Methods and apparatus for nanofabrication using a pliable membrane mask

Patent metadata

Field	Value
Publication number	US-9588416-B2
Application number	US-201414537304-A
Country	US
Kind code	B2
Filing date	Nov 10, 2014
Priority date	Jun 26, 2014
Publication date	Mar 7, 2017
Grant date	Mar 7, 2017

Abstract

Apparatus for nanofabrication on an unconventional substrate including a patterned pliable membrane mechanically coupled to a membrane support structure, a substrate support structure to receive a substrate for processing, and an actuator to adjust the distance between the pliable membrane and the substrate. Nanofabrication on conventional and unconventional substrates can be achieved by transferring a pre-formed patterned pliable membrane onto the substrate using a transfer probe or non-stick sheet, followed by irradiating the substrate through the patterned pliable membrane so as to transfer the pattern on the pliable membrane into or out of the substrate. The apparatus and methods allow fabrication of diamond photonic crystals, fiber-integrated photonic devices and Nitrogen Vacancy (NV) centers in diamonds.

First claim

What is claimed is:

1. A nanofabrication apparatus comprising:
a pliable membrane having an edge, a first surface, a second surface, and a thickness of about 100 nm to about 1 μm, the pliable membrane being patterned to selectively transmit radiation incident on the first surface;
a membrane support structure, mechanically coupled to the edge of the pliable membrane via at least one anchor point, to hold the pliable membrane;
a substrate support structure, disposed opposite the second surface of the pliable membrane, to receive a substrate; and
an actuator, operably coupled to at least one of the membrane support structure or the substrate support structure, to position the membrane support structure relative to the substrate support structure,
wherein the membrane support structure defines a cavity to hold a liquid to float the pliable membrane.

2. The nanofabrication apparatus of claim 1 , wherein the pliable membrane has an aspect ratio equal to or greater than 10,000.

3. The nanofabrication apparatus of claim 1 , wherein the pliable membrane comprises silicon.

4. The nanofabrication apparatus of claim 1 , wherein the pliable membrane comprises:
a first layer patterned with a plurality of slits, at least one slit having an inner surface; and
a conformal coating layer deposited on the inner surface of the at least one slit to decrease a width of the at least one slit.

5. The nanofabrication apparatus of claim 4 , wherein the first layer of the pliable membrane comprises silicon.

6. The nanofabrication apparatus of claim 4 , wherein the conformal coating layer comprises at least one of aluminum oxide, hafnium oxide, tantalum oxide, and silicon dioxide.

7. The nanofabrication apparatus of claim 4 , wherein the at least one slit has a minimum width of about 1.2 nm.

8. The nanofabrication apparatus of claim 4 , wherein the at least one slit has a depth-to-width ration equal to or greater than 100.

9. The nanofabrication apparatus of claim 1 , wherein the second surface of the pliable membrane has a surface roughness of about 10 nm to about 500 nm to prevent the second surface of the pliable membrane from adhering to the substrate.

10. The nanofabrication apparatus of claim 1 , wherein the liquid comprises at least one of water, ethanol, and isopropyl alcohol.

11. A nanofabrication apparatus comprising:
a pliable membrane having an edge, a first surface, a second surface, and a thickness of about 100 nm to about 1 μm, the pliable membrane being patterned to selectively transmit radiation incident on the first surface;
a membrane support structure, mechanically coupled to the edge of the pliable membrane via at least one anchor point, to hold the pliable membrane;
a substrate support structure, disposed opposite the second surface of the pliable membrane, to receive a substrate; and
an actuator, operably coupled to at least one of the membrane support structure or the substrate support structure, to position the membrane support structure relative to the substrate support structure,
wherein the actuator comprises a coil, electromagnetically coupled to at least one of the membrane support structure or the substrate support structure, to position the membrane support structure relative to the substrate support structure via an electromagnetic force.

12. A nanofabrication apparatus comprising:
a pliable membrane having an edge, a first surface, a second surface, and a thickness of about 100 nm to about 1 μm, the pliable membrane being patterned to selectively transmit radiation incident on the first surface;
a membrane support structure, mechanically coupled to the edge of the pliable membrane via at least one anchor point, to hold the pliable membrane;
a substrate support structure, disposed opposite the second surface of the pliable membrane, to receive a substrate; and
an actuator, operably coupled to at least one of the membrane support structure or the substrate support structure, to position the membrane support structure relative to the substrate support structure,
wherein the actuator comprises a magnet, in magnetic communication with at least one of the membrane support structure or the substrate support structure, to position the membrane support structure relative to the substrate support structure via a magnetic force.

13. The nanofabrication apparatus of claim 1 , further comprising:
at least one spacer, disposed between the second surface of the pliable membrane and a substrate, to support the pliable membrane on a surface of the substrate.

14. The nanofabrication apparatus of claim 13 , wherein the at least one spacer has a height of about 10 nm to about 5 μm.

15. A nanofabrication method, comprising:
A) providing a target substrate on a substrate support structure;
B) disposing a pre-formed pliable membrane onto the target substrate, wherein the pre-formed pliable membrane has an edge, a first surface, a second surface, and a thickness from about 100 nm to about 1 μm and is patterned to selectively transmit incident radiation;
C) coupling the edge of the pre-formed pliable membrane to a membrane support structure via at least one anchor point, the membrane support structure holding the pre-formed pliable membrane such that the second surface of the pre-formed pliable membrane is opposite the target substrate;
D) positioning the membrane support structure relative to the substrate support structure with an actuator operably coupled to at least one of the membrane support structure or the substrate support structure; and
E) irradiating the pre-formed pliable membrane so as to selectively irradiate a surface of the target substrate,
wherein the membrane support structure defines a cavity to hold a liquid to float the pliable membrane.

16. The nanofabrication method of claim 15 wherein B) comprises:
disposing a non-stick sheet beneath the membrane support structure;
etching away the membrane support structure so as to lower the pre-formed pliable membrane down to the non-stick sheet; and
aligning the non-stick sheet with the target substrate and pressing down to release the pliable membrane onto the target substrate.

17. The nanofabrication method of claim 16 wherein the non-stick sheet comprises polytetrafluoroethylene.

18. The nanofabrication method of claim 16 , wherein the membrane support structure comprises silicon oxide.

19. The nanofabrication method of claim 15 , wherein the surface of the target substrate has a surface roughness greater than 100 nm.

20. The nanofabrication method of claim 15 , wherein the surface of the target substrate is curved.

21. The nanofabrication method of claim 15 , wherein the target substrate comprises at least one of diamond, lithium niobate, and silicon oxide.

22. The nanofabrication method of claim 21 , wherein the target substrate has a thickness less than 300 nm and an aspect ratio greater than 1000.

23. The nanofabrication method of claim 22 , wherein an etch-resistant coating is deposited on the pre-formed pliable membrane to extend a lifetime of the pre-formed pliable membrane.

24. The nanofabrication method of claim 23 , wherein the etch-resistant coating comprises at least one of Chromium or Aluminum Oxide.

25. The nanofabrication method of claim 15 , wherein E) comprises irradiating the pre-formed pliable membrane with an ion beam so as to implant at least one ion in the target substrate.

26. The nanofabricat

Assignees

• Englund Dirk Robert
• Bayn Igal
• Li Luozhou
• Univ Columbia

Inventors

• Englund Dirk Robert
• Bayn Igal
• Li Luozhou

Classifications

• C23C14/58

  After-treatment · CPC title

• G01Q80/00

  Applications, other than SPM, of scanning-probe techniques (manufacture or treatment of nanostructures B82B3/00; recording or reproducing information using near-field interaction G11B9/12, G11B11/24, G11B13/08) · CPC title

• C09K13/00

  Etching, surface-brightening or pickling compositions (for glass C03C15/00, {C03C25/66; for mortars, concrete, artificial or natural stone or ceramics C04B41/5338}; for metallic material C23F, C23G1/00, C25F1/00; {for semi-conductors H10P52/40}) · CPC title

• C23C16/487

  using electron radiation · CPC title

• C23C16/486

  using ion beam radiation · CPC title