Imprint method and imprint system

Patent metadata

Field	Value
Publication number	US-9541847-B2
Application number	US-201213529617-A
Country	US
Kind code	B2
Filing date	Jun 21, 2012
Priority date	Jul 21, 2011
Publication date	Jan 10, 2017
Grant date	Jan 10, 2017

Abstract

According to one embodiment, an imprint method comprises coating a photo-curable organic material on a film to be processed, bringing a concave-convex pattern of a template into contact with the photo-curable organic material, applying a force to the template in such a state that the template is brought into contact with the photo-curable organic material, curing the photo-curable organic material by irradiating light onto the photo-curable organic material, in such a state that the template is brought into contact with the photo-curable organic material, and releasing the template from the photo-curable organic material after the light irradiation. The force applied to the template corresponds to a gap between a surface of the film to be processed and the template.

First claim

What is claimed is:

1. An imprint method comprising:
coating a first photo-curable organic material on a first film;
bringing a concave-convex pattern of a template into contact with the first photo-curable organic material having a first residual film thickness corresponding to a gap between a surface of the first film and the template;
applying a first force to side surfaces of the template;
creating a relation between the first force and the first residual film thickness;
coating a second photo-curable organic material on a second film to be processed;
bringing the concave-convex pattern of the template into contact with the second photo-curable organic material;
applying a second force to side surfaces of the template to correct a shape of the template, based on the relation between the first force and the first residual film thickness, in such a state that the template is brought into contact with the second photo-curable organic material;
curing the second photo-curable organic material by irradiating light onto the second photo-curable organic material, in such a state that the template is brought into contact with the second photo-curable organic material; and
releasing the template from the second photo-curable organic material after the light irradiation;
wherein the method further comprises:
before coating the second photo-curable organic material, coating a third photo-curable organic material on the first film;
bringing the concave-convex pattern of the template into contact with the third photo-curable organic material, the third photo-curable organic material having a second residual film thickness corresponding to a gap between the surface on the first film and the template;
applying a third force to the side surfaces of the template; and
creating a relation between the third force and the third residual film thickness,
wherein the second force is applied to the side surfaces of the template, based on the relation between the first force and the first residual film thickness and on the relation between the third force and the third residual film thickness.

2. The imprint method according to claim 1 ,
wherein an amount of the third photo-curable organic material is different from an amount of the first photo-curable organic material.

3. The imprint method according to claim 1 ,
wherein the template has a first side surface, a second side surface, a third side surface and a fourth side surface,
wherein the first to the third forces are applied to the first to fourth side surfaces.

4. An imprint method comprising:
coating a first photo-curable organic material on a first film;
bringing a concave-convex pattern of a template into contact with the first photo-curable organic material having a first residual film thickness corresponding to a distance between a surface of the first film and a surface of a concave portion of the first photo-curable organic material;
applying a first force to side surfaces of the template;
creating a relation between the first force and the first residual film thickness;
coating a second photo-curable organic material on a second film to be processed;
bringing the concave-convex pattern of the template into contact with the second photo-curable organic material;
applying a second force to side surfaces of the template, based on the relation between the first force and the first residual film thickness, in such a state that the template is brought into contact with the second photo-curable organic material;
curing the second photo-curable organic material by irradiating light onto the second photo-curable organic material, in such a state that the template is brought into contact with the second photo-curable organic material; and
releasing the template from the second photo-curable organic material after the light irradiation;
wherein the method further comprises:
before coating the second photo-curable organic material, coating a third photo-curable organic material on the first film;
bringing the concave-convex pattern of the template into contact with the third photo-curable organic material, the third photo-curable organic material having a second residual film thickness corresponding to a distance between the surface of the first film and a surface of a concave portion of the third photo-curable organic material;
applying a third force to the side surfaces of the template; and
creating a relation between the third force and the third residual film thickness,
wherein the second force is applied to the side surfaces of the template, based on the relation between the first force and the first residual film thickness and on the relation between the third force and the third residual film thickness.

5. The imprint method according to claim 4 ,
wherein an amount of the third photo-curable organic material is different from an amount of the first photo-curable organic material.

Assignees

• Suzuki Masato
• Kono Takuya
• Takakuwa Manabu
• Fukuhara Kazuya
• Toshiba Kk

Inventors

• Suzuki Masato
• Kono Takuya
• Takakuwa Manabu
• Fukuhara Kazuya

Classifications

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F9/7042 Primary

  Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting (non-exposure lithographic processes per se G03F7/0002) · CPC title

• B29C2043/025

  forming a microstructure, i.e. fine patterning · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title