Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna

Patent metadata

Field	Value
Publication number	US-9449794-B2
Application number	US-201414270578-A
Country	US
Kind code	B2
Filing date	May 6, 2014
Priority date	Jul 20, 2012
Publication date	Sep 20, 2016
Grant date	Sep 20, 2016

Abstract

A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

First claim

What is claimed is:

1. A plasma reactor comprising:
a window assembly;
first and second coil antennas adjacent said window assembly, said first coil antenna comprising a first layer of parallel spiral conductors, each of said parallel spiral conductors comprising first and second ends;
a first current distributor coupled to the first ends of the parallel spiral conductors of said first layer;
a conductive ground plate in a plane overlying said first current distributor; and
a first radial conductive feed rod lying in a plane above said conductive ground plate and having an inner end coupled to said first current distributor and an outer end comprising a first RF feed terminal;
wherein said first current distributor comprises:
a first conductive spider lying in a plane above said first and second coil antennas, and a plurality of axial posts connected between a peripheral annular zone of said first conductive spider and said first ends of first layer of parallel spiral conductors.

2. The plasma reactor of claim 1 wherein said first coil antenna further comprises:
a second layer of parallel spiral conductors, each of said parallel spiral conductors of said second layer comprising first and second ends, respective ones of said second ends of said first layer being coupled to the second ends of said second layer by direct connection.

3. The plasma reactor of claim 2 wherein said first ends of said second layer are coupled to an RF return potential.

4. A plasma reactor comprising:
a window assembly;
first and second coil antennas adjacent said window assembly, said first coil antenna comprising a first layer of parallel spiral conductors, each of said parallel spiral conductors comprising first and second ends;
a first current distributor coupled to the first ends of the parallel spiral conductors of said first layer;
a conductive ground plate in a plane overlying said first current distributor;
a first radial conductive feed rod lying in a plane above said conductive ground plate and having an inner end coupled to said first current distributor and an outer end comprising a first RF feed terminal;
a second current distributor coupled to said second coil antenna;
a conductive feed plate lying in a plane above said first current distributor, and a second RF feed terminal coupled to said conductive feed plate; and
a plurality of axial rods connected between a peripheral annular zone of said conductive feed plate and said second current distributor.

5. The plasma reactor of claim 4 further comprising:
a first axial center rod connected between said inner end of said first radial conductive feed rod and said first current distributor.

6. The plasma reactor of claim 5 further comprising an axial center shield surrounding said first axial center rod.

7. The plasma reactor of claim 6 further comprising a first radial cylindrical shield surrounding said first radial conductive feed rod.

8. The plasma reactor of claim 4 further comprising:
a second radial conductive feed rod lying in a plane above said conductive ground plate and having an inner end coupled to said conductive feed plate and an outer end coupled to said second RF feed terminal.

9. The plasma reactor of claim 8 further comprising:
a first axial center rod connected between said inner end of said first radial conductive feed rod and said first current distributor; and
a second axial center rod connected between said inner end of said second radial conductive feed rod and said conductive feed plate.

10. The plasma reactor of claim 9 further comprising an axial center shield surrounding said first and second axial center rods.

11. The plasma reactor of claim 10 further comprising a first radial cylindrical shield surrounding said first radial conductive feed rod and a second radial cylindrical shield surrounding said second radial conductive feed rod.

12. The plasma reactor of claim 4 further comprising a first plurality of axial cylindrical shields surrounding respective ones of said plurality of axial rods.

13. The plasma reactor of claim 12 wherein said first plurality of axial cylindrical shields are grounded to said conductive ground plate.

14. The plasma reactor of claim 13 further comprising an inner coil shield surrounding said second coil antenna and lying between said first and second coil antennas.

15. The plasma reactor of claim 14 wherein said inner coil shield is grounded and wherein said first and second coil antennas comprise ground return ends connected to said inner coil shield.

Assignees

• Applied Materials Inc

Inventors

• Nguyen Andrew
• Ramaswamy Kartik
• Kenney Jason A
• Rauf Shahid
• Collins Kenneth S
• Yang Yang
• Lane Steven
• Vishwanath Yogananda Sarode

Classifications

• H01J37/32174

  Circuits specially adapted for controlling the RF discharge · CPC title

• H05H1/46

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

• C23C16/45563

  Gas nozzles · CPC title

• C23C16/509

  using internal electrodes · CPC title

• H05H2001/4667

  Electricity · mapped topic