Joining method and joining component

US9505084B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9505084-B2
Application numberUS-201214345031-A
CountryUS
Kind codeB2
Filing dateJul 10, 2012
Priority dateSep 22, 2011
Publication dateNov 29, 2016
Grant dateNov 29, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

In joining members to be joined ( 1, 1 ) by heating the members to be joined ( 1, 1 ) that are mated with intervening an insert ( 2 ) while applying opposing loads to the members to be joined ( 1, 1 ), so as to allow eutectic reaction to occur between the members to be joined ( 1, 1 ) and the insert ( 2 ) to discharge a eutectic melt from a joining plane along with an oxide film ( 1 a ) of the members to be joined, the members to be joined ( 1 ) are brought into contact with the insert ( 2 ) so that the oxide film ( 1 a ) is broken by a stress concentrating means previously provided at least one of joining portions breaks to produce a starting point of the eutectic reaction.

First claim

Opening claim text (preview).

The invention claimed is: 1. A joining method comprising: preparing two members to be joined, each of the two members to be joined having an oxide film disposed over a surface thereof, preparing an insert including an uneven structure for breaking an oxide film, the uneven structure including at least one protrusion having an aspect ratio of greater than or equal to 0.001, disposing the insert between the two members to be joined, applying pressure to the two members to be joined to break the oxide film of the two members to be joined with the uneven structure of the insert, and heating the two members to be joined to initiate a eutectic reaction between the two members to be joined and the insert, such that a eutectic melt produced by the eutectic reaction and the broken oxide film are discharged from between the two members to be joined. 2. The joining method according to claim 1 , wherein the protrusion comprises an approximately flat face. 3. The joining method according to claim 1 , wherein the protrusion comprises a linear shape. 4. The joining method according to claim 1 , wherein the protrusion comprises an approximately pointed shape. 5. The joining method according to claim 1 , wherein the protrusion comprises an approximately spherical shape. 6. The joining method according to claim 1 , wherein the uneven structure comprises a plurality of protrusions, and a height of the protrusions of the uneven structure is not less than a difference in vertical position of crests of all of the protrusions. 7. The joining method according to claim 1 , wherein the uneven structure has a pitch of 1 μm or more. 8. The joining method according to claim 7 , wherein the uneven structure has an aspect ratio of 0.1 or more and a pitch of 10 μm or more. 9. The joining method according to claim 1 , wherein the uneven structure comprises a plurality of protrusions with different shapes. 10. The joining method according to claim 1 , wherein preparing the insert comprises forming the uneven structure by plastic forming. 11. The joining method according to claim 1 , wherein the applied pressure is 30 MPa or less. 12. The joining method according to claim 1 , wherein the insert is made of foil material. 13. A component produced by the joining method according to claim 1 , wherein the two members to be joined are directly joined without an oxide film disposed between joined portions of the two members to be joined. 14. The component according to claim 13 , wherein a component derived from the insert is diffused in a vicinity of joining faces of the two members to be joined. 15. A joining structure produced by the joining method according to claim 1 , comprising: a direct joining portion disposed between the two members to be joined, and an indirect joining portion comprising a mixture of the oxide film of the two members to be joined and a product of the eutectic reaction, wherein the direct joining portion and the indirect joining portion are randomly located on a joining interface.

Assignees

Inventors

Classifications

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • the connected ends being wedge-shaped · CPC title

  • Die-attach connectors and bond wires · CPC title

  • B23K20/026Primary

    with diffusion of soldering material · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9505084B2 cover?
In joining members to be joined ( 1, 1 ) by heating the members to be joined ( 1, 1 ) that are mated with intervening an insert ( 2 ) while applying opposing loads to the members to be joined ( 1, 1 ), so as to allow eutectic reaction to occur between the members to be joined ( 1, 1 ) and the insert ( 2 ) to discharge a eutectic melt from a joining plane along with an oxide film ( 1 a ) of th…
Who is the assignee on this patent?
Nakagawa Shigeyuki, Uehara Yoshitaka, Yamamoto Chika, and 3 more
What technology area does this patent fall under?
Primary CPC classification B23K20/026. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).