Liquid processing apparatus, liquid processing method, and storage medium that stores computer program for implementing liquid processing method

Patent metadata

Field	Value
Publication number	US-9452397-B2
Application number	US-201313772550-A
Country	US
Kind code	B2
Filing date	Feb 21, 2013
Priority date	Feb 24, 2012
Publication date	Sep 27, 2016
Grant date	Sep 27, 2016

Abstract

A liquid processing apparatus 200 includes a pure water supply source 20 ; a pure water flow rate control opening/closing valve 27 ; a sulfuric acid supply unit 30 ; a sulfuric acid supply opening/closing valve 34 ; mixing tanks 11 and 12 configured to mix pure water and sulfuric acid to produce a mixed chemical liquid and connected to a circulation line 100 having a circulation pump 101 ; a liquid processing unit 210 configured to perform a liquid process on a substrate W with the mixed chemical liquid. A controller 300 controls a pure water supply opening/closing valve 26 , the sulfuric acid supply opening/closing valve 34 , and the circulation pump 101 , such that operation of the circulation pump 101 is started after starting supply of the pure water to the mixing tanks 11 and 12 , and then, supply of sulfuric acid to the mixing tanks 11 and 12 is started.

First claim

What is claimed is:

1. A liquid processing method performed in a liquid processing apparatus including a mixing tank that mixes pure water and sulfuric acid to produce a mixed chemical liquid; a pure water supply line connected to the mixing tank; a sulfuric acid supply line connected to the mixing tank; a liquid processing unit that is connected to the mixing tank and configured to perform a liquid process on a substrate with the mixed chemical liquid produced in the mixing tank; a circulation line having a circulation pump that returns the mixed chemical liquid discharged from the mixing tank back to the mixing tank, both ends of the circulation line being connected to the mixing tank, the liquid processing method comprising:
producing the mixed chemical liquid by mixing pure water and sulfuric acid in the mixing tank; and
performing a liquid process on a substrate with the mixed chemical liquid in the liquid processing unit,
wherein the producing of the mixed chemical liquid comprises: starting supply of the pure water to the mixing tank; starting operation of the circulation pump after starting the supply of the pure water to the mixing tank; starting supply of the sulfuric acid to the mixing tank after starting the operation of the circulation pump, and supplying the mixed chemical liquid produced in the mixing tank to the substrate,
the liquid processing apparatus further includes a temperature controller configured to heat or cool the mixed chemical liquid flowing through the circulation line; and a cooling unit configured to cool the mixed chemical liquid, and
the producing of the mixed chemical liquid further comprises: cooling the mixed chemical liquid by the temperature controller and the cooling unit; and cooling or heating the mixed chemical liquid bypassing the cooling unit by the temperature controller after cooling the mixed chemical liquid by the temperature controller and the cooling unit.

2. The liquid processing method of claim 1 ,
wherein the cooling or heating of the mixed chemical liquid by the temperature controller is performed after a temperature of the mixed chemical liquid reaches a predetermined temperature in the cooling of the mixed chemical liquid by the temperature controller and the cooling unit.

3. The liquid processing method of claim 1 ,
wherein in the producing of the mixed chemical liquid, hydrogen peroxide solution is supplied to the mixing tank.

4. The liquid processing method of claim 1 ,
wherein in the producing of the mixed chemical liquid, hydrofluoric acid is supplied to the mixing tank.

5. The liquid processing method of claim 1 ,
wherein in the producing of the mixed chemical liquid, a concentration of the mixed chemical liquid is measured.

6. A liquid processing method performed in a liquid processing apparatus including a mixing tank that mixes pure water and sulfuric acid to produce a mixed chemical liquid; a pure water supply line connected to the mixing tank; a sulfuric acid supply line connected to the mixing tank; a liquid processing unit that is connected to the mixing tank and configured to perform a liquid process on a substrate with the mixed chemical liquid produced in the mixing tank; a circulation line having a circulation pump that returns the mixed chemical liquid discharged from the mixing tank back to the mixing tank, both ends of the circulation line being connected to the mixing tank, the liquid processing method comprising:
producing the mixed chemical liquid by mixing pure water and sulfuric acid in the mixing tank; and
performing a liquid process on a substrate with the mixed chemical liquid in the liquid processing unit,
wherein the producing of the mixed chemical liquid comprises: starting supply of the pure water to the mixing tank; starting operation of the circulation pump after starting the supply of the pure water to the mixing tank; starting supply of the sulfuric acid to the mixing tank after starting the operation of the circulation pump, and supplying the mixed chemical liquid produced in the mixing tank to the substrate, and
in the producing of the mixed chemical liquid, the sulfuric acid is supplied to the mixing tank at a first sulfuric acid supply flow rate when the sulfuric acid is supplied to the mixing tank from a sulfuric acid storage tank, and then, when it is determined that a storage amount of the sulfuric acid within the sulfuric acid storage tank is smaller than a first preset amount, the sulfuric acid is supplied to the mixing tank at a second sulfuric acid supply flow rate lower than the first sulfuric acid supply flow rate.

7. The liquid processing method of claim 6 ,
wherein in the producing of the mixed chemical liquid, the sulfuric acid is supplied to the sulfuric acid storage tank at a first sulfuric acid storage flow rate when the sulfuric acid is supplied to the sulfuric acid storage tank from a sulfuric acid supply source, and then, when it is determined that a storage amount of the sulfuric acid within the sulfuric acid storage tank reaches a second preset amount greater than the first preset amount, the sulfuric acid is supplied to the sulfuric acid storage tank at a second sulfuric acid storage flow rate lower than the first sulfuric acid storage flow rate.

8. The liquid processing method of claim 7 ,
wherein in the producing of the mixed chemical liquid, while the sulfuric acid is supplied to the sulfuric acid storage tank from the sulfuric acid supply source at the second sulfuric acid storage flow rate, when it is determined that a storage amount of the sulfuric acid within the sulfuric acid storage tank reaches a third preset amount greater than the second preset amount, the supply of the sulfuric acid from the sulfuric acid supply source to the sulfuric acid storage tank is stopped, and then, supply of the sulfuric acid from the sulfuric acid storage tank to the mixing tank is started.

Assignees

• Tokyo Electron Ltd

Inventors

• Komiya Hiroshi
• Eshima Kazuyoshi

Classifications

• H10P72/0448 Primary

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P50/00 Primary

  Etching of wafers, substrates or parts of devices · CPC title

• B01F2003/0896

  Operations & Transport · mapped topic

• B01F2215/0096

  Operations & Transport · mapped topic

• B01F3/088

  Operations & Transport · mapped topic