Microlithographic projection exposure apparatus

Patent metadata

Field	Value
Publication number	US-9535336-B2
Application number	US-201414285094-A
Country	US
Kind code	B2
Filing date	May 22, 2014
Priority date	Sep 30, 2008
Publication date	Jan 3, 2017
Grant date	Jan 3, 2017

Abstract

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

First claim

What is claimed is:

1. An optical system, comprising:
a mirror array, comprising:
a base body;
a plurality of mirror units supported by the base body, each mirror unit comprising:
a mirror; and
a solid-state articulation comprising first and second articulation parts, each articulation part connecting the mirror to the base body, each articulation part being capable of bending in a plane of bending, and each articulation part being subdivided into a plurality of articulation elements that are spaced apart from each other in the plane of bending to reduce a flexural stiffness of the at least two articulation parts; and

a control device configured to modify an orientation of the mirror relative to the base body,
wherein the optical system is a projection objective of a microlithographic projection exposure apparatus or an illumination system of a microlithographic projection exposure apparatus.

2. The optical system of claim 1 , wherein, for each mirror unit, the articulation elements of each of the first and second articulation parts extend at least substantially parallel to each other.

3. The optical system of claim 1 , wherein the articulation elements comprise rods.

4. The optical system of claim 1 , wherein the articulation elements comprise plates.

5. The optical system of claim 1 , wherein the first and second articulation parts are arranged on opposite sides of a plane of symmetry of the mirror.

6. The optical system of claim 5 , wherein the first and second articulation parts are arranged mirror symmetrically with respect to the plane of symmetry of the mirror.

7. The optical system of claim 1 , wherein each mirror unit comprises flexible thermal conduction elements extending between the mirror and the base body.

8. The optical system of claim 1 , wherein at least a portion of the control device is arranged between the first and second articulation parts.

9. The optical system of claim 1 , further comprising a third articulation part between first and second articulation parts, wherein the third articulation part is shorter, but thicker than the articulation elements.

10. The optical system of claim 1 , wherein the mirror is configured to swivel about a swivel axis that lies at least substantially in a reflection surface of the mirror.

11. The optical system of claim 1 , wherein each mirror unit comprises a sensor device configured to determine the orientation of the mirror with respect to the base body.

12. The optical system of claim 1 , wherein the mirror is configured to reflect light having a wavelength shorter than 25 nm.

13. The optical system of claim 12 , wherein the mirror is configured to reflect light having a wavelength of about 13.5 nm.

14. An apparatus, comprising:
the optical system of claim 1 ,
wherein the apparatus is a projection exposure apparatus.

15. The apparatus of claim 14 , further comprising a light source configured to produce light having a wavelength shorter than 25 nm.

16. The projection exposure apparatus of claim 15 , wherein the light source is configured to produce light having a wavelength of about 13.5 nm.

17. An optical system, comprising:
a mirror;
a base body;
a solid-state articulation connecting the mirror to the base body; and
a control device configured to modify an orientation of the mirror relative to the base body,
wherein:
the solid-state articulation is subdivided into a plurality of mutually parallel articulation elements that are rod-shaped or plate-shaped;
the articulation elements are spaced apart from each other in a plane of bending to reduce a flexural stiffness of the solid-state articulation;
a portion of the control device is arranged between at least two of the articulation elements;
the portion of the control device is configured to contactlessly exert electromagnetic forces on the mirror; and
the optical system is a projection objective of a microlithographic projection exposure apparatus or an illumination system of a microlithographic projection exposure apparatus.

18. A method, comprising:
providing a mirror array comprising a base body and a plurality of mirror units supported by the base body, each mirror unit comprising a mirror and an articulation part that connects the mirror to the base body,
determining a target flexural stiffness that for the articulation part;
determining a target thermal conductivity that for the articulation part;
determining a total cross section that the articulation part should have to achieve the target thermal conductivity; and
determining a number of mutually separated articulation elements which define the articulation part so that an entirety of all articulation elements has the target flexural stiffness and the total cross section.

19. The method of claim 18 , wherein the articulation elements defining the articulation part extend at least substantially parallel to each other.

20. The method of claim 18 , wherein the articulation elements comprise rods.

21. The method of claim 18 , wherein the articulation elements comprise plates.

22. The method of claim 18 , wherein each mirror unit comprises a control device configured to modify an orientation of the mirror relative to the base body.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Bleidistel Sascha
• Kwan Yim-Bun Patrick
• Bach Florian
• Benz Daniel
• Waldis Severin
• Werber Armin

Classifications

• G03F7/70116

  Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets · CPC title

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G03F7/702 Primary

  Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems · CPC title

• G03F7/70891

  Temperature · CPC title

• G03F7/70291

  Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices · CPC title