Composition for forming silver ion diffusion-suppressing layer, film for silver ion diffusion-suppressing layer, circuit board, electronic device, conductive film laminate, and touch panel

Patent metadata

Field	Value
Publication number	US-9578732-B2
Application number	US-201414467680-A
Country	US
Kind code	B2
Filing date	Aug 25, 2014
Priority date	Feb 28, 2012
Publication date	Feb 21, 2017
Grant date	Feb 21, 2017

Abstract

A composition for forming a silver ion diffusion-suppressing layer includes an insulating resin and a compound including: a structure selected from the group consisting of a triazole structure, a thiadiazole structure and a benzimidazole structure; a mercapto group; and at least one hydrocarbon group optionally containing a heteroatom, with the total number of carbon atoms in the hydrocarbon group or groups being 5 or more. The composition for forming a silver ion diffusion-suppressing layer allows formation of a silver ion diffusion-suppressing layer capable of suppressing silver ion migration between metal interconnects containing silver or a silver alloy to improve the reliability on the insulation between the metal interconnects.

First claim

What is claimed is:

1. A composition for forming a silver ion diffusion-suppressing layer, comprising:
an insulating resin; and
a compound including: a structure selected from the group consisting of a triazole structure, a thiadiazole structure and a benzimidazole structure; a mercapto group; and at least one hydrocarbon group optionally containing a heteroatom, with a total number of carbon atoms in the at least one hydrocarbon group being 5 or more,
wherein the compound is a compound represented by one of formulae (1) to (3):

[in formula (1), R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group optionally containing a heteroatom; at least one of R 1 and R 2 represents the hydrocarbon group; and a total number of carbon atoms contained in groups R 1 and R 2 is 5 or more, where at least one of R 1 and R 2 represents an aliphatic hydrocarbon group optionally containing a heteroatom;
in formula (2), R 3 represents a hydrocarbon group optionally containing a heteroatom and a number of carbon atoms contained in R 3 is 5 or more, where R 3 represents an aliphatic hydrocarbon group optionally containing a heteroatom; and
in formula (3), R 4 to R 7 each independently represent a hydrogen atom, a halogen atom or a hydrocarbon group optionally containing a heteroatom; at least one of R 4 to R 7 represents the hydrocarbon group; and a total number of carbon atoms contained in groups R 4 to R 7 is 5 or more, where at least one of R 4 to R 7 represents an aliphatic hydrocarbon group optionally containing a heteroatom].

2. The composition for forming a silver ion diffusion-suppressing layer according to claim 1 , wherein the at least one hydrocarbon group is a hydrocarbon group containing a tertiary carbon atom and/or a quaternary carbon atom.

3. The composition for forming a silver ion diffusion-suppressing layer according to claim 1 , wherein the at least one hydrocarbon group is a hydrocarbon group which contains at least one type of group represented by one formula selected from the group consisting of formulae (B-1) to (B-7):

[in formulae (B-1) to (B-7), groups X a are each an atom selected from the group consisting of oxygen atom, sulfur atom, selenium atom and tellurium atom; the groups X a may be identical to or different from each other; groups X b are each an oxygen atom or a sulfur atom; the groups X b may be identical to or different from each other; and asterisks represent binding positions] and which is optionally bonded directly to the structure selected from the group consisting of the triazole structure, the thiadiazole structure and the benzimidazole structure at one of the asterisks in formulae (B-1) to (B-7).

4. The composition for forming a silver ion diffusion-suppressing layer according to claim 1 , wherein the at least one hydrocarbon group is a group represented by —S—R q [where R q represents a hydrocarbon group containing 1 to 30 carbon atoms which may have —COO— or —CON<].

5. A film for a silver ion diffusion-suppressing layer, comprising:
an insulating resin; and
a compound including: a structure selected from the group consisting of a triazole structure, a thiadiazole structure and a benzimidazole structure; a mercapto group; and at least one hydrocarbon group optionally containing a heteroatom, with a total number of carbon atoms in the at least one hydrocarbon group being 5 or more,
wherein the compound is a compound represented by one of formulae (1) to (3):

[in formula (1), R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group optionally containing a heteroatom; at least one of R 1 and R 2 represents the hydrocarbon group; and a total number of carbon atoms contained in groups R 1 and R 2 is 5 or more, where at least one of R 1 and R 2 represents an aliphatic hydrocarbon group optionally containing a heteroatom;
in formula (2), R 3 represents a hydrocarbon group optionally containing a heteroatom and a number of carbon atoms contained in R 3 is 5 or more, where R 3 represents an aliphatic hydrocarbon group optionally containing a heteroatom; and
in formula (3), R 4 to R 7 each independently represent a hydrogen atom, a halogen atom or a hydrocarbon group optionally containing a heteroatom; at least one of R 4 to R 7 represents the hydrocarbon group; and a total number of carbon atoms contained in groups R 4 to R 7 is 5 or more, where at least one of R 4 to R 7 represents an aliphatic hydrocarbon group optionally containing a heteroatom].

6. The film for a silver ion diffusion-suppressing layer according to claim 5 , wherein the at least one hydrocarbon group is a hydrocarbon group containing a tertiary carbon atom and/or a quaternary carbon atom.

7. The film for a silver ion diffusion-suppressing layer according to claim 5 , wherein the at least one hydrocarbon group is a hydrocarbon group which contains at least one type of group represented by one formula selected from the group consisting of formulae (B-1) to (B-7):

[in formulae (B-1) to (B-7), groups X a are each an atom selected from the group consisting of oxygen atom, sulfur atom, selenium atom and tellurium atom; the groups X a may be identical to or different from each other; groups X b are each an oxygen atom or a sulfur atom; the groups X b may be identical to or different from each other; and asterisks represent binding positions] and which is optionally bonded directly to the structure selected from the group consisting of the triazole structure, the thiadiazole structure and the benzimidazole structure at one of the asterisks in formulae (B-1) to (B-7).

8. The film for a silver ion diffusion-suppressing layer according to claim 5 , wherein the at least one hydrocarbon group is a group represented by —S—R q [where R q represents a hydrocarbon group containing 1 to 30 carbon atoms which may have —COO— or —CON<].

9. A circuit board comprising: an insulating substrate; metal interconnects disposed on the insulating substrate and containing silver or a silver alloy; and a silver ion diffusion-suppressing layer disposed on the metal interconnects,
wherein the silver ion diffusion-suppressing layer comprises an insulating resin and a compound including: a structure selected from the group consisting of a triazole structure, a thiadiazole structure and a benzimidazole structure; a mercapto group; and at least one hydrocarbon group bonded to the structure and optionally containing a heteroatom, with a total number of carbon atoms in the at least one hydrocarbon group being 5 or more,
wherein the compound is a compound represented by one of formulae (1) to (3):

[in formula (1), R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group optionally containing a heteroatom; at least one of R 1 and R 2 represents the hydrocarbon group; and a total number of carbon atoms contained in groups R 1 and R 2 is 5 or more, where at least one of R 1 and R 2 represents an aliphatic hydrocarbon group optionally containing a heteroatom;
in formula (2), R 3 represents a hydrocarbon group optionally containing a heteroatom and a number of carbon atoms contained in R 3 is 5 or more, where R 3 represents

Assignees

• Fujifilm Corp

Inventors

• Mitamura Yasuhiro
• Nakayama Masaya
• Matsunami Yuki

Classifications

• B32B27/283

  comprising polysiloxanes · CPC title

• B32B2307/412

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• B32B2260/021

  Fibrous or filamentary layer · CPC title

• B32B2262/101

  Glass fibres · CPC title

• H05K2201/0769

  Anti metal-migration, e.g. avoiding tin whisker growth · CPC title