Multicathode deposition system and methods
US-12051576-B2 · Jul 30, 2024 · US
Vapor deposition mask, method for producing vapor deposition mask device and method for producing organic semiconductor element
US9108216B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9108216-B2 |
| Application number | US-201314371670-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 11, 2013 |
| Priority date | Jan 12, 2012 |
| Publication date | Aug 18, 2015 |
| Grant date | Aug 18, 2015 |
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Abstract
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A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.
First claim
Opening claim text (preview).
The invention claimed is: 1. A vapor deposition mask, wherein a metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask, and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked. 2. The vapor deposition mask according to claim 1 , wherein the metal mask is of a magnetic substance. 3. The vap…
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Chemistry & Metallurgy · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
- C23C14/042Primary
Chemistry & Metallurgy · mapped topic
Operations & Transport · mapped topic
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- What does patent US9108216B2 cover?
- A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor elem…
- Who is the assignee on this patent?
- Dainippon Printing Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 18 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).