Charged particle radiation apparatus

US9601307B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9601307-B2
Application numberUS-201414764641-A
CountryUS
Kind codeB2
Filing dateFeb 5, 2014
Priority dateMar 15, 2013
Publication dateMar 21, 2017
Grant dateMar 21, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a high-throughput scanning electron microscope in which a wafer ( 9 ) is held by an electrostatic chuck ( 10 ), an image is obtained using an electron beam, and the wafer surface is measured, wherein even in a case where the temperature of the wafer ( 9 ) is changed due to the environmental temperature the electron scanning microscope is capable of preventing any loss in resolution or the deterioration of the measurement reproducibility caused by thermal shrinkage accompanied by temperature change of the wafer ( 9 ). A drill hole is provided on the rear surface of the electrostatic chuck ( 10 ), and a thermometer ( 34 ) is secured in place so that the front end is brought into elastic contact with the bottom surface of the drill hole. The output of the thermometer ( 34 ) is sent to a computing unit, the computing unit computes a measurement limit time for beginning measurement, based on a predetermined algorithm, from an output value of the thermometer ( 34 ), and measuring begins at individual measurement sites after the measurement limit time has elapsed.

First claim

Opening claim text (preview).

The invention claimed is: 1. A charged particle radiation apparatus which is provided with an electrostatic chuck for holding a specimen, the apparatus comprising: a thermometer which measures the temperature of the electrostatic chuck; and a control device which controls the charged particle radiation apparatus to perform a measurement or an inspection using a charged particle beam after a waiting time depending on temperature information obtained by the thermometer, wherein the control device performs the measurement or the inspection using the charged particle beam after the waiting time configured for each of a plurality of measurement points or for each of a plurality of inspection points. 2. The charged particle radiation apparatus according to claim 1 , wherein the electrostatic chuck is a Coulombic-type electrostatic chuck in which an intrinsic resistivity of a dielectric is 10 14 Ωcm or more. 3. The charged particle radiation apparatus according to claim 1 , wherein the electrostatic chuck is formed with a counter bore having a proximity surface relatively closer to a specimen attracting plane of the electrostatic chuck with respect to a plane opposite to the specimen attracting plane of the electrostatic chuck, and wherein the proximity surface is provided with a pressing member for pressing the thermometer. 4. The charged particle radiation apparatus according to claim 3 , wherein the pressing member has a spring which presses the thermometer into the proximity surface with a spring force. 5. A charged particle radiation apparatus which holds a specimen by an electrostatic chuck, acquires an image using an electron beam and measures a surface of the specimen, the apparatus comprising: a temperature controller for cooling; and a thermometer which is capable of measuring the temperature of the electrostatic chuck, wherein an output of the thermometer is sent to a computing unit to calculate an average temperature of the specimen during a predetermined period from the output value of the thermometer based on a predetermined algorithm by the computing unit, and a set temperature of the temperature controller is adjusted so that a temperature variation is given which is smaller than a difference between the calculated average temperature and an average temperature before the predetermined period.

Assignees

Inventors

Classifications

  • Temperature monitoring · CPC title

  • using electrostatic chucks · CPC title

  • Maintaining constant desired temperature · CPC title

  • Other variables, e.g. energy, mass, velocity, time, temperature · CPC title

  • Inspection and quality control of devices · CPC title

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What does patent US9601307B2 cover?
The present invention provides a high-throughput scanning electron microscope in which a wafer ( 9 ) is held by an electrostatic chuck ( 10 ), an image is obtained using an electron beam, and the wafer surface is measured, wherein even in a case where the temperature of the wafer ( 9 ) is changed due to the environmental temperature the electron scanning microscope is capable of preventing any …
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/20. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).