Amino sulfonic acid based polymers for copper electroplating

US9598786B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9598786-B2
Application numberUS-201614994211-A
CountryUS
Kind codeB2
Filing dateJan 13, 2016
Priority dateDec 30, 2014
Publication dateMar 21, 2017
Grant dateMar 21, 2017

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Amino sulfonic acid based polymers are reaction products of amino sulfonic acids, an amine, polyepoxide compounds and epihalohydrin. The polymers may be used as levelers in copper electroplating baths, to provide good throwing power. Such reaction products may plate copper or copper alloys with good surface properties and good physical reliability.

First claim

Opening claim text (preview).

What is claimed is: 1. A method comprising: a) providing a substrate; b) providing a composition comprising one or more sources of copper ions, optionally one or more sources of tin ions, an electrolyte and a reaction product comprising: one or more amino sulfonic acids or salts thereof having a formula: wherein X comprises hydrogen or an alkali metal ion; R′ comprises hydrogen, hydroxyl, linear or branched (C 1 -C 5 )alkyl, hydroxy(C 1 -C 5 )alkyl, or substituted or unsubstituted aryl; R comprises linear, branched, substituted or unsubstituted (C 1 -C 20 )alkylene moiety, substituted or unsubstituted (C 5 -C 10 )alicyclic, or substituted or unsubstituted aromatic moiety of 6 to 18 carbons, one or more amines, one or more polyepoxides and one or more epihalohydrins; c) contacting the substrate with the composition; d) applying a current to the substrate and the composition; and e) depositing a copper or copper/tin alloy on the substrate. 2. The method of claim 1 wherein the substrate comprises a plurality of one or more of through-holes, trenches and vias. 3. The method of claim 1 , wherein the one or more polyepoxides is chosen from 1,4-butanediol diglycidyl ether, ethylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, triethylene glycol diglycidyl ether, glycerol diglycidyl ether, neopentyl glycol diglycidyl ether, propylene glycol diglycidyl ether, dipropylene glycol diglycidyl ether, poly(ethyleneglycol) diglycidyl ether and poly(propyleneglycol) diglycidyl ether. 4. The method of claim 1 , wherein the one or more polyepoxides are chosen from glycerin triglycidyl ether, trimethylolpropanetriglycidyl ether, diglycerol tetraglycidyl ether, erythritol tetraglycidyl ether, arabinose tetraglycidyl ether, triglycerol pentaglycidyl ether, fructose pentaglycidyl ether, xylitol pentaglycidyl ether, tetraglycerol hexaglycidyl ether, and sorbitol hexaglycidyl ether. 5. The method of claim 1 , wherein the one or more polyepoxides are chosen from dicyclopentadiene dioxide and 1,2,5,6-diepoxycyclooctane. 6. The method of claim 1 , wherein the one or more epihalohydrins have a general formula: where Y is chosen from hydrogen or (C 1 -C 4 )alkyl, X′ is a halogen selected from the group consisting of chlorine, bromine, fluorine and iodine.

Assignees

Inventors

Classifications

  • C25D3/38Primary

    of copper · CPC title

  • Amines · CPC title

  • by direct electroplating · CPC title

  • containing more than 50% by weight of copper · CPC title

  • containing other elements (organic compounds containing halogens only as halides of a carboxyl group C08G65/332) · CPC title

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What does patent US9598786B2 cover?
Amino sulfonic acid based polymers are reaction products of amino sulfonic acids, an amine, polyepoxide compounds and epihalohydrin. The polymers may be used as levelers in copper electroplating baths, to provide good throwing power. Such reaction products may plate copper or copper alloys with good surface properties and good physical reliability.
Who is the assignee on this patent?
Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification C25D3/38. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).