Thermocompression bonders, methods of operating thermocompression bonders, and horizontal scrub motions in thermocompression bonding

US2016315064A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016315064-A1
Application numberUS-201615131610-A
CountryUS
Kind codeA1
Filing dateApr 18, 2016
Priority dateApr 24, 2015
Publication dateOct 27, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of operating a thermocompression bonding system is provided. The method includes the steps of: bringing first conductive structures of a semiconductor element into contact with second conductive structures of a substrate in connection with a thermocompression bonding operation; and moving the semiconductor element relative to the substrate along at least one substantially horizontal direction using a motion system of at least one of the semiconductor element and the substrate.

First claim

Opening claim text (preview).

What is claimed: 1 . A method of operating a thermocompression bonding system, the method comprising the steps of: bringing first conductive structures of a semiconductor element into contact with second conductive structures of a substrate in connection with a thermocompression bonding operation; and moving the semiconductor element relative to the substrate along at least one substantially horizontal direction using a motion system of at least one of the semiconductor element and the substrate. 2 . The method of claim 1 wherein the step of moving includes moving the semiconductor element using a motion system adapted to move a bonding tool carrying the semiconductor element. 3 . The method of claim 2 wherein the motion system includes a servo controlled linear motion system. 4 . The method of claim 1 wherein the step of moving includes moving the substrate using a motion system adapted to move a support structure supporting the substrate. 5 . The method of claim 4 wherein the motion system includes a servo controlled linear motion system. 6 . The method of claim 1 wherein the step of moving includes moving the semiconductor element relative to the substrate along a plurality of substantially horizontal directions. 7 . The method of claim 6 wherein movement along at least one of the plurality of substantially horizontal directions is provided using a motion system adapted to move a bonding tool carrying the semiconductor element. 8 . The method of claim 6 wherein movement along at least one of the plurality of substantially horizontal directions is provided using a motion system adapted to move a support structure supporting the substrate. 9 . The method of claim 6 wherein movement along at least one of the plurality of substantially horizontal directions is provided using a motion system adapted to move a bonding tool carrying the semiconductor element, and wherein movement along at least one of the plurality of substantially horizontal directions is provided using a motion system adapted to move a support structure supporting the substrate. 10 . The method of claim 1 wherein the step of moving is commenced after bringing first conductive structures of the semiconductor element into contact with second conductive structures of the substrate. 11 . The method of claim 1 wherein the step of moving is commenced before bringing first conductive structures of the semiconductor element into contact with second conductive structures of the substrate. 12 . The method of claim 1 wherein the at least one substantially horizontal direction includes a linear direction. 13 . The method of claim 1 wherein the at least one substantially horizontal direction includes a non-linear direction. 14 . The method of claim 1 wherein the step of moving the semiconductor element relative to the substrate includes low frequency relative movement. 15 . The method of claim 1 wherein the relative motion between the semiconductor element and the substrate varies as a function of time. 16 . The method of claim 1 wherein the relative motion between the semiconductor element and the substrate varies as a function of a z-height of a bonding tool for bonding the semiconductor element to the substrate. 17 . The method of claim 1 wherein the relative motion between the semiconductor element and the substrate varies as a function of a bond force applied by a bonding tool for bonding the semiconductor element to the substrate. 18 . The method of claim 1 wherein the relative motion between the semiconductor element and the substrate varies as a function of a temperature measured from at least one location of a bond head assembly including a bonding tool for bonding the semiconductor element to the substrate. 19 . The method of claim 1 wherein the relative motion between the semiconductor element and the substrate varies as a function of at least one of (1) time, (2) a z-height of a bonding tool for bonding the semiconductor element to the substrate, (3) a bond force applied by the bonding tool, and (4) a temperature measured from at least one location of a bond head assembly including the bonding tool. 20 . The method of claim 1 wherein the step of moving the semiconductor element relative to the substrate includes using a motion system included in a lower bond head assembly carrying the bonding tool to provide the relative movement. 21 . The method of claim 20 wherein the motion system included in the lower bond head assembly includes a piezo actuator. 22 . A thermocompression bonder comprising: a support structure for supporting a substrate; a bonding tool for bonding a semiconductor element to the substrate; and a motion system configured to provide relative movement between the semiconductor element and the substrate during a thermocompression bonding operation. 23 . The thermocompression bonder of claim 22 wherein the motion system is included in a lower bond head of the thermocompression bonder. 24 . The thermocompression bonder of claim 22 wherein the motion system includes a piezo actuator.

Assignees

Inventors

Classifications

  • with interposition of special material to facilitate connection of the parts, e.g. material for absorbing or producing gas · CPC title

  • Conductors · CPC title

  • with diffusion of soldering material · CPC title

  • Printed circuits · CPC title

  • B23K20/002Primary

    specially adapted for particular articles or work (B23K20/129 takes precedence) · CPC title

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What does patent US2016315064A1 cover?
A method of operating a thermocompression bonding system is provided. The method includes the steps of: bringing first conductive structures of a semiconductor element into contact with second conductive structures of a substrate in connection with a thermocompression bonding operation; and moving the semiconductor element relative to the substrate along at least one substantially horizontal di…
Who is the assignee on this patent?
Kulicke & Soffa Ind Inc
What technology area does this patent fall under?
Primary CPC classification B23K20/002. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Oct 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).