanorods, each having a first end thermally coupled with a first surface and a second end extending toward a second surface, wherein the second surface is copper; and a plurality of copper nanorod branches extending from each second end, wherein the copper nanorod branches have a Cu—Cu metallurgic bond to the second surface. 2. The thermal interface material of claim 1 , wherein the thermal interface material has a thermal resistivity less than 0.03 C-cm 2 /W. 3. The thermal interface material of claim 1 , wherein the copper nanorods have a diameter less than 20 μm. 4. The thermal interface material of claim 1 , wherein the copper nanorods have a length from 5 μm to 50 μm. 5. The thermal interface material of claim 1 , wherein the copper nanorods are spaced from 5 nm to 10 μm apart. 6. The thermal interface material of claim 1 , wherein 10% to 50% of a surface area of the first surface is occupied by copper nanorods. 7. The thermal interface material of claim 1 , wherein 10% to 50% of a volume between the first surface and the second surface is occupied by copper nanorods. 8. The thermal interface material of claim 1 , wherein the copper nanorods are clustered in a plurality of nanorod clusters. 9. The thermal interface material of claim 8 , wherein the nanorod clusters have an average diameter from 50 to 100 μm. 10. The thermal interface material of claim 8 , wherein the clusters have an average spacing from 50 to 100 μm. 11. The thermal interface material of claim 1 , further comprising a matrix material between the first surface and the second surface. 12. The thermal interface material of claim 1 , wherein the first surface is copper, and wherein the first ends are metallurgically bonded with the first surface. 13. The thermal interface material of claim 1 , wherein the copper nanorods have a <110> orientation along a central axis. 14. The thermal interface material of claim 1 , wherein the copper branches extend from <111> facets on the second end of the copper nanorods. 15. A method for thermally coupling a first surface and a second surface, comprising: growing a plurality of copper nanorods from the first surface, wherein the copper nanorods have a first end thermally coupled with the first surface and a second end extending away from the first surface; growing a plurality of copper nanorod branches on each second end; and metallurgically bonding the second surface to the copper nanorod branches, wherein the second surface is copper wherein the copper nanorod branches have a Cu—Cu metallurgic bond to the second surface. 16. The method of claim 15 , further comprising, prior to growing a plurality of copper nanorods: forming a patterning layer over the first surface; and patterning the patterning layer to expose portions of the first surface. 17. The method of claim 15 , wherein metallurgically bonding the second surface to the copper nanorod branches comprises heating the nanorod branches and the second surface to a temperature less than 400° C. 18. The method of claim 15 , further comprising underfilling the remaining space between the first surface and the second surface with a matrix material. 19. The method of claim 15 , further comprising forming a nickel layer on the copper nanorods and copper nanorod branches to prevent oxidation. 20. The method of claim 15 , further comprising introducing a fluxing agent to remove oxide from the copper nanorods and copper nanorod branches. 21. The method of claim 15 , wherein the copper nanorods are grown by one of sputter deposition and vapor deposition.
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