Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

Patent metadata

Field	Value
Publication number	US-9454079-B2
Application number	US-201414271606-A
Country	US
Kind code	B2
Filing date	May 7, 2014
Priority date	Nov 7, 2011
Publication date	Sep 27, 2016
Grant date	Sep 27, 2016

Abstract

According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including
(A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

First claim

What is claimed is:

1. An actinic ray- or radiation-sensitive resin composition comprising:
(A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and
(B) a resin,

wherein
X represents a bivalent group containing an oxygen atom, a sulfur atom or a nitrogen atom, which bivalent group is connected to S + to thereby form a cyclic structure;
R 1 represents an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, an aryl group or an alkenyl group;
each of R 2 and R 3 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, provided that R 2 and R 3 may be connected to each other to thereby form a ring, and that at least one of R 2 and R 3 is an alkyl group, a cycloalkyl group or an aryl group;
provided that R 1 and R 2 may be connected to each other to thereby form a ring; and
Z − represents a sulfonate anion represented by a general formula (2) below or a disulfonylimidate anion represented by a general formula (2′) below,

wherein
each Xfs independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom;
L represents a single bond or a bivalent connecting group;
A represents an organic group with a cyclic structure; and
x is an integer of 1 to 20,

wherein
Xf is as defined above in the general formula (2), provided that two Xfs may be connected to each other to thereby form a cyclic structure.

2. The actinic ray- or radiation-sensitive resin composition according to claim 1 , wherein in the general formula (1), X contains an oxygen atom or a group represented by >N—SO 2 —R 4 in which R 4 represents an alkyl group, a cycloalkyl group or an aryl group.

3. The actinic ray- or radiation-sensitive resin composition according to claim 1 , wherein the compound represented by the general formula (1) is represented by general formulae (1a) or (1b) below,

wherein
R 1 , R 2 and R 3 are as defined above in claim 1 ;
Y represents an oxygen atom, a sulfur atom or a nitrogen atom;
R 5 represents an electron withdrawing group when Y is a nitrogen atom and is not in existence when Y is an oxygen atom or a sulfur atom; and
each of m, n, p and q is an integer of 0 to 3.

4. The actinic ray- or radiation-sensitive resin composition according to claim 3 , wherein in the general formula (1a), Y is an oxygen atom or a nitrogen atom, provided that when Y is a nitrogen atom, R 5 is a group represented by —SO 2 —R 4 , in which R 4 represents an alkyl group, a cycloalkyl group or an aryl group.

5. The actinic ray- or radiation-sensitive resin composition according to claim 1 , wherein the resin (B) is a resin that is decomposed by an action of the acid to thereby increase its solubility in an alkali developer.

6. The actinic ray- or radiation-sensitive resin composition according to claim 1 , wherein the resin (B) contains at least one of repeating units represented by a general formula (3) below and a lactone structure,

wherein
R 8 represents a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms;
R 9 represents a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms; and
n is an integer of 1 to 6.

7. An actinic ray- or radiation-sensitive film comprising the actinic ray- or radiation-sensitive resin composition according to claim 1 .

8. A method of forming a pattern, comprising:
forming the actinic ray- or radiation-sensitive film containing the actinic ray- or radiation-sensitive resin composition according to claim 1 ;
exposing the film to the actinic rays or radiation, and
developing the exposed film.

9. The method according to claim 8 , wherein the exposure is an ArF liquid-immersion exposure.

10. A process for manufacturing an electronic device, comprising the method according to claim 8 .

11. The actinic ray- or radiation-sensitive resin composition according to claim 1 , wherein the anion Z − in general formula (1) is a sulfonate anion represented by general formula (2) and A general formula (2) is a alicyclic group having a polycyclic structure.

Assignees

• Fujifilm Corp

Inventors

• Shibuya Akinori
• Tokugawa Yoko
• Matsuda Tomoki
• Ito Junichi
• Kataoka Shohei
• Fukuhara Toshiaki
• Tango Naohiro
• Iwato Kaoru
• Yoshidome Masahiro
• Sugiyama Shinichi

Classifications

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• C07C303/32

  of salts of sulfonic acids · CPC title

• C07C309/04

  containing only one sulfo group · CPC title

• G03F7/038 Primary

  Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title