Deposition device including laser mask and deposition method using the same

Patent metadata

Field	Value
Publication number	US-9515296-B2
Application number	US-201514943619-A
Country	US
Kind code	B2
Filing date	Nov 17, 2015
Priority date	Apr 7, 2015
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

A deposition device including a chamber configured to accommodate a substrate supported on a stage, a deposition source configured to discharge material toward the substrate, and a laser mask system configured to form a laser mask between the substrate and the stage.

First claim

What is claimed is:

1. A deposition device, comprising:
a chamber configured to accommodate a substrate supported on a stage;
a deposition source configured to discharge material toward the substrate; and
a laser mask system configured to form a laser mask between the substrate and the stage to mask a portion of the substrate from discharged material via one or more laser beams.

2. The deposition device of claim 1 , wherein the laser mask system comprises:
a laser source configured to emit a first laser beam;
a multi-beam generator configured to split the first laser beam into multiple laser beams, the multiple laser beams comprising the one or more laser beams;
a lens unit configured to direct paths of the multiple laser beams; and
mirrors configured to redirect paths of the multiple laser beams to form the laser mask.

3. The deposition device of claim 2 , wherein the multi-beam generator comprises a diffraction grating configured to diffract the first laser beam into the multiple laser beams.

4. The deposition device of claim 2 , wherein the lens unit comprises an arrangement of lenses configured to focus and redirect the multiple laser beams to parallel paths.

5. The deposition device of claim 2 , wherein the laser mask is formed by the propagation of the multiple laser beams between the substrate and the stage.

6. The deposition device of claim 5 , wherein:
the multiple laser beams propagate from a first side of the substrate to a second side of the substrate; and
a width of the multiple laser beams corresponds to a width of a deposition area on the substrate.

7. The deposition device of claim 5 , wherein:
a pattern of the laser mask comprises a stripe formation of the multiple laser beams; and
a space between stripes of the stripe formation corresponds to a deposition area on the substrate.

8. The deposition device of claim 2 , wherein:
the laser mask system comprises multiple laser sources; and
the laser mask is formed according to propagation of multiple laser beams from the multiple sources.

9. The deposition device of claim 8 , wherein the mirrors are configured to cross paths of at least some of the multiple laser beams between the substrate and the stage.

10. The deposition device of claim 9 , wherein:
a pattern of the laser mask comprises a mesh formation of the multiple laser beams; and
a space in the mesh formation corresponds to a deposition area on the substrate.

11. The deposition device of claim 2 , wherein:
the substrate is spaced apart from the stage to form a propagation space; and
the laser mask system is configured to form the laser mask in the propagation space.

12. The deposition device of claim 11 , wherein the propagation space corresponds to a groove formed in a surface of the stage, the surface facing the substrate.

13. The deposition device of claim 12 , wherein:
the groove extends from a first side of the substrate to a second side of the substrate, the second side opposing the first side; and
a dimension of the groove between the first side of the substrate and the second side of the substrate corresponds to a dimension of the laser mask.

14. The deposition device of claim 1 , further comprising:
a laser-absorbing system configured to absorb laser propagation associated with the formation of the laser mask,
wherein the laser-absorbing system comprises:
a laser-absorber configured to receive the laser propagation; and
mirrors configured to direct a path of the laser propagation to the laser-absorber; and

wherein the laser-absorber comprises:
a housing;
an absorber supported by the housing, the absorber configured to absorb the laser propagation; and
a cooling portion configured to cool the housing.

15. The deposition device of claim 2 , further comprising:
a deposition source preheating system configured to preheat the deposition source with energy from the multiple laser beams, the deposition source preheating system comprising:
an optical element configured to change the pattern of the multiple laser beams; and
mirrors configured to direct a path of laser beam propagation through the optical element to the deposition source,

wherein the optical element is configured to change the pattern of the multiple laser beams to reduce hot spot generation associated with laser beam incidence on the deposition source.

16. A method, comprising:
causing, at least in part, a laser mask to be formed between a substrate and a stage in a deposition chamber, the stage supporting the substrate; and
causing, at least in part, a deposition material to be discharged from a deposition source toward the substrate,
wherein the deposition material is deposited on a first portion of the substrate according to a configuration of the laser mask, the configuration comprising a laser beam configured to mask a second portion of the substrate from the deposition material.

17. The method of claim 16 , wherein formation of the laser mask comprises:
causing, at least in part, one or more first laser beams to be split into multiple laser beams, the multiple laser beams comprising the laser beam;
causing, at least in part, the multiple laser beams to be focused; and
causing, at least in part, the focused multiple laser beams to propagate over a deposition area on the substrate.

18. The method of claim 17 , wherein:
the focused multiple laser beams propagate from a first side of the substrate to a second side of the substrate, the second side opposing the first side; and
the deposition material is deposited in the deposition area according to a space between propagation paths of the multiple laser beams.

19. The method of claim 17 , wherein:
some propagation paths of the focused multiple laser beams cross one another; and
the deposition material is deposited in the deposition area according to a space associated with crossing propagation paths of the focused multiple laser beams.

20. The method of claim 16 , further comprising:
causing, at least in part, laser propagation associated with formation of the laser mask to be absorbed.

Assignees

• Samsung Display Co Ltd

Inventors

• Han Jeongwon

Classifications

• H10K71/421

  using coherent electromagnetic radiation, e.g. laser annealing · CPC title

• H10K71/00

  Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

• C23C14/04 Primary

  Coating on selected surface areas, e.g. using masks · CPC title

• H01L51/56 Primary

  Electricity · mapped topic

• H01L51/0011

  Electricity · mapped topic