Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
Substrate holder and method of manufacturing a substrate holder
US9507274B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9507274-B2 |
| Application number | US-201314373291-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 17, 2013 |
| Priority date | Feb 3, 2012 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
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Abstract
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An object holder ( 100 ) for a lithographic apparatus has a main body ( 400 ) having a surface ( 400 a ). A plurality of burls ( 406 ) to support an object are formed on the surface or in apertures of a thin-film stack ( 410, 440, 450 ). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method of manufacturing an object holder for use in a lithographic apparatus, the method comprising: providing a main body having a flat surface; and adding a majority of a body of a burl on the flat surface or adding a top layer to an existing burl of the flat surface, the burl projecting from the flat surface and having an end surface to support an object, wherein the majority of the burl body or top layer is formed by laser-sintering and wherein…
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Operations & Transport · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
- G03F7/70341Primary
Physics · mapped topic
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- What does patent US9507274B2 cover?
- An object holder ( 100 ) for a lithographic apparatus has a main body ( 400 ) having a surface ( 400 a ). A plurality of burls ( 406 ) to support an object are formed on the surface or in apertures of a thin-film stack ( 410, 440, 450 ). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously form…
- Who is the assignee on this patent?
- Asml Netherlands Bv
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70341. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).