Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

Patent metadata

Field	Value
Publication number	US-9516730-B2
Application number	US-201113156188-A
Country	US
Kind code	B2
Filing date	Jun 8, 2011
Priority date	Jun 8, 2011
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.

First claim

We claim:

1. An extreme-ultraviolet (EUV) light source comprising;
an optic;
a target material;
an EUV mirror having an aperture;
a laser beam passing through said optic along a beam path to irradiate said target material, wherein said optic represents focusing optic to define a focal spot of said laser beam along said beam path; and
a system generating a gas flow directed through said aperture toward said target material along said beam path, said as flow being substantially turbulent-free, said system having a tapering member surrounding a volume and a plurality of gas lines, said tapering member having a small end disposed toward said aperture and a large end disposed opposite said small end to produce substantially turbulent-free flow in a portion of said volume toward said aperture, wherein at least said portion of said volume is disposed between said EUV mirror and said optic, said optic is disposed along said beam path between said large end and said small end within said volume and each gas line of said plurality of gas lines input a gas into said volume from said large end of said tapering member.

2. The light source as recited in claim 1 wherein said member has an inner wall and further comprising a plurality of flow guides projecting from said inner wall.

3. The light source as recited in claim 1 wherein said optic is a window.

4. The light source as recited in claim 1 wherein said optic is a lens focusing said beam to a focal spot on said beam path.

5. The light source as recited in claim 1 wherein said tapering member surrounds said beam path.

6. The light source as recited in claim 1 wherein said gas flow comprises a gas selected from the group of gases consisting of hydrogen (protium), hydrogen (deuterium) and hydrogen (tritium).

7. The light source as recited in claim 1 wherein said tapering member does not extend into said laser beam.

8. The light source as recited in claim 1 wherein said gas flow has a flow magnitude exceeding 40 standard cubic liters per minute (sclm).

9. The light source as recited in claim 1 further comprising a droplet generator producing a stream of target material droplets.

10. The light source as recited in claim 1 wherein said optic is a lens having a diameter greater than 150 mm.

11. An extreme-ultraviolet (EUV) light source comprising;
an optic;
a target material;
an EUV mirror having an aperture;
a laser beam passing through said optic along a beam path to irradiate said target material, wherein said optic represents focusing optic to define a focal spot of said laser beam along said beam path; and
a system generating a gas flow directed through said aperture toward said target material along said beam path, said gas flow being substantially turbulent-free, said system having a tapering guide member having an inner wall surrounding a volume, at least one gas line outputting a gas stream into said volume and a plurality of flow guides projecting from said inner wall, said tapering guide member having a small end disposed toward said aperture and a large end disposed opposite said small end to produce substantially turbulent-free flow in a portion of said volume toward said aperture, wherein at least said portion of said volume is disposed between said EUV mirror and said optic, said optic is disposed along said beam path between said large end and said small end within said volume and said gas stream is flowed into said volume from said large end of said tapering guide member.

12. The light source as recited in claim 11 wherein said optic is a window.

13. The light source as recited in claim 11 wherein said optic is a lens focusing said beam to a focal spot on said beam path.

14. The light source as recited in claim 11 wherein said gas flow has a flow magnitude exceeding 40 standard cubic liters per minute (sclm).

15. The light source as recited in claim 11 wherein said optic is a lens having a diameter greater than 150 mm.

16. A method for producing an extreme-ultraviolet (EUV) light output, said method comprising the acts of;
providing an optic;
providing a target material;
providing an EUV mirror having an aperture;
passing a laser beam through said optic along a beam path to irradiate said target material, wherein said optic represents focusing optic to define a focal spot of said laser beam along said beam path; and
generating a gas flow directed through said aperture toward said target material along said beam path, said gas flow being substantially turbulent-free, said system having a tapering guide member having an inner wall surrounding a volume, at least one gas line outputting a gas stream into said volume and a plurality of flow guides projecting from said inner wall, said tapering guide member having a small end disposed toward said aperture and a large end disposed opposite said small end to produce substantially turbulent-free flow in a portion of said volume toward said aperture, wherein at least said portion of said volume is disposed between said EUV mirror and said optic, said optic is disposed along said beam path between said large end and said small end within said volume and said gas stream is flowed into said volume from said large end of said tapering guide member.

17. The method as recited in claim 16 wherein said optic is a window.

18. The method as recited in claim 16 wherein said optic is a lens focusing said beam to a focal spot on said beam path.

19. The method as recited in claim 16 wherein said gas flow has a flow magnitude exceeding 40 standard cubic liters per minute (sclm) and said optic is a lens having a diameter greater than 150 mm.

Assignees

• Fleurov Vladimir B
• Partlo William N
• Fomenkov Igor V
• Ershov Alexander I
• Asml Netherlands Bv

Inventors

• Fleurov Vladimir B
• Partlo William N
• Fomenkov Igor V
• Ershov Alexander I

Classifications

• H05G2/0086

  Optical arrangements for conveying the laser beam to the plasma generation location · CPC title

• H05G2/0027 Primary

  Arrangements for controlling the supply; Arrangements for measurements · CPC title

• H05G2/008

  involving an energy-carrying beam in the process of plasma generation · CPC title

• H05G2/005 Primary

  Electricity · mapped topic

• H05G2/00 Primary

  Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma (X-ray lasers H01S4/00) · CPC title